EdenteV1, Istex, Corpus, bibRecord, 000115

Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale

Identifieur interne : 000115 ( Istex/Corpus ); précédent : 000114; suivant : 000116

Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale

Auteurs : Abdel-Aziz El Mel ; Marie Buffière ; Pierre-Yves Tessier ; Stephanos Konstantinidis ; Wei Xu ; Ke Du ; Ishan Wathuthanthri ; Chang-Hwan Choi ; Carla Bittencourt ; Rony Snyders

Source :

Small [ 1613-6810 ] ; 2013-09-09.

RBID : ISTEX:20836D62039F8A871DADA8350F6D89DCD4B7857B

English descriptors

Abstract

Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.

Url:

https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/pdf

DOI: 10.1002/smll.201202824

Links to Exploration step

ISTEX:20836D62039F8A871DADA8350F6D89DCD4B7857B

Le document en format XML

<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
<author><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>E-mail: Abdelaziz.elmel@gmail.com</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>Correspondence address: Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name>
<affiliation><mods:affiliation>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name>
<affiliation><mods:affiliation>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Konstantinidis, Stephanos" sort="Konstantinidis, Stephanos" uniqKey="Konstantinidis S" first="Stephanos" last="Konstantinidis">Stephanos Konstantinidis</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Xu, Wei" sort="Xu, Wei" uniqKey="Xu W" first="Wei" last="Xu">Wei Xu</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Du, Ke" sort="Du, Ke" uniqKey="Du K" first="Ke" last="Du">Ke Du</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Bittencourt, Carla" sort="Bittencourt, Carla" uniqKey="Bittencourt C" first="Carla" last="Bittencourt">Carla Bittencourt</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">ISTEX</idno>
<idno type="RBID">ISTEX:20836D62039F8A871DADA8350F6D89DCD4B7857B</idno>
<date when="2013" year="2013">2013</date>
<idno type="doi">10.1002/smll.201202824</idno>
<idno type="url">https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/pdf</idno>
<idno type="wicri:Area/Istex/Corpus">000115</idno>
<idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000115</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
<author><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>E-mail: Abdelaziz.elmel@gmail.com</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>Correspondence address: Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name>
<affiliation><mods:affiliation>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name>
<affiliation><mods:affiliation>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Konstantinidis, Stephanos" sort="Konstantinidis, Stephanos" uniqKey="Konstantinidis S" first="Stephanos" last="Konstantinidis">Stephanos Konstantinidis</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Xu, Wei" sort="Xu, Wei" uniqKey="Xu W" first="Wei" last="Xu">Wei Xu</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Du, Ke" sort="Du, Ke" uniqKey="Du K" first="Ke" last="Du">Ke Du</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name>
<affiliation><mods:affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Bittencourt, Carla" sort="Bittencourt, Carla" uniqKey="Bittencourt C" first="Carla" last="Bittencourt">Carla Bittencourt</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
<author><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name>
<affiliation><mods:affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
<affiliation><mods:affiliation>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium</mods:affiliation>
</affiliation>
</author>
</analytic>
<monogr></monogr>
<series><title level="j" type="main">Small</title>
<title level="j" type="alt">SMALL</title>
<idno type="ISSN">1613-6810</idno>
<idno type="eISSN">1613-6829</idno>
<imprint><biblScope unit="vol">9</biblScope>
<biblScope unit="issue">17</biblScope>
<biblScope unit="page" from="2838">2838</biblScope>
<biblScope unit="page" to="2843">2843</biblScope>
<biblScope unit="page-count">6</biblScope>
<publisher>WILEY‐VCH Verlag</publisher>
<pubPlace>Weinheim</pubPlace>
<date type="published" when="2013-09-09">2013-09-09</date>
</imprint>
<idno type="ISSN">1613-6810</idno>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><idno type="ISSN">1613-6810</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acta mater</term>
<term>Annealing</term>
<term>Annealing time</term>
<term>Aspect ratio</term>
<term>Bulk diffusion</term>
<term>Choi</term>
<term>Columnar morphology</term>
<term>Complete oxidation</term>
<term>Copper ions</term>
<term>Copper nanowires</term>
<term>Copper oxide nanotubes</term>
<term>Critical temperature</term>
<term>Deep reactive</term>
<term>Different shapes</term>
<term>Fundamental mechanisms</term>
<term>Grain boundaries</term>
<term>Granular morphology</term>
<term>Hollow nanostructures</term>
<term>Hollow oxide</term>
<term>Hollow oxide nanostructures</term>
