Deposition of improved optically selective conductive tin oxide films by spray pyrolysis
Identifieur interne : 000D72 ( Istex/Corpus ); précédent : 000D71; suivant : 000D73Deposition of improved optically selective conductive tin oxide films by spray pyrolysis
Auteurs : I. S. Mulla ; H. S. Soni ; V. J. Rao ; A. P. B. SinhaSource :
- Journal of Materials Science [ 0022-2461 ] ; 1986-04-01.
English descriptors
- Teeft :
- Antimony, Antimony concentration, Appreciable change, Average transmission, Best combination, Better crystallinity, Blue coloration, Bragg angle, Conduction band, Critical temperature, Deposition, Deposition temperature, Doping, Electron diffraction pattern, Film decreases, Film thickness, Free carriers, Further increase, Glass substrate, Good selectivity, High carrier concentration, Higher antimony doping, Ibid, Infrared reflectance, Infrared reflectivity, Inverse temperature, Irreversible decrease, Lower resistivity, Lowest resistivity, Moisture content, Optical properties, Oxide films, Phys, Plasma edge, Present film, Reflectance, Reflectivity, Resistivity, Sno2, Sno2 film, Sno2 films, Sno2 structure, Spray pyrolysis, Such films, Temperature range, Various antimony concentrations, Visible region.
Abstract
Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.
Url:
DOI: 10.1007/BF00553263
Links to Exploration step
ISTEX:D055AE3FBF398EA63DF4B893410746645C3CDD6ELe document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><author><name sortKey="Mulla, I S" sort="Mulla, I S" uniqKey="Mulla I" first="I. S." last="Mulla">I. S. Mulla</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Soni, H S" sort="Soni, H S" uniqKey="Soni H" first="H. S." last="Soni">H. S. Soni</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Rao, V J" sort="Rao, V J" uniqKey="Rao V" first="V. J." last="Rao">V. J. Rao</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Sinha, A P B" sort="Sinha, A P B" uniqKey="Sinha A" first="A. P. B." last="Sinha">A. P. B. Sinha</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:D055AE3FBF398EA63DF4B893410746645C3CDD6E</idno><date when="1986" year="1986">1986</date><idno type="doi">10.1007/BF00553263</idno><idno type="url">https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/fulltext.pdf</idno><idno type="wicri:Area/Istex/Corpus">000D72</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000D72</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><author><name sortKey="Mulla, I S" sort="Mulla, I S" uniqKey="Mulla I" first="I. S." last="Mulla">I. S. Mulla</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Soni, H S" sort="Soni, H S" uniqKey="Soni H" first="H. S." last="Soni">H. S. Soni</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Rao, V J" sort="Rao, V J" uniqKey="Rao V" first="V. J." last="Rao">V. J. Rao</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author><author><name sortKey="Sinha, A P B" sort="Sinha, A P B" uniqKey="Sinha A" first="A. P. B." last="Sinha">A. P. B. Sinha</name><affiliation><mods:affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</mods:affiliation></affiliation></author></analytic><monogr></monogr><series><title level="j">Journal of Materials Science</title><title level="j" type="abbrev">J Mater Sci</title><idno type="ISSN">0022-2461</idno><idno type="eISSN">1573-4803</idno><imprint><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><date type="published" when="1986-04-01">1986-04-01</date><biblScope unit="volume">21</biblScope><biblScope unit="issue">4</biblScope><biblScope unit="page" from="1280">1280</biblScope><biblScope unit="page" to="1288">1288</biblScope></imprint><idno type="ISSN">0022-2461</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0022-2461</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="Teeft" xml:lang="en"><term>Antimony</term><term>Antimony concentration</term><term>Appreciable change</term><term>Average transmission</term><term>Best combination</term><term>Better crystallinity</term><term>Blue coloration</term><term>Bragg