OperaV1, PascalFrancis, Curation, bibRecord, 000156

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Identifieur interne : 000156 ( PascalFrancis/Curation ); précédent : 000155; suivant : 000157

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Auteurs : Jai-Cheol Lee [Corée du Sud] ; Yong-Ho Oh [Corée du Sud] ; Sungwoo Lim [Corée du Sud] ; Chun Soo Go [Corée du Sud] ; Sung Su Roh [Corée du Sud]

Source :

Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers [ 0021-4922 ] ; 2004-02.

RBID : Pascal:04-0165991

Descripteurs français

Pascal (Inist)
- 8540H, Etude théorique, Méthode mesure, Photolithographie, Masque déphasage, Effet proximité(lithographie), Méthode Monte Carlo, Convergence méthode numérique, Technologie circuit intégré, Technique conception optique, Automatisation conception électronique.

English descriptors

KwdEn :
- Convergence of numerical methods, Electronic design automation, Integrated circuit technology, Measuring methods, Monte Carlo methods, Optical design techniques, Phase shifting masks, Photolithography, Proximity effect (lithography), Theoretical study.

Abstract

The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics

A01	`01`	`1`		`@0 0021-4922`
A02	`01`			`@0 JAPNDE`
A03		`1`		`@0 Jpn. J. Appl. Phys., Part I`
A05				`@2 43`
A06				`@2 2`
A08	`01`	`1`	`ENG`	`@1 Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask`
A11	`01`	`1`		`@1 LEE (Jai-Cheol)`
A11	`02`	`1`		`@1 OH (Yong-Ho)`
A11	`03`	`1`		`@1 LIM (Sungwoo)`
A11	`04`	`1`		`@1 GO (Chun Soo)`
A11	`05`	`1`		`@1 ROH (Sung Su)`
A14	`01`			`@1 School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea @Z 1 aut. @Z 2 aut. @Z 5 aut.`
A14	`02`			`@1 Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea @Z 3 aut. @Z 4 aut.`
A20				`@1 514-517`
A21				`@1 2004-02`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 9959`
A44				`@0 8100 @1 © 2004 American Institute of Physics. All rights reserved.`
A47	`01`	`1`		`@0 04-0165991`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers`
A66	`01`			`@0 USA`
C01	`01`		`ENG`	@0 The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics
C02	`01`	`X`		`@0 001D03F17`
C03	`01`	`3`	`FRE`	`@0 8540H @2 PAC @4 INC`
C03	`02`	`3`	`FRE`	`@0 Etude théorique`
C03	`02`	`3`	`ENG`	`@0 Theoretical study`
C03	`03`	`3`	`FRE`	`@0 Méthode mesure`
C03	`03`	`3`	`ENG`	`@0 Measuring methods`
C03	`04`	`3`	`FRE`	`@0 Photolithographie`
C03	`04`	`3`	`ENG`	`@0 Photolithography`
C03	`05`	`3`	`FRE`	`@0 Masque déphasage`
C03	`05`	`3`	`ENG`	`@0 Phase shifting masks`
C03	`06`	`3`	`FRE`	`@0 Effet proximité(lithographie)`
C03	`06`	`3`	`ENG`	`@0 Proximity effect (lithography)`
C03	`07`	`3`	`FRE`	`@0 Méthode Monte Carlo`
C03	`07`	`3`	`ENG`	`@0 Monte Carlo methods`
C03	`08`	`3`	`FRE`	`@0 Convergence méthode numérique`
C03	`08`	`3`	`ENG`	`@0 Convergence of numerical methods`
C03	`09`	`3`	`FRE`	`@0 Technologie circuit intégré`
C03	`09`	`3`	`ENG`	`@0 Integrated circuit technology`
C03	`10`	`3`	`FRE`	`@0 Technique conception optique`
C03	`10`	`3`	`ENG`	`@0 Optical design techniques`
C03	`11`	`3`	`FRE`	`@0 Automatisation conception électronique`
C03	`11`	`3`	`ENG`	`@0 Electronic design automation`
N21				`@1 110`
N47	`01`	`1`		`@0 0414M000325`

Links toward previous steps (curation, corpus...)

to stream PascalFrancis, to step Corpus: Pour aller vers cette notice dans l'étape Curation :000466