<term>Hollowing process</term>
<term>Kirkendall</term>
<term>Kirkendall effect</term>
<term>Laser interference lithography</term>
<term>Magnetron</term>
<term>Mater</term>
<term>Metal nanowires</term>
<term>Model system</term>
<term>Morphology</term>
<term>Nano lett</term>
<term>Nanodots</term>
<term>Nanograting structures</term>
<term>Nanopatterned silicon substrate</term>
<term>Nanoscale kirkendall effect</term>
<term>Nanostructures</term>
<term>Nanotube</term>
<term>Nanotube arrays</term>
<term>Nanowire</term>
<term>Nanowires</term>
<term>Oxidation process</term>
<term>Oxide</term>
<term>Oxide nanotubes</term>
<term>Oxide shell</term>
<term>Oxygen atoms</term>
<term>Oxygen ions</term>
<term>Oxygen species</term>
<term>Silicon</term>
<term>Silicon substrate</term>
<term>Surface diffusion</term>
<term>Surface energy</term>
<term>Thermal annealing</term>
<term>Thermal oxidation</term>
<term>Thermal oxidation time</term>
<term>Total diameter</term>
<term>Transmission electron microscopy</term>
<term>Verlag gmbh</term>
<term>Weak adhesion</term>
<term>Wire axis</term>
</keywords>
<keywords scheme="Teeft" xml:lang="en"><term>Acta mater</term>
<term>Annealing</term>
<term>Annealing time</term>
<term>Aspect ratio</term>
<term>Bulk diffusion</term>
<term>Choi</term>
<term>Columnar morphology</term>
<term>Complete oxidation</term>
<term>Copper ions</term>
<term>Copper nanowires</term>
<term>Copper oxide nanotubes</term>
<term>Critical temperature</term>
<term>Deep reactive</term>
<term>Different shapes</term>
<term>Fundamental mechanisms</term>
<term>Grain boundaries</term>
<term>Granular morphology</term>
<term>Hollow nanostructures</term>
<term>Hollow oxide</term>
<term>Hollow oxide nanostructures</term>
<term>Hollowing process</term>
<term>Kirkendall</term>
<term>Kirkendall effect</term>
<term>Laser interference lithography</term>
<term>Magnetron</term>
<term>Mater</term>
<term>Metal nanowires</term>
<term>Model system</term>
<term>Morphology</term>
<term>Nano lett</term>
<term>Nanodots</term>
<term>Nanograting structures</term>
<term>Nanopatterned silicon substrate</term>
<term>Nanoscale kirkendall effect</term>
<term>Nanostructures</term>
<term>Nanotube</term>
<term>Nanotube arrays</term>
<term>Nanowire</term>
<term>Nanowires</term>
<term>Oxidation process</term>
<term>Oxide</term>
<term>Oxide nanotubes</term>
<term>Oxide shell</term>
<term>Oxygen atoms</term>
<term>Oxygen ions</term>
<term>Oxygen species</term>
<term>Silicon</term>
<term>Silicon substrate</term>
<term>Surface diffusion</term>
<term>Surface energy</term>
<term>Thermal annealing</term>
<term>Thermal oxidation</term>
<term>Thermal oxidation time</term>
<term>Total diameter</term>
<term>Transmission electron microscopy</term>
<term>Verlag gmbh</term>
<term>Weak adhesion</term>
<term>Wire axis</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract">Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.</div>
</front>
</TEI>
<istex><corpusName>wiley</corpusName>
<keywords><teeft><json:string>nanowires</json:string>
<json:string>nanostructures</json:string>
<json:string>nanotube</json:string>
<json:string>kirkendall</json:string>
<json:string>annealing</json:string>
<json:string>oxide nanotubes</json:string>
<json:string>magnetron</json:string>
<json:string>thermal oxidation</json:string>
<json:string>nanodots</json:string>
<json:string>hollow nanostructures</json:string>
<json:string>kirkendall effect</json:string>
<json:string>choi</json:string>
<json:string>copper nanowires</json:string>
<json:string>nanowire</json:string>
<json:string>oxide</json:string>
<json:string>verlag gmbh</json:string>
<json:string>surface diffusion</json:string>
<json:string>copper ions</json:string>
<json:string>silicon</json:string>
<json:string>oxide shell</json:string>
<json:string>hollow oxide nanostructures</json:string>
<json:string>nanoscale kirkendall effect</json:string>
<json:string>oxidation process</json:string>
<json:string>deep reactive</json:string>
<json:string>complete oxidation</json:string>
<json:string>oxygen ions</json:string>
<json:string>granular morphology</json:string>
<json:string>grain boundaries</json:string>
<json:string>laser interference lithography</json:string>
<json:string>metal nanowires</json:string>
<json:string>fundamental mechanisms</json:string>
<json:string>annealing time</json:string>
<json:string>hollow oxide</json:string>
<json:string>nanopatterned silicon substrate</json:string>
<json:string>thermal oxidation time</json:string>
<json:string>mater</json:string>
<json:string>morphology</json:string>
<json:string>hollowing process</json:string>
<json:string>weak adhesion</json:string>
<json:string>thermal annealing</json:string>
<json:string>nanotube arrays</json:string>
<json:string>critical temperature</json:string>
<json:string>oxygen atoms</json:string>
<json:string>copper oxide nanotubes</json:string>
<json:string>transmission electron microscopy</json:string>
<json:string>nanograting structures</json:string>
<json:string>silicon substrate</json:string>
<json:string>wire axis</json:string>