angle</term><term>Conduction band</term><term>Critical temperature</term><term>Deposition</term><term>Deposition temperature</term><term>Doping</term><term>Electron diffraction pattern</term><term>Film decreases</term><term>Film thickness</term><term>Free carriers</term><term>Further increase</term><term>Glass substrate</term><term>Good selectivity</term><term>High carrier concentration</term><term>Higher antimony doping</term><term>Ibid</term><term>Infrared reflectance</term><term>Infrared reflectivity</term><term>Inverse temperature</term><term>Irreversible decrease</term><term>Lower resistivity</term><term>Lowest resistivity</term><term>Moisture content</term><term>Optical properties</term><term>Oxide films</term><term>Phys</term><term>Plasma edge</term><term>Present film</term><term>Reflectance</term><term>Reflectivity</term><term>Resistivity</term><term>Sno2</term><term>Sno2 film</term><term>Sno2 films</term><term>Sno2 structure</term><term>Spray pyrolysis</term><term>Such films</term><term>Temperature range</term><term>Various antimony concentrations</term><term>Visible region</term></keywords></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.</div></front></TEI><istex><corpusName>springer-journals</corpusName><keywords><teeft><json:string>resistivity</json:string><json:string>antimony</json:string><json:string>sno2</json:string><json:string>reflectivity</json:string><json:string>antimony concentration</json:string><json:string>phys</json:string><json:string>ibid</json:string><json:string>doping</json:string><json:string>infrared reflectivity</json:string><json:string>sno2 films</json:string><json:string>film thickness</json:string><json:string>infrared reflectance</json:string><json:string>visible region</json:string><json:string>sno2 film</json:string><json:string>reflectance</json:string><json:string>optical properties</json:string><json:string>spray pyrolysis</json:string><json:string>critical temperature</json:string><json:string>moisture content</json:string><json:string>lowest resistivity</json:string><json:string>conduction band</json:string><json:string>glass substrate</json:string><json:string>oxide films</json:string><json:string>average transmission</json:string><json:string>various antimony concentrations</json:string><json:string>deposition</json:string><json:string>appreciable change</json:string><json:string>sno2 structure</json:string><json:string>better crystallinity</json:string><json:string>bragg angle</json:string><json:string>such films</json:string><json:string>good selectivity</json:string><json:string>present film</json:string><json:string>lower resistivity</json:string><json:string>high carrier concentration</json:string><json:string>further increase</json:string><json:string>electron diffraction pattern</json:string><json:string>irreversible decrease</json:string><json:string>inverse temperature</json:string><json:string>plasma edge</json:string><json:string>film decreases</json:string><json:string>higher antimony doping</json:string><json:string>blue coloration</json:string><json:string>free carriers</json:string><json:string>best combination</json:string><json:string>deposition temperature</json:string><json:string>temperature range</json:string></teeft></keywords><author><json:item><name>I. S. Mulla</name><affiliations><json:string>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</json:string></affiliations></json:item><json:item><name>H. S. Soni</name><affiliations><json:string>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</json:string></affiliations></json:item><json:item><name>V. J. Rao</name><affiliations><json:string>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</json:string></affiliations></json:item><json:item><name>A. P. B. Sinha</name><affiliations><json:string>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</json:string></affiliations></json:item></author><articleId><json:string>BF00553263</json:string><json:string>Art26</json:string></articleId><arkIstex>ark:/67375/1BB-1DHF6Q23-D</arkIstex><language><json:string>eng</json:string></language><originalGenre><json:string>OriginalPaper</json:string></originalGenre><abstract>Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.