Links to Exploration step

Pascal:04-0165991

Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask</title>
<author><name sortKey="Lee, Jai Cheol" sort="Lee, Jai Cheol" uniqKey="Lee J" first="Jai-Cheol" last="Lee">Jai-Cheol Lee</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Oh, Yong Ho" sort="Oh, Yong Ho" uniqKey="Oh Y" first="Yong-Ho" last="Oh">Yong-Ho Oh</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Lim, Sungwoo" sort="Lim, Sungwoo" uniqKey="Lim S" first="Sungwoo" last="Lim">Sungwoo Lim</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Go, Chun Soo" sort="Go, Chun Soo" uniqKey="Go C" first="Chun Soo" last="Go">Chun Soo Go</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Roh, Sung Su" sort="Roh, Sung Su" uniqKey="Roh S" first="Sung Su" last="Roh">Sung Su Roh</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">04-0165991</idno>
<date when="2004-02">2004-02</date>
<idno type="stanalyst">PASCAL 04-0165991 AIP</idno>
<idno type="RBID">Pascal:04-0165991</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">000466</idno>
<idno type="wicri:Area/PascalFrancis/Curation">000156</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask</title>
<author><name sortKey="Lee, Jai Cheol" sort="Lee, Jai Cheol" uniqKey="Lee J" first="Jai-Cheol" last="Lee">Jai-Cheol Lee</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Oh, Yong Ho" sort="Oh, Yong Ho" uniqKey="Oh Y" first="Yong-Ho" last="Oh">Yong-Ho Oh</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Lim, Sungwoo" sort="Lim, Sungwoo" uniqKey="Lim S" first="Sungwoo" last="Lim">Sungwoo Lim</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Go, Chun Soo" sort="Go, Chun Soo" uniqKey="Go C" first="Chun Soo" last="Go">Chun Soo Go</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
<author><name sortKey="Roh, Sung Su" sort="Roh, Sung Su" uniqKey="Roh S" first="Sung Su" last="Roh">Sung Su Roh</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country xml:lang="fr">Corée du Sud</country>
<wicri:regionArea>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749</wicri:regionArea>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers</title>
<title level="j" type="abbreviated">Jpn. J. Appl. Phys., Part I</title>
<idno type="ISSN">0021-4922</idno>
<imprint><date when="2004-02">2004-02</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers</title>
<title level="j" type="abbreviated">Jpn. J. Appl. Phys., Part I</title>
<idno type="ISSN">0021-4922</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Convergence of numerical methods</term>
<term>Electronic design automation</term>
<term>Integrated circuit technology</term>
<term>Measuring methods</term>
<term>Monte Carlo methods</term>
<term>Optical design techniques</term>
<term>Phase shifting masks</term>
<term>Photolithography</term>
<term>Proximity effect (lithography)</term>
<term>Theoretical study</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>8540H</term>
<term>Etude théorique</term>
<term>Méthode mesure</term>
<term>Photolithographie</term>
<term>Masque déphasage</term>
<term>Effet proximité(lithographie)</term>
<term>Méthode Monte Carlo</term>
<term>Convergence méthode numérique</term>
<term>Technologie circuit intégré</term>
<term>Technique conception optique</term>
<term>Automatisation conception électronique</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics</div>
</front>
</TEI>
<inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0021-4922</s0>
</fA01>
<fA02 i1="01"><s0>JAPNDE</s0>
</fA02>
<fA03 i2="1"><s0>Jpn. J. Appl. Phys., Part I</s0>
</fA03>
<fA05><s2>43</s2>
</fA05>
<fA06><s2>2</s2>
</fA06>
<fA08 i1="01" i2="1" l="ENG"><s1>Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>LEE (Jai-Cheol)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>OH (Yong-Ho)</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>LIM (Sungwoo)</s1>
</fA11>
<fA11 i1="04" i2="1"><s1>GO (Chun Soo)</s1>
</fA11>
<fA11 i1="05" i2="1"><s1>ROH (Sung Su)</s1>
</fA11>
<fA14 i1="01"><s1>School of Electrical Engineering and Information Technology, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>5 aut.</sZ>
</fA14>
<fA14 i1="02"><s1>Division of Natural Sciences, Wonkwang University, Shinyongdong 344-2, Iksan, Jeonbuk 570-749, Korea</s1>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</fA14>
<fA20><s1>514-517</s1>
</fA20>
<fA21><s1>2004-02</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>9959</s2>
</fA43>
<fA44><s0>8100</s0>
<s1>© 2004 American Institute of Physics. All rights reserved.</s1>
</fA44>
<fA47 i1="01" i2="1"><s0>04-0165991</s0>
</fA47>
<fA60><s1>P</s1>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers</s0>
</fA64>
<fA66 i1="01"><s0>USA</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics</s0>
</fC01>
<fC02 i1="01" i2="X"><s0>001D03F17</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>8540H</s0>
<s2>PAC</s2>
<s4>INC</s4>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Etude théorique</s0>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Theoretical study</s0>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Méthode mesure</s0>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>Measuring methods</s0>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Photolithographie</s0>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Photolithography</s0>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Masque déphasage</s0>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Phase shifting masks</s0>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Effet proximité(lithographie)</s0>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Proximity effect (lithography)</s0>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Méthode Monte Carlo</s0>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Monte Carlo methods</s0>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>Convergence méthode numérique</s0>
</fC03>
<fC03 i1="08" i2="3" l="ENG"><s0>Convergence of numerical methods</s0>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Technologie circuit intégré</s0>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>Integrated circuit technology</s0>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>Technique conception optique</s0>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Optical design techniques</s0>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Automatisation conception électronique</s0>
</fC03>
<fC03 i1="11" i2="3" l="ENG"><s0>Electronic design automation</s0>
</fC03>
<fN21><s1>110</s1>
</fN21>
<fN47 i1="01" i2="1"><s0>0414M000325</s0>
</fN47>
</pA>
</standard>
</inist>
</record>

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=$WICRI_ROOT/Wicri/Musique/explor/OperaV1/Data/PascalFrancis/Curation

HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000156 | SxmlIndent | more

HfdSelect -h $EXPLOR_AREA/Data/PascalFrancis/Curation/biblio.hfd -nk 000156 | SxmlIndent | more

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=    Wicri/Musique
   |area=    OperaV1
   |flux=    PascalFrancis
   |étape=   Curation
   |type=    RBID
   |clé=     Pascal:04-0165991
   |texte=   Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask
}}

This area was generated with Dilib version V0.6.21.
Data generation: Thu Apr 14 14:59:05 2016. Site generation: Thu Jan 4 23:09:23 2024

	Serveur d'exploration sur l'opéra
	Attention, ce site est en cours de développement ! Attention, site généré par des moyens informatiques à partir de corpus bruts. Les informations ne sont donc pas validées.

Serveur d'exploration sur l'opéra

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Links to Exploration step

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri