A C type dipole with imbedded windings to improve the field distribution
Identifieur interne : 002167 ( Main/Exploration ); précédent : 002166; suivant : 002168A C type dipole with imbedded windings to improve the field distribution
Auteurs : P. Yuan [République populaire de Chine] ; Y. He [République populaire de Chine] ; L. Z. Ma [République populaire de Chine] ; B. Zhang [République populaire de Chine] ; W. J. Liu [République populaire de Chine] ; S. F. Han [République populaire de Chine] ; H. Xiong [République populaire de Chine] ; W. J. Wang [République populaire de Chine] ; J. Wu [République populaire de Chine] ; R. R. He [République populaire de Chine] ; J. W. Xia [République populaire de Chine] ; W. L. Zhan [République populaire de Chine] ; B. W. Wei [République populaire de Chine]Source :
- AIP conference proceedings [ 0094-243X ] ; 2001-12-12.
Descripteurs français
- Pascal (Inist)
English descriptors
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Abstract
A method is described in this paper, which introduces some slots in the C type dipole pole and some conductors can be put inside these slots. These conductors can control the flow of the magnetic flux by adjusting its trim current, thus that can improve the magnetic field distribution at the median plane of this dipole. The effect of the trim current for low field was investigated using OPERA-2D and 3D, some results will be present in this paper. Furthermore, the fabricating technology of this C type dipole and some magnetic field measurement results will be discussed in this paper as well. © 2001 American Institute of Physics.
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Xia</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>IMP, CAS, Lanzhou, People's Republic of China</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ><sZ>6 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ><sZ>9 aut.</sZ><sZ>10 aut.</sZ><sZ>11 aut.</sZ><sZ>12 aut.</sZ><sZ>13 aut.</sZ></inist:fA14><country xml:lang="fr">République populaire de Chine</country><wicri:regionArea>IMP, CAS, Lanzhou</wicri:regionArea><wicri:noRegion>Lanzhou</wicri:noRegion></affiliation></author><author><name sortKey="Zhan, W L" sort="Zhan, W L" uniqKey="Zhan W" first="W. L." last="Zhan">W. L. Zhan</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>IMP, CAS, Lanzhou, People's Republic of China</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ><sZ>6 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ><sZ>9 aut.</sZ><sZ>10 aut.</sZ><sZ>11 aut.</sZ><sZ>12 aut.</sZ><sZ>13 aut.</sZ></inist:fA14><country xml:lang="fr">République populaire de Chine</country><wicri:regionArea>IMP, CAS, Lanzhou</wicri:regionArea><wicri:noRegion>Lanzhou</wicri:noRegion></affiliation></author><author><name sortKey="Wei, B W" sort="Wei, B W" uniqKey="Wei B" first="B. W." last="Wei">B. W. Wei</name><affiliation wicri:level="1"><inist:fA14 i1="01"><s1>IMP, CAS, Lanzhou, People's Republic of China</s1><sZ>1 aut.</sZ><sZ>2 aut.</sZ><sZ>3 aut.</sZ><sZ>4 aut.</sZ><sZ>5 aut.</sZ><sZ>6 aut.</sZ><sZ>7 aut.</sZ><sZ>8 aut.</sZ><sZ>9 aut.</sZ><sZ>10 aut.</sZ><sZ>11 aut.</sZ><sZ>12 aut.</sZ><sZ>13 aut.</sZ></inist:fA14><country xml:lang="fr">République populaire de Chine</country><wicri:regionArea>IMP, CAS, Lanzhou</wicri:regionArea><wicri:noRegion>Lanzhou</wicri:noRegion></affiliation></author></analytic><series><title level="j" type="main">AIP conference proceedings</title><title level="j" type="abbreviated">AIP conf. proc.</title><idno type="ISSN">0094-243X</idno><imprint><date when="2001-12-12">2001-12-12</date></imprint></series></biblStruct></sourceDesc><seriesStmt><title level="j" type="main">AIP conference proceedings</title><title level="j" type="abbreviated">AIP conf. proc.</title><idno type="ISSN">0094-243X</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Accelerator control systems</term><term>Beam handling techniques</term><term>Cyclotrons</term><term>Experimental study</term><term>Ion sources</term><term>Magnetic fields</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>2920H</term><term>2927E</term><term>2920D</term><term>Etude expérimentale</term><term>Champ magnétique</term><term>Système contrôle accélérateur</term><term>Source ion</term><term>Technique manipulation faisceau</term><term>Cyclotron</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">A method is described in this paper, which introduces some slots in the C type dipole pole and some conductors can be put inside these slots. These conductors can control the flow of the magnetic flux by adjusting its trim current, thus that can improve the magnetic field distribution at the median plane of this dipole. The effect of the trim current for low field was investigated using OPERA-2D and 3D, some results will be present in this paper. Furthermore, the fabricating technology of this C type dipole and some magnetic field measurement results will be discussed in this paper as well. © 2001 American Institute of Physics.</div></front></TEI><affiliations><list><country><li>République populaire de Chine</li></country></list><tree><country name="République populaire de Chine"><noRegion><name sortKey="Yuan, P" sort="Yuan, P" uniqKey="Yuan P" first="P." last="Yuan">P. Yuan</name></noRegion><name sortKey="Han, S F" sort="Han, S F" uniqKey="Han S" first="S. F." last="Han">S. F. Han</name><name sortKey="He, R R" sort="He, R R" uniqKey="He R" first="R. R." last="He">R. R. He</name><name sortKey="He, Y" sort="He, Y" uniqKey="He Y" first="Y." last="He">Y. He</name><name sortKey="Liu, W J" sort="Liu, W J" uniqKey="Liu W" first="W. J." last="Liu">W. J. Liu</name><name sortKey="Ma, L Z" sort="Ma, L Z" uniqKey="Ma L" first="L. Z." last="Ma">L. Z. Ma</name><name sortKey="Wang, W J" sort="Wang, W J" uniqKey="Wang W" first="W. J." last="Wang">W. J. Wang</name><name sortKey="Wei, B W" sort="Wei, B W" uniqKey="Wei B" first="B. W." last="Wei">B. W. Wei</name><name sortKey="Wu, J" sort="Wu, J" uniqKey="Wu J" first="J." last="Wu">J. Wu</name><name sortKey="Xia, J W" sort="Xia, J W" uniqKey="Xia J" first="J. W." last="Xia">J. W. Xia</name><name sortKey="Xiong, H" sort="Xiong, H" uniqKey="Xiong H" first="H." last="Xiong">H. Xiong</name><name sortKey="Zhan, W L" sort="Zhan, W L" uniqKey="Zhan W" first="W. L." last="Zhan">W. L. Zhan</name><name sortKey="Zhang, B" sort="Zhang, B" uniqKey="Zhang B" first="B." last="Zhang">B. 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