</abstract><qualityIndicators><score>6.714</score><pdfWordCount>3670</pdfWordCount><pdfCharCount>21295</pdfCharCount><pdfVersion>1.3</pdfVersion><pdfPageCount>9</pdfPageCount><pdfPageSize>594 x 842.28 pts</pdfPageSize><refBibsNative>false</refBibsNative><abstractWordCount>87</abstractWordCount><abstractCharCount>594</abstractCharCount><keywordCount>0</keywordCount></qualityIndicators><title>Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><genre><json:string>research-article</json:string></genre><host><title>Journal of Materials Science</title><language><json:string>unknown</json:string></language><publicationDate>1986</publicationDate><copyrightDate>1986</copyrightDate><issn><json:string>0022-2461</json:string></issn><eissn><json:string>1573-4803</json:string></eissn><journalId><json:string>10853</json:string></journalId><volume>21</volume><issue>4</issue><pages><first>1280</first><last>1288</last></pages><genre><json:string>journal</json:string></genre><subject><json:item><value>Polymer Sciences</value></json:item><json:item><value>Industrial Chemistry/Chemical Engineering</value></json:item><json:item><value>Characterization and Evaluation Materials</value></json:item><json:item><value>Mechanics</value></json:item></subject></host><namedEntities><unitex><date></date><geogName></geogName><orgName></orgName><orgName_funder></orgName_funder><orgName_provider></orgName_provider><persName></persName><placeName></placeName><ref_url></ref_url><ref_bibl></ref_bibl><bibl></bibl></unitex></namedEntities><ark><json:string>ark:/67375/1BB-1DHF6Q23-D</json:string></ark><categories><wos><json:string>1 - science</json:string><json:string>2 - materials science, multidisciplinary</json:string></wos><scienceMetrix><json:string>1 - applied sciences</json:string><json:string>2 - enabling & strategic technologies</json:string><json:string>3 - materials</json:string></scienceMetrix><scopus><json:string>1 - Physical Sciences</json:string><json:string>2 - Engineering</json:string><json:string>3 - Mechanical Engineering</json:string><json:string>1 - Physical Sciences</json:string><json:string>2 - Engineering</json:string><json:string>3 - Mechanics of Materials</json:string><json:string>1 - Physical Sciences</json:string><json:string>2 - Materials Science</json:string><json:string>3 - General Materials Science</json:string></scopus><inist><json:string>1 - sciences appliquees, technologies et medecines</json:string><json:string>2 - sciences exactes et technologie</json:string><json:string>3 - chimie</json:string><json:string>4 - chimie analytique</json:string></inist></categories><publicationDate>1986</publicationDate><copyrightDate>1986</copyrightDate><doi><json:string>10.1007/BF00553263</json:string></doi><id>D055AE3FBF398EA63DF4B893410746645C3CDD6E</id><score>1</score><fulltext><json:item><extension>pdf</extension><original>true</original><mimetype>application/pdf</mimetype><uri>https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/fulltext.pdf</uri></json:item><json:item><extension>zip</extension><original>false</original><mimetype>application/zip</mimetype><uri>https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/bundle.zip</uri></json:item><istex:fulltextTEI uri="https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/fulltext.tei"><teiHeader><fileDesc><titleStmt><title level="a" type="main" xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title></titleStmt><publicationStmt><authority>ISTEX</authority><publisher scheme="https://scientific-publisher.data.istex.fr">Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><availability><licence><p>Chapman and Hall Ltd., 1986</p></licence><p scheme="https://loaded-corpus.data.istex.fr/ark:/67375/XBH-3XSW68JL-F">springer</p></availability><date>1985-04-12</date></publicationStmt><notesStmt><note type="research-article" scheme="https://content-type.data.istex.fr/ark:/67375/XTP-1JC4F85T-7">research-article</note><note type="journal" scheme="https://publication-type.data.istex.fr/ark:/67375/JMC-0GLKJH51-B">journal</note><note>Papers</note></notesStmt><sourceDesc><biblStruct type="inbook"><analytic><title level="a" type="main" xml:lang="en">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title><author xml:id="author-0000"><persName><forename type="first">I.