A Generic Pigment Model for Digital Painting
Identifieur interne : 004D99 ( Istex/Curation ); précédent : 004D98; suivant : 004E00A Generic Pigment Model for Digital Painting
Auteurs : Songhua Xu [République populaire de Chine] ; Haisheng Tan [République populaire de Chine] ; Xiantao Jiao [République populaire de Chine] ; Francis C. M. Lau [République populaire de Chine] ; Yunhe PanSource :
- Computer Graphics Forum [ 0167-7055 ] ; 2007-09.
English descriptors
- KwdEn :
Abstract
We propose a generic pigment model suitable for digital painting in a wide range of genres including traditional Chinese painting and water‐based painting. The model embodies a simulation of the pigment‐water solution and its interaction with the brush and the paper at the level of pigment particles; such a level of detail is needed for achieving highly intricate effects by the artist. The simulation covers pigment diffusion and sorption processes at the paper surface, and aspects of pigment particle deposition on the paper. We follow rules and formulations from quantitative studies of adsorption and diffusion processes in surface chemistry and the textile industry. The result is a pigment model that spans a continuum from the very wet to the very dry brush stroke effects. We also propose a new pigment mixing method based on machine learning techniques to emulate pigment mixing in real life as well as to support the creation of new artificial pigments. To experiment with the proposed model, we embedded the model in a sophisticated digital brush system. The combined system exhibits interactive speed on a modest PC platform. http://www.cs.hku.hk/~songhua/pigment provides supplementary materials for this paper.
Url:
DOI: 10.1111/j.1467-8659.2007.01084.x
Links toward previous steps (curation, corpus...)
- to stream Istex, to step Corpus: Pour aller vers cette notice dans l'étape Curation :004D99
Links to Exploration step
ISTEX:A451BF3ADF953950128BBB1B83417D6B0A3661DECuration
No country items
Songhua Xu<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation><mods:affiliation>Department of Computer Science, Yale University, New Haven, Connecticut, USA, 06520</mods:affiliation>
<wicri:noCountry code="subField">06520</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
<affiliation><mods:affiliation>Department of Computer Science, Yale University, New Haven, Connecticut, USA, 06520</mods:affiliation>
<wicri:noCountry code="subField">06520</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
Le document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">A Generic Pigment Model for Digital Painting</title>
<author><name sortKey="Xu, Songhua" sort="Xu, Songhua" uniqKey="Xu S" first="Songhua" last="Xu">Songhua Xu</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation><mods:affiliation>Department of Computer Science, Yale University, New Haven, Connecticut, USA, 06520</mods:affiliation>
<wicri:noCountry code="subField">06520</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Tan, Haisheng" sort="Tan, Haisheng" uniqKey="Tan H" first="Haisheng" last="Tan">Haisheng Tan</name>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Jiao, Xiantao" sort="Jiao, Xiantao" uniqKey="Jiao X" first="Xiantao" last="Jiao">Xiantao Jiao</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Lau, Francis C M" sort="Lau, Francis C M" uniqKey="Lau F" first="Francis C. M." last="Lau">Francis C. M. Lau</name>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Pan, Yunhe" sort="Pan, Yunhe" uniqKey="Pan Y" first="Yunhe" last="Pan">Yunhe Pan</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">ISTEX</idno>
<idno type="RBID">ISTEX:A451BF3ADF953950128BBB1B83417D6B0A3661DE</idno>
<date when="2007" year="2007">2007</date>
<idno type="doi">10.1111/j.1467-8659.2007.01084.x</idno>
<idno type="url">https://api.istex.fr/document/A451BF3ADF953950128BBB1B83417D6B0A3661DE/fulltext/pdf</idno>
<idno type="wicri:Area/Istex/Corpus">004D99</idno>
<idno type="wicri:Area/Istex/Curation">004D99</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">A Generic Pigment Model for Digital Painting</title>
<author><name sortKey="Xu, Songhua" sort="Xu, Songhua" uniqKey="Xu S" first="Songhua" last="Xu">Songhua Xu</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation><mods:affiliation>Department of Computer Science, Yale University, New Haven, Connecticut, USA, 06520</mods:affiliation>
