Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask
Identifieur interne : 000156 ( PascalFrancis/Curation ); précédent : 000155; suivant : 000157Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask
Auteurs : Jai-Cheol Lee [Corée du Sud] ; Yong-Ho Oh [Corée du Sud] ; Sungwoo Lim [Corée du Sud] ; Chun Soo Go [Corée du Sud] ; Sung Su Roh [Corée du Sud]Source :
- Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers [ 0021-4922 ] ; 2004-02.
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- Pascal (Inist)
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Abstract
The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics
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<front><div type="abstract" xml:lang="en">The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics</div>
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