Serveur d'exploration sur l'Indium - Analysis (France)

Index « Auteurs » - entrée « F. Alexandre »
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F. Alaoui < F. Alexandre < F. Alsina  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 30.
[0-20] [0 - 20][0 - 30][20-29][20-40]
Ident.Authors (with country if any)Title
000589 (2008) Demonstration of planar thick InP layers by selective MOVPE
000C91 (2003) Studies of MOVPE growth conditions for the improvement of GaInAsN on GaAs substrates for 1.3 μm laser emission
000D36 (2003) Measurement of base and collector transit times in thin-base InGaAs/InP HBT
000E87 (2002) Nitrures de faible gap épitaxiés sur substrat GaAs pour application optoélectronique : Croissance épitaxiale en phase vapeur aux organométalliques
000F61 (2002) Nitride-based long-wavelength lasers on GaAs substrates
000F98 (2002) InP DHBT technology and design for 40 Gbit/s full-rate-clock communication circuits
001291 (2001) (InGa)(NAs)/GaAs structures emitting in 1-1.6 μm wavelength range
001410 (2000) Performance comparison of strained InGaNAs/GaAs and InGaAs/GaAs QW laser diodes grown by MOVPE
001789 (1999) +55 °C Pulse lasing at 1.56 μm of all-monolithic InGaAlAs/InP vertical cavity lasers
001975 (1998) Low temperature planar regrowth of semi-insulating InP by low pressure hydride vapour phase epitaxy for device application
001A30 (1998) Beam geometrical modelling of CBE on nonplanar substrate
001A84 (1997-09-29) Low-loss hydrogenated buried waveguide coupler integrated with a four-wavelength distributive Bragg reflector laser array on InP
001C22 (1997) Planar InGaP/GaAs HBTs for high speed optoelectronic circuit applications
001D40 (1996-11) High stability heterojunction bipolar transistors with carbon-doped base grown by atomic layer chemical beam epitaxy
001D73 (1996-07-15) Superlattice effects induced by atomic ordering on GaxIn1-xP Raman modes
001F28 (1996) Improved stability of C-doped GaAs grown by chemical beam epitaxy for heterojunction bipolar transistor applications
001F71 (1996) Benefits of chemical beam epitaxy for micro and optoelectronic applications
002045 (1995-06-15) Acoustical and optical properties of Ga0.52In0.48P: A Brillouin scattering study
002102 (1995) Uniform selective area growth of GaAs and GaInP by low temperature chemical beam epitaxy
002148 (1995) Modern epitaxial techniques for HBT structures
002192 (1995) Dependence of InP and GaAs chemical beam epitaxy growth rate on substrate orientations ; applications to selective area epitaxy

List of associated KwdEn.i

Nombre de
documents
Descripteur
18Experimental study
11Epitaxy
9Indium phosphides
7Binary compounds
7Gallium arsenides
7Heterojunction transistor
7Photoluminescence
6Crystal growth from vapors
6Gallium Arsenides
6III-V semiconductors
6Semiconductor materials
5Chemical composition
5Epitaxial layers
5Gallium phosphides
5MOVPE method
5Semiconductor lasers
5Ternary compounds
4Chemical beam condensation
4Current density
4Inorganic compound
3Chemical beam epitaxy
3Crystal growth
3Doping
3Experiments
3Gallium Indium Phosphides Mixed
3Gallium nitrides
3Heterojunction bipolar transistors
3III-V compound
3Indium arsenides
3Indium nitrides
3Integrated optoelectronics
3Laser diodes
3Quantum well lasers
3Semiconductor growth
3Theoretical study
2Aluminium Gallium Arsenides Mixed
2Binary compound
2Bipolar transistors
2Brillouin effect
2CBE
2Carbon additions
2Current gain
2Ellipsometry
2Growth mechanism
2Indium Phosphides
2Indium phosphide
2Infrared laser
2Kinetics
2Low temperature
2Molecular beam condensation
2Morphology
2Quaternary compounds
2Raman spectra
2Refractive index
2SIMS
2Selective area
2Semiconducting indium gallium arsenide
2Semiconducting indium phosphide
2Semiconductor device
2Semiconductor device manufacture
2Semiconductor device structures
2Solid solution
2Strained quantum well
2Superlattices
2Temperature
2Theory
2Thin film
2Thin films
2Threshold current
2VPE
2Vapor phase
2Voltage current curve
1Absorption
1Acoustic properties
1Ambient temperature
1Anisotropy
1Application
1Arsenides
1Arsenides nitrides
1Band offset
1Bipolar transistor
1Characterization
1Charge carrier concentration
1Clock
1Collector current density
1Computer simulation
1Confinement
1Critical temperature
1Crystal doping
1Crystal orientation
1Cuttoff frequencies
1Deformation potential
1Degradation
1Dielectric film deposition
1Diffusion
1Distributed Bragg reflector lasers
1Double heterojunction
1Drift-diffusion approach
1Elastic constants
1Elasticity theory

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