Serveur d'exploration sur l'Indium - Analysis (France)

Index « Auteurs » - entrée « E. Monroy »
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E. Molva < E. Monroy < E. Moreau  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 10.
Ident.Authors (with country if any)Title
000094 (2012) Structure and strain state of polar and semipolar InGaN quantum dots
000097 (2012) Structural properties of semipolar InGaN/GaN quantum dot superlattices grown by plasma-assisted MBE
000112 (2012) Morphology and origin of V-defects in semipolar (11-22) InGaN
000123 (2012) Improvement of InN layers deposited on Si(111) by RF sputtering using a low-growth-rate InN buffer layer
000217 (2011) Growth and characterization of polar (0 0 0 1) and semipolar (11-22) InGaN/GaN quantum dots
000305 (2010) Influence of deposition conditions on nanocrystalline InN layers synthesized on Si(1 1 1) and GaN templates by RF sputtering
000C16 (2003-09-01) Molecular-beam epitaxial growth and characterization of quaternary III-nitride compounds
000C46 (2003-04-07) In incorporation during the growth of quaternary III-nitride compounds by plasma-assisted molecular beam epitaxy
000C61 (2003-02-01) Surfactant effect of In for AlGaN growth by plasma-assisted molecular beam epitaxy
001443 (2000) High detectivity ZnSe-based Schottky barrier photodetectors for blue and near-ultraviolet spectral range

List of associated KwdEn.i

Nombre de
documents
Descripteur
8Molecular beam epitaxy
6III-V semiconductors
6Indium nitride
5Gallium nitride
5Photoluminescence
4III-V compound
3Aluminium compounds
3Crystal structure
3Experimental study
3Gallium compounds
3Indium
3Indium compounds
3Nanostructures
3Quantum dots
3Semiconductor epitaxial layers
3Semiconductor growth
3Template reaction
3XRD
2Growth mechanism
2Nanocrystal
2Optical properties
2Plasma assisted processing
2Plasma deposition
2Radiofrequency sputtering
2Roughness
2Self-assembly
2Semiconductor materials
2Sputtering
2Superlattices
2Ternary compounds
2Thin films
2Threading dislocation
2Transmission electron microscopy
1Absorption edge
1Application
1Atomic force microscopy
1Binary compounds
1Blue shift
1Buffer layer
1Confinement
1Crystal faces
1Crystal orientation
1Crystal perfection
1Crystalline material
1Electric field effects
1Electron microscopy
1Experiments
1Faceting
1Film growth
1Fluctuations
1Grain size
1Growth rate
1Indium dot
1Inorganic compounds
1Interfaces
1Microelectronic fabrication
1Morphology
1Mosaic structure
1Nanometer scale
1Nanostructured materials
1Near ultraviolet spectral range
1Non radiative recombination
1Nucleation
1Ohmic contacts
1Operating conditions
1Optical materials
1Phase analysis
1Physical vapor deposition
1Polarity
1Preferred orientation
1Quantum wells
1RHEED
1Raman scattering
1Raman spectroscopy
1Reactive ion etching
1Reactive sputtering
1Schottky barrier diodes
1Schottky barrier photodetectors
1Self-assembled layers
1Semiconducting gallium arsenide
1Semiconducting zinc compounds
1Semiconductor device structures
1Semiconductor doping
1Semiconductor quantum dots
1Soldering
1Spectral line shift
1Stacking faults
1Strains
1Substrates
1Surface segregation
1Surface states
1Surfactants
1Temperature dependence
1Template method
1Thick films
1Ultraviolet detectors
1Ultraviolet spectroscopy
1V shape
1Wide band gap semiconductors
1Wurtzite structure

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