<json:string>model system</json:string>
<json:string>bulk diffusion</json:string>
<json:string>different shapes</json:string>
<json:string>columnar morphology</json:string>
<json:string>surface energy</json:string>
<json:string>oxygen species</json:string>
<json:string>aspect ratio</json:string>
<json:string>total diameter</json:string>
<json:string>nano lett</json:string>
<json:string>acta mater</json:string>
</teeft>
</keywords>
<author><json:item><name>Abdel‐Aziz El Mel</name>
<affiliations><json:string>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</json:string>
<json:string>E-mail: Abdelaziz.elmel@gmail.com</json:string>
<json:string>Correspondence address: Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</json:string>
</affiliations>
</json:item>
<json:item><name>Marie Buffière</name>
<affiliations><json:string>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium</json:string>
<json:string>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium</json:string>
</affiliations>
</json:item>
<json:item><name>Pierre‐Yves Tessier</name>
<affiliations><json:string>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France</json:string>
</affiliations>
</json:item>
<json:item><name>Stephanos Konstantinidis</name>
<affiliations><json:string>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</json:string>
</affiliations>
</json:item>
<json:item><name>Wei Xu</name>
<affiliations><json:string>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</json:string>
</affiliations>
</json:item>
<json:item><name>Ke Du</name>
<affiliations><json:string>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</json:string>
</affiliations>
</json:item>
<json:item><name>Ishan Wathuthanthri</name>
<affiliations><json:string>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</json:string>
</affiliations>
</json:item>
<json:item><name>Chang‐Hwan Choi</name>
<affiliations><json:string>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</json:string>
</affiliations>
</json:item>
<json:item><name>Carla Bittencourt</name>
<affiliations><json:string>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</json:string>
</affiliations>
</json:item>
<json:item><name>Rony Snyders</name>
<affiliations><json:string>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</json:string>
<json:string>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium</json:string>
</affiliations>
</json:item>
</author>
<subject><json:item><lang><json:string>eng</json:string>
</lang>
<value>Kirkendall effect</value>
</json:item>
<json:item><lang><json:string>eng</json:string>
</lang>
<value>metal oxides</value>
</json:item>
<json:item><lang><json:string>eng</json:string>
</lang>
<value>nanotubes</value>
</json:item>
<json:item><lang><json:string>eng</json:string>
</lang>
<value>hollow nanostructures</value>
</json:item>
<json:item><lang><json:string>eng</json:string>
</lang>
<value>nanofabrication</value>
</json:item>
</subject>
<articleId><json:string>SMLL201202824</json:string>
</articleId>
<arkIstex>ark:/67375/WNG-20QK76N5-H</arkIstex>
<language><json:string>eng</json:string>
</language>
<originalGenre><json:string>shortCommunication</json:string>
</originalGenre>
<abstract>Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.</abstract>
<qualityIndicators><score>6.696</score>
<pdfWordCount>3964</pdfWordCount>
<pdfCharCount>23668</pdfCharCount>
<pdfVersion>1.3</pdfVersion>
<pdfPageCount>6</pdfPageCount>
<pdfPageSize>595.276 x 793.701 pts</pdfPageSize>
<refBibsNative>true</refBibsNative>
<abstractWordCount>61</abstractWordCount>
<abstractCharCount>451</abstractCharCount>
<keywordCount>5</keywordCount>
</qualityIndicators>
<title>Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
<pmid><json:string>23440974</json:string>
</pmid>
<genre><json:string>brief-communication</json:string>
</genre>
<host><title>Small</title>
<language><json:string>unknown</json:string>
</language>
<doi><json:string>10.1002/(ISSN)1613-6829</json:string>
</doi>
<issn><json:string>1613-6810</json:string>
</issn>
<eissn><json:string>1613-6829</json:string>
</eissn>
<publisherId><json:string>SMLL</json:string>
</publisherId>
<volume>9</volume>
<issue>17</issue>
<pages><first>2838</first>
<last>2843</last>
<total>6</total>
</pages>
<genre><json:string>journal</json:string>
</genre>
<subject><json:item><value>Communication</value>
</json:item>
</subject>
</host>
<namedEntities><unitex><date><json:string>1942</json:string>
<json:string>2013</json:string>
</date>
<geogName></geogName>
<orgName><json:string>Department of Electrical Engineering KU Leuven</json:string>
<json:string>Materia Nova Research Center</json:string>
<json:string>European Commission</json:string>
<json:string>University of Mons</json:string>
<json:string>Belgium DOI</json:string>
<json:string>Choi Department of Mechanical Engineering Stevens Institute of Technology Hoboken, NJ</json:string>
<json:string>National Funds for Scienti</json:string>
<json:string>InTech, Croatia</json:string>
</orgName>
<orgName_funder></orgName_funder>
