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Serveur d'exploration sur l'Indium - Analysis (Chine)

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Plasma enhanced chemical vapor deposition < Plasma etching < Plasma frequency  Facettes :

List of bibliographic references

Number of relevant bibliographic references: 9.
Ident.Authors (with country if any)Title
000A06 (2010) Temperature dependence of photoluminescence from as-grown and plasma-etched InAs0.45P0.55/In0.68Ga0.32As0.45P0.55 strained single quantum well
000D44 (2009) Room temperature continuous-wave electrically-injected InGaAsP triangle and square microlasers
000F73 (2009) A Study on the Cl2/C2H4/Ar Plasma Etching of ITO Using Inductively Coupled Plasma
001115 (2008) Inductively coupled plasma etching of In1-x-yAlxGayAs in BCl3/Cl2/Ar
001122 (2008) Improvement of the performance of GaN-based LEDs grown on sapphire substrates patterned by wet and ICP etching
001154 (2008) Enhancement of the light output of GaN-based light-emitting diodes using surface-textured indium-tin-oxide transparent ohmic contacts
001245 (2008) 40 Gb/s InGaAlAs EML Module Based on Identical Epitaxial Layer Integration Scheme
001274 (2007) The characteristics of GaN-based blue LED on Si substrate
001F57 (2001) Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by r.f. reactive sputtering

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