</forename><surname>Mulla</surname></persName><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation></author><author xml:id="author-0001"><persName><forename type="first">H.</forename><surname>Soni</surname></persName><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation></author><author xml:id="author-0002"><persName><forename type="first">V.</forename><surname>Rao</surname></persName><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation></author><author xml:id="author-0003"><persName><forename type="first">A.</forename><surname>Sinha</surname></persName><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation></author><idno type="istex">D055AE3FBF398EA63DF4B893410746645C3CDD6E</idno><idno type="ark">ark:/67375/1BB-1DHF6Q23-D</idno><idno type="DOI">10.1007/BF00553263</idno><idno type="article-id">BF00553263</idno><idno type="article-id">Art26</idno></analytic><monogr><title level="j">Journal of Materials Science</title><title level="j" type="abbrev">J Mater Sci</title><idno type="pISSN">0022-2461</idno><idno type="eISSN">1573-4803</idno><idno type="journal-ID">true</idno><idno type="issue-article-count">50</idno><idno type="volume-issue-count">12</idno><imprint><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><date type="published" when="1986-04-01"></date><biblScope unit="volume">21</biblScope><biblScope unit="issue">4</biblScope><biblScope unit="page" from="1280">1280</biblScope><biblScope unit="page" to="1288">1288</biblScope></imprint></monogr></biblStruct></sourceDesc></fileDesc><profileDesc><creation><date>1985-04-12</date></creation><langUsage><language ident="en">en</language></langUsage><abstract xml:lang="en"><p>Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.</p></abstract><textClass><keywords scheme="Journal Subject"><list><head>Chemistry</head><item><term>Polymer Sciences</term></item><item><term>Industrial Chemistry/Chemical Engineering</term></item><item><term>Characterization and Evaluation Materials</term></item><item><term>Mechanics</term></item></list></keywords></textClass></profileDesc><revisionDesc><change when="1985-04-12">Created</change><change when="1986-04-01">Published</change></revisionDesc></teiHeader></istex:fulltextTEI><json:item><extension>txt</extension><original>false</original><mimetype>text/plain</mimetype><uri>https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/fulltext.txt</uri></json:item></fulltext><metadata><istex:metadataXml wicri:clean="corpus springer-journals not found" wicri:toSee="no header"><istex:xmlDeclaration>version="1.0" encoding="UTF-8"</istex:xmlDeclaration><istex:docType PUBLIC="-//Springer-Verlag//DTD A++ V2.4//EN" URI="http://devel.springer.de/A++/V2.4/DTD/A++V2.4.dtd" name="istex:docType"></istex:docType><istex:document><Publisher><PublisherInfo><PublisherName>Kluwer Academic Publishers</PublisherName><PublisherLocation>Dordrecht</PublisherLocation></PublisherInfo><Journal><JournalInfo JournalProductType="ArchiveJournal" NumberingStyle="Unnumbered"><JournalID>10853</JournalID><JournalPrintISSN>0022-2461</JournalPrintISSN><JournalElectronicISSN>1573-4803</JournalElectronicISSN><JournalTitle>Journal of Materials Science</JournalTitle><JournalAbbreviatedTitle>J Mater Sci</JournalAbbreviatedTitle><JournalSubjectGroup><JournalSubject Type="Primary">Chemistry</JournalSubject><JournalSubject Type="Secondary">Polymer Sciences</JournalSubject><JournalSubject Type="Secondary">Industrial Chemistry/Chemical Engineering</JournalSubject><JournalSubject Type="Secondary">Characterization and Evaluation Materials</JournalSubject><JournalSubject Type="Secondary">Mechanics</JournalSubject></JournalSubjectGroup></JournalInfo><Volume><VolumeInfo VolumeType="Regular" TocLevels="0"><VolumeIDStart>21</VolumeIDStart><VolumeIDEnd>21</VolumeIDEnd><VolumeIssueCount>12</VolumeIssueCount></VolumeInfo><Issue IssueType="Regular"><IssueInfo TocLevels="0"><IssueIDStart>4</IssueIDStart><IssueIDEnd>4</IssueIDEnd><IssueArticleCount>50</IssueArticleCount><IssueHistory><CoverDate><Year>1986</Year><Month>4</Month></CoverDate></IssueHistory><IssueCopyright><CopyrightHolderName>Chapman and Hall Ltd.