<orgName_provider></orgName_provider>
<persName><json:string>Chang-Hwan Choi</json:string>
<json:string>J. Appl</json:string>
<json:string>Q. Li</json:string>
<json:string>J. E. Greene</json:string>
<json:string>A. Granier</json:string>
<json:string>E. O. Kirkendall</json:string>
<json:string>B. Angleraud</json:string>
<json:string>Pierre-Yves Tessier</json:string>
<json:string>P. J. Ferreira</json:string>
<json:string>W. K. Chim</json:string>
<json:string>K. Nielsch</json:string>
<json:string>J. Cho</json:string>
<json:string>S. Fujimoto</json:string>
<json:string>S. Y. Chiam</json:string>
<json:string>N. Wada</json:string>
<json:string>Carla Bittencourt</json:string>
<json:string>A. A. El Mel</json:string>
<json:string>L. A. Archer</json:string>
<json:string>H. Choi</json:string>
<json:string>N. Hongsith</json:string>
<json:string>R. Scholz</json:string>
<json:string>M. H. Park</json:string>
<json:string>Stephanos Konstantinidis</json:string>
<json:string>T. Gloriant</json:string>
<json:string>R. M. Penner</json:string>
<json:string>R. Snyders</json:string>
<json:string>J. Phys</json:string>
<json:string>J. Q. Huang</json:string>
<json:string>S. Choopun</json:string>
<json:string>L. Jiang</json:string>
<json:string>M. Buf</json:string>
<json:string>S. Goetze</json:string>
<json:string>E. Gautron</json:string>
<json:string>J. S. Chen</json:string>
<json:string>Ke Du</json:string>
<json:string>H. Nakajima</json:string>
<json:string>J. Kim</json:string>
<json:string>W. Mao</json:string>
<json:string>M. E. Read</json:string>
<json:string>J. G. Lee</json:string>
<json:string>K. Du</json:string>
<json:string>Z. Boumerzoug</json:string>
<json:string>J. Vac</json:string>
<json:string>S. Iijima</json:string>
<json:string>M. Knez</json:string>
<json:string>N. Ramgir</json:string>
<json:string>Nano Lett</json:string>
<json:string>Nicolas Copernic</json:string>
<json:string>J. Wang</json:string>
<json:string>J. Gao</json:string>
<json:string>P. B. Barna</json:string>
<json:string>X. W. Lou</json:string>
<json:string>S. Ko</json:string>
<json:string>C. H. Choi</json:string>
<json:string>F. Güder</json:string>
<json:string>Y. Yang</json:string>
<json:string>I. Wathuthanthri</json:string>
<json:string>T. Oyama</json:string>
<json:string>W. Xu</json:string>
<json:string>X. Zhang</json:string>
<json:string>Jean Rouxel</json:string>
<json:string>L. Liu</json:string>
<json:string>L. Hultman</json:string>
<json:string>M. Zacharias</json:string>
<json:string>E. Wongrat</json:string>
<json:string>Y. Ren</json:string>
<json:string>C. J. Kim</json:string>
<json:string>S. Hamaguchi</json:string>
<json:string>S. Hughes</json:string>
<json:string>A. C. Johnston-Peck</json:string>
<json:string>U. Gosele</json:string>
<json:string>E. Pippel</json:string>
<json:string>J. S. Pan</json:string>
<json:string>H. Mori</json:string>
<json:string>A. P. Alivisatos</json:string>
<json:string>C. M. Li</json:string>
<json:string>R. Nakamura</json:string>
<json:string>R. M. Rioux</json:string>
<json:string>C. N. R. Rao</json:string>
<json:string>G. Matsubayashi</json:string>
<json:string>P. Y. Tessier</json:string>
<json:string>D. Tokozakura</json:string>
<json:string>P. Prete</json:string>
<json:string>V. F. Puntes</json:string>
<json:string>O. Albrecht</json:string>
<json:string>K. Raidongia</json:string>
<json:string>B. Xu</json:string>
<json:string>U. Jeong</json:string>
<json:string>Y. Cho</json:string>
<json:string>C. K. Erdonmez</json:string>
<json:string>B. Mayers</json:string>
<json:string>U. Gösele</json:string>
<json:string>G. Benchabane</json:string>
<json:string>N. Cabrera</json:string>
<json:string>J. Arbiol</json:string>
<json:string>E. González</json:string>
<json:string>Rony Snyders</json:string>
<json:string>C. Bittencourt</json:string>
<json:string>I. Thibon</json:string>
<json:string>I. Petrov</json:string>
<json:string>H. J. Fan</json:string>
<json:string>B. Zhang</json:string>
<json:string>A. Berger</json:string>
<json:string>K. Kim</json:string>
<json:string>H. Tsuchiya</json:string>
<json:string>N. F. Mott</json:string>
<json:string>Y. Yin</json:string>
<json:string>G. A. Somorjai</json:string>
<json:string>J. B. Tracy</json:string>
<json:string>H. Takagi</json:string>
<json:string>S. M. Rossnagel</json:string>
<json:string>Y. Sun</json:string>
<json:string>W. W. Zhou</json:string>
<json:string>D. B. Butrymowicz</json:string>
<json:string>J. G. Railsback</json:string>
<json:string>G. D. Moon</json:string>
<json:string>M. Liu</json:string>
<json:string>Y. Liu</json:string>
<json:string>C. Pi</json:string>
<json:string>Z. Yang</json:string>
<json:string>S. Konstantinidis</json:string>
<json:string>Y. Min</json:string>
<json:string>Y. Xia</json:string>
<json:string>Marie Buf</json:string>
</persName>
<placeName><json:string>MATERA</json:string>
<json:string>Nantes</json:string>
<json:string>France</json:string>
<json:string>Belgium</json:string>
</placeName>
<ref_url></ref_url>
<ref_bibl><json:string>Gao et al.</json:string>
<json:string>[28]</json:string>
<json:string>[1]</json:string>