<wicri:noCountry code="subField">06520</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Tan, Haisheng" sort="Tan, Haisheng" uniqKey="Tan H" first="Haisheng" last="Tan">Haisheng Tan</name>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Jiao, Xiantao" sort="Jiao, Xiantao" uniqKey="Jiao X" first="Xiantao" last="Jiao">Xiantao Jiao</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Lau, Francis C M" sort="Lau, Francis C M" uniqKey="Lau F" first="Francis C. M." last="Lau">Francis C. M. Lau</name>
<affiliation wicri:level="1"><mods:affiliation>Department of Computer Science, The University of Hong Kong, Hong Kong, P.R. China</mods:affiliation>
<country xml:lang="fr" wicri:curation="lc">République populaire de Chine</country>
<wicri:regionArea>Department of Computer Science, The University of Hong Kong, Hong Kong</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Pan, Yunhe" sort="Pan, Yunhe" uniqKey="Pan Y" first="Yunhe" last="Pan">Yunhe Pan</name>
<affiliation><mods:affiliation>CAD & CG State Key Lab of China, Zhejiang University, Hangzhou, Zhejiang, P.R. China, 310027</mods:affiliation>
<wicri:noCountry code="subField">310027</wicri:noCountry>
</affiliation>
</author>
</analytic>
<monogr></monogr>
<series><title level="j">Computer Graphics Forum</title>
<idno type="ISSN">0167-7055</idno>
<idno type="eISSN">1467-8659</idno>
<imprint><publisher>Blackwell Publishing Ltd</publisher>
<pubPlace>Oxford, UK</pubPlace>
<date type="published" when="2007-09">2007-09</date>
<biblScope unit="volume">26</biblScope>
<biblScope unit="issue">3</biblScope>
<biblScope unit="page" from="609">609</biblScope>
<biblScope unit="page" to="618">618</biblScope>
</imprint>
<idno type="ISSN">0167-7055</idno>
</series>
<idno type="istex">A451BF3ADF953950128BBB1B83417D6B0A3661DE</idno>
<idno type="DOI">10.1111/j.1467-8659.2007.01084.x</idno>
<idno type="ArticleID">CGF1084</idno>
</biblStruct>
</sourceDesc>
<seriesStmt><idno type="ISSN">0167-7055</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>I.3.4 [Graphics Utilities]: Paint systems</term>
<term>I.3.5 [Computational Geometry and Object Modeling]: Physically based modeling</term>
</keywords>
</textClass>
<langUsage><language ident="en">en</language>
</langUsage>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">We propose a generic pigment model suitable for digital painting in a wide range of genres including traditional Chinese painting and water‐based painting. The model embodies a simulation of the pigment‐water solution and its interaction with the brush and the paper at the level of pigment particles; such a level of detail is needed for achieving highly intricate effects by the artist. The simulation covers pigment diffusion and sorption processes at the paper surface, and aspects of pigment particle deposition on the paper. We follow rules and formulations from quantitative studies of adsorption and diffusion processes in surface chemistry and the textile industry. The result is a pigment model that spans a continuum from the very wet to the very dry brush stroke effects. We also propose a new pigment mixing method based on machine learning techniques to emulate pigment mixing in real life as well as to support the creation of new artificial pigments. To experiment with the proposed model, we embedded the model in a sophisticated digital brush system. The combined system exhibits interactive speed on a modest PC platform. http://www.cs.hku.hk/~songhua/pigment provides supplementary materials for this paper.</div>
</front>
</TEI>
</record>
Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=$WICRI_ROOT/Ticri/CIDE/explor/HapticV1/Data/Istex/Curation
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 004D99 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/Istex/Curation/biblio.hfd -nk 004D99 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien |wiki= Ticri/CIDE |area= HapticV1 |flux= Istex |étape= Curation |type= RBID |clé= ISTEX:A451BF3ADF953950128BBB1B83417D6B0A3661DE |texte= A Generic Pigment Model for Digital Painting }}
![]() | This area was generated with Dilib version V0.6.23. | ![]() |