</CopyrightHolderName><CopyrightYear>1986</CopyrightYear></IssueCopyright></IssueInfo><Article ID="Art26"><ArticleInfo Language="En" ArticleType="OriginalPaper" NumberingStyle="Unnumbered" TocLevels="0" ContainsESM="No"><ArticleID>BF00553263</ArticleID><ArticleDOI>10.1007/BF00553263</ArticleDOI><ArticleSequenceNumber>26</ArticleSequenceNumber><ArticleTitle Language="En">Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</ArticleTitle><ArticleCategory>Papers</ArticleCategory><ArticleFirstPage>1280</ArticleFirstPage><ArticleLastPage>1288</ArticleLastPage><ArticleHistory><RegistrationDate><Year>2004</Year><Month>10</Month><Day>14</Day></RegistrationDate><Received><Year>1985</Year><Month>4</Month><Day>12</Day></Received><Accepted><Year>1985</Year><Month>6</Month><Day>12</Day></Accepted></ArticleHistory><ArticleCopyright><CopyrightHolderName>Chapman and Hall Ltd.</CopyrightHolderName><CopyrightYear>1986</CopyrightYear></ArticleCopyright><ArticleGrants Type="Regular"><MetadataGrant Grant="OpenAccess"></MetadataGrant><AbstractGrant Grant="OpenAccess"></AbstractGrant><BodyPDFGrant Grant="Restricted"></BodyPDFGrant><BodyHTMLGrant Grant="Restricted"></BodyHTMLGrant><BibliographyGrant Grant="Restricted"></BibliographyGrant><ESMGrant Grant="Restricted"></ESMGrant></ArticleGrants><ArticleContext><JournalID>10853</JournalID><VolumeIDStart>21</VolumeIDStart><VolumeIDEnd>21</VolumeIDEnd><IssueIDStart>4</IssueIDStart><IssueIDEnd>4</IssueIDEnd></ArticleContext></ArticleInfo><ArticleHeader><AuthorGroup><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>I.</GivenName><GivenName>S.</GivenName><FamilyName>Mulla</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>H.</GivenName><GivenName>S.</GivenName><FamilyName>Soni</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>V.</GivenName><GivenName>J.</GivenName><FamilyName>Rao</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>A.</GivenName><GivenName>P.</GivenName><GivenName>B.</GivenName><FamilyName>Sinha</FamilyName></AuthorName></Author><Affiliation ID="Aff1"><OrgDivision>Physical Chemistry Division</OrgDivision><OrgName>National Chemical Laboratory</OrgName><OrgAddress><Postcode>411008</Postcode><City>Poona</City><Country>India</Country></OrgAddress></Affiliation></AuthorGroup><Abstract ID="Abs1" Language="En"><Heading>Abstract</Heading><Para>Antimony-doped SnO<Subscript>2</Subscript> films with a resistivity as low as 9×10<Superscript>−4</Superscript> Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO<Subscript>2</Subscript> films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO<Subscript>2</Subscript> films.</Para></Abstract></ArticleHeader><NoBody></NoBody></Article></Issue></Volume></Journal></Publisher></istex:document></istex:metadataXml><mods version="3.6"><titleInfo lang="en"><title>Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title></titleInfo><titleInfo type="alternative" contentType="CDATA"><title>Deposition of improved optically selective conductive tin oxide films by spray pyrolysis</title></titleInfo><name type="personal"><namePart type="given">I.</namePart><namePart type="given">S.</namePart><namePart type="family">Mulla</namePart><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">H.</namePart><namePart type="given">S.</namePart><namePart type="family">Soni</namePart><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">V.</namePart><namePart type="given">J.