<json:string>Fan et al.</json:string>
<json:string>A. A. El Mel et al.</json:string>
</ref_bibl>
<bibl></bibl>
</unitex>
</namedEntities>
<ark><json:string>ark:/67375/WNG-20QK76N5-H</json:string>
</ark>
<categories><wos><json:string>1 - science</json:string>
<json:string>2 - physics, condensed matter</json:string>
<json:string>2 - physics, applied</json:string>
<json:string>2 - nanoscience & nanotechnology</json:string>
<json:string>2 - materials science, multidisciplinary</json:string>
<json:string>2 - chemistry, physical</json:string>
<json:string>2 - chemistry, multidisciplinary</json:string>
</wos>
<scienceMetrix><json:string>1 - applied sciences</json:string>
<json:string>2 - enabling & strategic technologies</json:string>
<json:string>3 - nanoscience & nanotechnology</json:string>
</scienceMetrix>
<scopus><json:string>1 - Physical Sciences</json:string>
<json:string>2 - Engineering</json:string>
<json:string>3 - Engineering (miscellaneous)</json:string>
<json:string>1 - Physical Sciences</json:string>
<json:string>2 - Materials Science</json:string>
<json:string>3 - Biomaterials</json:string>
<json:string>1 - Life Sciences</json:string>
<json:string>2 - Biochemistry, Genetics and Molecular Biology</json:string>
<json:string>3 - Biotechnology</json:string>
</scopus>
</categories>
<publicationDate>2013</publicationDate>
<copyrightDate>2013</copyrightDate>
<doi><json:string>10.1002/smll.201202824</json:string>
</doi>
<id>20836D62039F8A871DADA8350F6D89DCD4B7857B</id>
<score>1</score>
<fulltext><json:item><extension>pdf</extension>
<original>true</original>
<mimetype>application/pdf</mimetype>
<uri>https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/pdf</uri>
</json:item>
<json:item><extension>zip</extension>
<original>false</original>
<mimetype>application/zip</mimetype>
<uri>https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/zip</uri>
</json:item>
<istex:fulltextTEI uri="https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/tei"><teiHeader><fileDesc><titleStmt><title level="a" type="main" xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
</titleStmt>
<publicationStmt><authority>ISTEX</authority>
<publisher>WILEY‐VCH Verlag</publisher>
<pubPlace>Weinheim</pubPlace>
<availability><licence>Copyright © 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</licence>
</availability>
<date type="published" when="2013-09-09"></date>
</publicationStmt>
<notesStmt><note type="content-type" subtype="brief-communication" source="shortCommunication" scheme="https://content-type.data.istex.fr/ark:/67375/XTP-S9SX2MFS-0">brief-communication</note>
<note type="publication-type" subtype="journal" scheme="https://publication-type.data.istex.fr/ark:/67375/JMC-0GLKJH51-B">journal</note>
</notesStmt>
<sourceDesc><biblStruct type="brief-communication"><analytic><title level="a" type="main" xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
<author xml:id="author-0000" role="corresp"><persName><forename type="first">Abdel‐Aziz</forename>
<surname>El Mel</surname>
</persName>
<email>Abdelaziz.elmel@gmail.com</email>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium<address><country key="BE"></country>
</address>
</affiliation>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</affiliation>
</author>
<author xml:id="author-0001"><persName><forename type="first">Marie</forename>
<surname>Buffière</surname>
</persName>
<affiliation>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium<address><country key="BE"></country>
</address>
</affiliation>
<affiliation>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium<address><country key="BE"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0002"><persName><forename type="first">Pierre‐Yves</forename>
<surname>Tessier</surname>
</persName>
<affiliation>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France<address><country key="FR"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0003"><persName><forename type="first">Stephanos</forename>
<surname>Konstantinidis</surname>
</persName>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium<address><country key="BE"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0004"><persName><forename type="first">Wei</forename>
<surname>Xu</surname>
</persName>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA<address><country key="US"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0005"><persName><forename type="first">Ke</forename>
<surname>Du</surname>
</persName>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA<address><country key="US"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0006"><persName><forename type="first">Ishan</forename>
<surname>Wathuthanthri</surname>
</persName>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA<address><country key="US"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0007"><persName><forename type="first">Chang‐Hwan</forename>
<surname>Choi</surname>
</persName>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA<address><country key="US"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0008"><persName><forename type="first">Carla</forename>
