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Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Identifieur interne : 001B97 ( Main/Exploration ); précédent : 001B96; suivant : 001B98

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Auteurs : Jai-Cheol Lee [Corée du Sud] ; Yong-Ho Oh [Corée du Sud] ; Sungwoo Lim [Corée du Sud] ; Chun Soo Go [Corée du Sud] ; Sung Su Roh [Corée du Sud]

Source :

Japanese Journal of Applied Physics, Part I : Regular papers, short notes & review papers [ 0021-4922 ] ; 2004-02.

RBID : Pascal:04-0165991

Descripteurs français

Pascal (Inist)
- 8540H, Etude théorique, Méthode mesure, Photolithographie, Masque déphasage, Effet proximité(lithographie), Méthode Monte Carlo, Convergence méthode numérique, Technologie circuit intégré, Technique conception optique, Automatisation conception électronique.

English descriptors

KwdEn :
- Convergence of numerical methods, Electronic design automation, Integrated circuit technology, Measuring methods, Monte Carlo methods, Optical design techniques, Phase shifting masks, Photolithography, Proximity effect (lithography), Theoretical study.

Abstract

The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics

Affiliations:

Corée du Sud

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Le document en format XML

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<front><div type="abstract" xml:lang="en">The optical proximity effect correction algorithm (OPERA) program based on the Monte-Carlo method has been used for optical proximity correction (OPC) and phase shift mask (PSM) generation for low-NA projection lithography systems. To apply OPERA to high-NA systems, we adopted an imaging model based on a vector diffraction theory. Also, we developed a new convergence algorithm that does not reduce the degree of freedom and prevents the convergence process from falling into a local minimum. The new program, OPERA-V, is at least 10 times faster than the previous version. OPERA-V not only improves the computation time of traditional OPC, but can also be used as an automatic design tool for creating chromeless PSMs. © 2004 The Japan Society of Applied Physics</div>
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Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Monte-Carlo-Based Automatic Design of Chromeless Phase Shift Mask

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Le document en format XML

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