</namePart><namePart type="family">Rao</namePart><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">A.</namePart><namePart type="given">P.</namePart><namePart type="given">B.</namePart><namePart type="family">Sinha</namePart><affiliation>Physical Chemistry Division, National Chemical Laboratory, 411008, Poona, India</affiliation><role><roleTerm type="text">author</roleTerm></role></name><typeOfResource>text</typeOfResource><genre type="research-article" displayLabel="OriginalPaper" authority="ISTEX" authorityURI="https://content-type.data.istex.fr" valueURI="https://content-type.data.istex.fr/ark:/67375/XTP-1JC4F85T-7">research-article</genre><originInfo><publisher>Kluwer Academic Publishers</publisher><place><placeTerm type="text">Dordrecht</placeTerm></place><dateCreated encoding="w3cdtf">1985-04-12</dateCreated><dateIssued encoding="w3cdtf">1986-04-01</dateIssued><copyrightDate encoding="w3cdtf">1986</copyrightDate></originInfo><language><languageTerm type="code" authority="rfc3066">en</languageTerm><languageTerm type="code" authority="iso639-2b">eng</languageTerm></language><abstract lang="en">Abstract: Antimony-doped SnO2 films with a resistivity as low as 9×10−4 Ωcm were prepared by spray pyrolysis. Structural, electrical and optical properties were studied by varying the antimony concentration, film thickness and deposition temperature. About 94% average transmission in the visible region and about 87% infrared reflectance were obtained for antimony-doped SnO2 films by a systematic optimization of the preparation parameters. As the best combination, an average transmission of 88% in the visible region and an infrared reflectance of 76% was possible for the doped SnO2 films.</abstract><note>Papers</note><relatedItem type="host"><titleInfo><title>Journal of Materials Science</title></titleInfo><titleInfo type="abbreviated"><title>J Mater Sci</title></titleInfo><genre type="journal" authority="ISTEX" authorityURI="https://publication-type.data.istex.fr" valueURI="https://publication-type.data.istex.fr/ark:/67375/JMC-0GLKJH51-B">journal</genre><originInfo><publisher>Springer</publisher><dateIssued encoding="w3cdtf">1986-04-01</dateIssued><copyrightDate encoding="w3cdtf">1986</copyrightDate></originInfo><subject><genre>Chemistry</genre><topic>Polymer Sciences</topic><topic>Industrial Chemistry/Chemical Engineering</topic><topic>Characterization and Evaluation Materials</topic><topic>Mechanics</topic></subject><identifier type="ISSN">0022-2461</identifier><identifier type="eISSN">1573-4803</identifier><identifier type="JournalID">10853</identifier><identifier type="IssueArticleCount">50</identifier><identifier type="VolumeIssueCount">12</identifier><part><date>1986</date><detail type="volume"><number>21</number><caption>vol.</caption></detail><detail type="issue"><number>4</number><caption>no.</caption></detail><extent unit="pages"><start>1280</start><end>1288</end></extent></part><recordInfo><recordOrigin>Chapman and Hall Ltd., 1986</recordOrigin></recordInfo></relatedItem><identifier type="istex">D055AE3FBF398EA63DF4B893410746645C3CDD6E</identifier><identifier type="ark">ark:/67375/1BB-1DHF6Q23-D</identifier><identifier type="DOI">10.1007/BF00553263</identifier><identifier type="ArticleID">BF00553263</identifier><identifier type="ArticleID">Art26</identifier><accessCondition type="use and reproduction" contentType="copyright">Chapman and Hall Ltd., 1986</accessCondition><recordInfo><recordContentSource authority="ISTEX" authorityURI="https://loaded-corpus.data.istex.fr" valueURI="https://loaded-corpus.data.istex.fr/ark:/67375/XBH-3XSW68JL-F">springer</recordContentSource><recordOrigin>Chapman and Hall Ltd., 1986</recordOrigin></recordInfo></mods><json:item><extension>json</extension><original>false</original><mimetype>application/json</mimetype><uri>https://api.istex.fr/ark:/67375/1BB-1DHF6Q23-D/record.json</uri></json:item></metadata><serie></serie></istex></record>Pour manipuler ce document sous Unix (Dilib)
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