<surname>Bittencourt</surname>
</persName>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium<address><country key="BE"></country>
</address>
</affiliation>
</author>
<author xml:id="author-0009"><persName><forename type="first">Rony</forename>
<surname>Snyders</surname>
</persName>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium<address><country key="BE"></country>
</address>
</affiliation>
<affiliation>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium<address><country key="BE"></country>
</address>
</affiliation>
</author>
<idno type="istex">20836D62039F8A871DADA8350F6D89DCD4B7857B</idno>
<idno type="ark">ark:/67375/WNG-20QK76N5-H</idno>
<idno type="DOI">10.1002/smll.201202824</idno>
<idno type="unit">SMLL201202824</idno>
<idno type="toTypesetVersion">file:SMLL.SMLL201202824.pdf</idno>
</analytic>
<monogr><title level="j" type="main">Small</title>
<title level="j" type="alt">SMALL</title>
<idno type="pISSN">1613-6810</idno>
<idno type="eISSN">1613-6829</idno>
<idno type="book-DOI">10.1002/(ISSN)1613-6829</idno>
<idno type="book-part-DOI">10.1002/smll.v9.17</idno>
<idno type="product">SMLL</idno>
<imprint><biblScope unit="vol">9</biblScope>
<biblScope unit="issue">17</biblScope>
<biblScope unit="page" from="2838">2838</biblScope>
<biblScope unit="page" to="2843">2843</biblScope>
<biblScope unit="page-count">6</biblScope>
<publisher>WILEY‐VCH Verlag</publisher>
<pubPlace>Weinheim</pubPlace>
<date type="published" when="2013-09-09"></date>
</imprint>
</monogr>
</biblStruct>
</sourceDesc>
</fileDesc>
<profileDesc><abstract xml:lang="en" style="graphical"><p><hi rend="bold">Highly ordered ultra‐long oxide nanotubes</hi> are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.
<figure type="box"><media mimeType="image" url="urn:x-wiley:16136810:media:SMLL201202824:content"></media>
</figure>
</p>
</abstract>
<textClass><keywords xml:lang="en"><term xml:id="kwd1">Kirkendall effect</term>
<term xml:id="kwd2">metal oxides</term>
<term xml:id="kwd3">nanotubes</term>
<term xml:id="kwd4">hollow nanostructures</term>
<term xml:id="kwd5">nanofabrication</term>
</keywords>
<keywords rend="articleCategory"><term>Communication</term>
</keywords>
<keywords rend="tocHeading1"><term>Communications</term>
</keywords>
</textClass>
<langUsage><language ident="en"></language>
</langUsage>
</profileDesc>
</teiHeader>
</istex:fulltextTEI>
<json:item><extension>txt</extension>
<original>false</original>
<mimetype>text/plain</mimetype>
<uri>https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/txt</uri>
</json:item>
</fulltext>
<metadata><istex:metadataXml wicri:clean="Wiley, elements deleted: body"><istex:xmlDeclaration>version="1.0" encoding="UTF-8" standalone="yes"</istex:xmlDeclaration>
<istex:document><component version="2.0" type="serialArticle" xml:lang="en"><header><publicationMeta level="product"><publisherInfo><publisherName>WILEY‐VCH Verlag</publisherName>
<publisherLoc>Weinheim</publisherLoc>
</publisherInfo>
<doi registered="yes">10.1002/(ISSN)1613-6829</doi>
<issn type="print">1613-6810</issn>
<issn type="electronic">1613-6829</issn>
<idGroup><id type="product" value="SMLL"></id>
</idGroup>
<titleGroup><title type="main" xml:lang="en" sort="SMALL">Small</title>
<title type="short">Small</title>
</titleGroup>
</publicationMeta>
<publicationMeta level="part" position="170"><doi origin="wiley" registered="yes">10.1002/smll.v9.17</doi>
<numberingGroup><numbering type="journalVolume" number="9">9</numbering>
<numbering type="journalIssue">17</numbering>
</numberingGroup>
<coverDate startDate="2013-09-09">September 9, 2013</coverDate>
</publicationMeta>
<publicationMeta level="unit" type="shortCommunication" position="7" status="forIssue"><doi origin="wiley" registered="yes">10.1002/smll.201202824</doi>
<idGroup><id type="unit" value="SMLL201202824"></id>
</idGroup>
<countGroup><count type="pageTotal" number="6"></count>
</countGroup>
<titleGroup><title type="articleCategory">Communication</title>
<title type="tocHeading1">Communications</title>
</titleGroup>
<copyright ownership="publisher">Copyright © 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</copyright>
<eventGroup><event type="manuscriptReceived" date="2012-11-13"></event>
<event type="manuscriptRevised" date="2012-12-26"></event>
<event type="xmlConverted" agent="Converter:JWSART34_TO_WML3G version:3.2.3 mode:FullText" date="2013-09-03"></event>
<event type="publishedOnlineEarlyUnpaginated" date="2013-02-26"></event>
<event type="firstOnline" date="2013-02-26"></event>
<event type="publishedOnlineFinalForm" date="2013-09-03"></event>
<event type="xmlConverted" agent="Converter:WILEY_ML3G_TO_WILEY_ML3GV2 version:3.8.8" date="2014-02-08"></event>
<event type="xmlConverted" agent="Converter:WML3G_To_WML3G version:4.6.4 mode:FullText" date="2015-10-03"></event>
</eventGroup>
<numberingGroup><numbering type="pageFirst">2838</numbering>
<numbering type="pageLast">2843</numbering>
</numberingGroup>
<correspondenceTo>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</correspondenceTo>
<linkGroup><link type="toTypesetVersion" href="file:SMLL.SMLL201202824.pdf"></link>
</linkGroup>
</publicationMeta>
<contentMeta><countGroup><count type="figureTotal" number="6"></count>
<count type="referenceTotal" number="31"></count>
</countGroup>
<titleGroup><title type="main" xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
</titleGroup>
<creators><creator xml:id="au1" creatorRole="author" affiliationRef="#af1" corresponding="yes"><personName><givenNames>Abdel‐Aziz</givenNames>
<familyName>El Mel</familyName>
</personName>
<contactDetails><email>Abdelaziz.elmel@gmail.com</email>
</contactDetails>
</creator>
<creator xml:id="au2" creatorRole="author" affiliationRef="#af2 #af3"><personName><givenNames>Marie</givenNames>
<familyName>Buffière</familyName>
</personName>
</creator>
<creator xml:id="au3" creatorRole="author" affiliationRef="#af4"><personName><givenNames>Pierre‐Yves</givenNames>
<familyName>Tessier</familyName>
</personName>
</creator>
<creator xml:id="au4" creatorRole="author" affiliationRef="#af1"><personName><givenNames>Stephanos</givenNames>
<familyName>Konstantinidis</familyName>
</personName>
</creator>
<creator xml:id="au5" creatorRole="author" affiliationRef="#af5"><personName><givenNames>Wei</givenNames>
<familyName>Xu</familyName>
</personName>
</creator>
<creator xml:id="au6" creatorRole="author" affiliationRef="#af5"><personName><givenNames>Ke</givenNames>
<familyName>Du</familyName>
</personName>
</creator>
<creator xml:id="au7" creatorRole="author" affiliationRef="#af5"><personName><givenNames>Ishan</givenNames>
<familyName>Wathuthanthri</familyName>
</personName>
</creator>
<creator xml:id="au8" creatorRole="author" affiliationRef="#af5"><personName><givenNames>Chang‐Hwan</givenNames>
<familyName>Choi</familyName>
</personName>
</creator>
<creator xml:id="au9" creatorRole="author" affiliationRef="#af1"><personName><givenNames>Carla</givenNames>
<familyName>Bittencourt</familyName>
</personName>
</creator>
<creator xml:id="au10" creatorRole="author" affiliationRef="#af1 #af6"><personName><givenNames>Rony</givenNames>
<familyName>Snyders</familyName>
</personName>
</creator>
</creators>
<affiliationGroup><affiliation xml:id="af1" countryCode="BE" type="organization"><unparsedAffiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</unparsedAffiliation>
</affiliation>
<affiliation xml:id="af2" countryCode="BE" type="organization"><unparsedAffiliation>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium</unparsedAffiliation>
</affiliation>
<affiliation xml:id="af3" countryCode="BE" type="organization"><unparsedAffiliation>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium</unparsedAffiliation>
</affiliation>
<affiliation xml:id="af4" countryCode="FR" type="organization"><unparsedAffiliation>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France</unparsedAffiliation>
</affiliation>
<affiliation xml:id="af5" countryCode="US" type="organization"><unparsedAffiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</unparsedAffiliation>
</affiliation>
<affiliation xml:id="af6" countryCode="BE" type="organization"><unparsedAffiliation>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium</unparsedAffiliation>
</affiliation>
</affiliationGroup>
<keywordGroup xml:lang="en" type="author"><keyword xml:id="kwd1">Kirkendall effect</keyword>
<keyword xml:id="kwd2">metal oxides</keyword>
<keyword xml:id="kwd3">nanotubes</keyword>
<keyword xml:id="kwd4">hollow nanostructures</keyword>
<keyword xml:id="kwd5">nanofabrication</keyword>
</keywordGroup>
<supportingInformation><p>As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re‐organized for online delivery, but are not copy‐edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. 
</p>
<supportingInfoItem><mediaResource alt="supporting information" href="urn-x:wiley:16136810:media:smll201202824:smll_201202824_sm_suppl"></mediaResource>
<caption>suppl</caption>
</supportingInfoItem>
</supportingInformation>
<abstractGroup><abstract type="graphical" xml:lang="en"><p><b>Highly ordered ultra‐long oxide nanotubes</b> are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.
<blockFixed type="graphic"><mediaResourceGroup><mediaResource alt="image" eRights="yes" copyright="WILEY-VCH" href="urn:x-wiley:16136810:media:SMLL201202824:content"></mediaResource>
</mediaResourceGroup>
</blockFixed>
</p>
</abstract>
</abstractGroup>
</contentMeta>
</header>
</component>
</istex:document>
</istex:metadataXml>
<mods version="3.6"><titleInfo lang="en"><title>Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
</titleInfo>
<titleInfo type="alternative" contentType="CDATA" lang="en"><title>Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title>
</titleInfo>
<name type="personal"><namePart type="given">Abdel‐Aziz</namePart>
<namePart type="family">El Mel</namePart>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</affiliation>
<affiliation>E-mail: Abdelaziz.elmel@gmail.com</affiliation>
<affiliation>Correspondence address: Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium.</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Marie</namePart>
<namePart type="family">Buffière</namePart>
<affiliation>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee, Belgium</affiliation>
<affiliation>IMEC Kapeldreef 75, B‐3001 Heverlee, Belgium</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Pierre‐Yves</namePart>
<namePart type="family">Tessier</namePart>
<affiliation>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3, France</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Stephanos</namePart>
<namePart type="family">Konstantinidis</namePart>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Wei</namePart>
<namePart type="family">Xu</namePart>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Ke</namePart>
<namePart type="family">Du</namePart>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Ishan</namePart>
<namePart type="family">Wathuthanthri</namePart>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Chang‐Hwan</namePart>
<namePart type="family">Choi</namePart>
<affiliation>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030, USA</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Carla</namePart>
<namePart type="family">Bittencourt</namePart>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<name type="personal"><namePart type="given">Rony</namePart>
<namePart type="family">Snyders</namePart>
<affiliation>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons, Belgium</affiliation>
<affiliation>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons, Belgium</affiliation>
<role><roleTerm type="text">author</roleTerm>
</role>
</name>
<typeOfResource>text</typeOfResource>
<genre type="brief-communication" displayLabel="shortCommunication" authority="ISTEX" authorityURI="https://content-type.data.istex.fr" valueURI="https://content-type.data.istex.fr/ark:/67375/XTP-S9SX2MFS-0">brief-communication</genre>
<originInfo><publisher>WILEY‐VCH Verlag</publisher>
<place><placeTerm type="text">Weinheim</placeTerm>
</place>
<dateIssued encoding="w3cdtf">2013-09-09</dateIssued>
<dateCaptured encoding="w3cdtf">2012-11-13</dateCaptured>
<copyrightDate encoding="w3cdtf">2013</copyrightDate>
</originInfo>
<language><languageTerm type="code" authority="rfc3066">en</languageTerm>
<languageTerm type="code" authority="iso639-2b">eng</languageTerm>
</language>
<physicalDescription><extent unit="figures">6</extent>
<extent unit="references">31</extent>
</physicalDescription>
<abstract>Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.</abstract>
<subject lang="en"><genre>keywords</genre>
<topic>Kirkendall effect</topic>
<topic>metal oxides</topic>
<topic>nanotubes</topic>
<topic>hollow nanostructures</topic>
<topic>nanofabrication</topic>
</subject>
<relatedItem type="host"><titleInfo><title>Small</title>
</titleInfo>
<titleInfo type="abbreviated"><title>Small</title>
</titleInfo>
<genre type="journal" authority="ISTEX" authorityURI="https://publication-type.data.istex.fr" valueURI="https://publication-type.data.istex.fr/ark:/67375/JMC-0GLKJH51-B">journal</genre>
<note type="content"> As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re‐organized for online delivery, but are not copy‐edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors.Supporting Info Item: suppl - </note>
<subject><genre>article-category</genre>
<topic>Communication</topic>
</subject>
<identifier type="ISSN">1613-6810</identifier>
<identifier type="eISSN">1613-6829</identifier>
<identifier type="DOI">10.1002/(ISSN)1613-6829</identifier>
<identifier type="PublisherID">SMLL</identifier>
<part><date>2013</date>
<detail type="volume"><caption>vol.</caption>
<number>9</number>
</detail>
<detail type="issue"><caption>no.</caption>
<number>17</number>
</detail>
<extent unit="pages"><start>2838</start>
<end>2843</end>
<total>6</total>
</extent>
</part>
</relatedItem>
<identifier type="istex">20836D62039F8A871DADA8350F6D89DCD4B7857B</identifier>
<identifier type="ark">ark:/67375/WNG-20QK76N5-H</identifier>
<identifier type="DOI">10.1002/smll.201202824</identifier>
<identifier type="ArticleID">SMLL201202824</identifier>
<accessCondition type="use and reproduction" contentType="copyright">Copyright © 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim</accessCondition>
<recordInfo><recordContentSource authority="ISTEX" authorityURI="https://loaded-corpus.data.istex.fr" valueURI="https://loaded-corpus.data.istex.fr/ark:/67375/XBH-L0C46X92-X">wiley</recordContentSource>
<recordOrigin>WILEY‐VCH Verlag</recordOrigin>
</recordInfo>
</mods>
<json:item><extension>json</extension>
<original>false</original>
<mimetype>application/json</mimetype>
<uri>https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/metadata/json</uri>
</json:item>
</metadata>
<serie></serie>
</istex>
</record>

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Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale

Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale

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