Research and development of an electron beam focusing system for a high‐brightness X‐ray generator
Identifieur interne : 001B97 ( Istex/Corpus ); précédent : 001B96; suivant : 001B98Research and development of an electron beam focusing system for a high‐brightness X‐ray generator
Auteurs : Takeshi Sakai ; Satoshi Ohsawa ; Noriyoshi Sakabe ; Takashi Sugimura ; Mitsuo IkedaSource :
- Journal of Synchrotron Radiation [ 1600-5775 ] ; 2011-01-01.
English descriptors
Abstract
A new type of rotating anticathode X‐ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U‐shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm−2 (at 2.3 kW). A higher‐flux electron beam is expected from simulation by optimizing the geometry of a combined‐function‐type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X‐ray source the electron beam has been focused over a short distance by a new combined‐function bending magnet, whose geometrical shape was determined by simulation using the Opera‐3D, General Particle Tracer and CST‐STUDIO codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm−2 on the supposition of a two‐dimensional Gaussian distribution. High‐power tests have begun using a high‐voltage 120 kV/75 mA power supply for the X‐ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.
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DOI: 10.1107/S0909049510029948
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Synchrotron Rad.</title><idno type="ISSN">1600-5775</idno><idno type="eISSN">1600-5775</idno><imprint><publisher>International Union of Crystallography</publisher><pubPlace>5 Abbey Square, Chester, Cheshire CH1 2HU, England</pubPlace><date type="published" when="2011-01-01">2011-01-01</date><biblScope unit="volume">18</biblScope><biblScope unit="issue">1</biblScope><biblScope unit="page" from="53">53</biblScope><biblScope unit="page" to="57">57</biblScope></imprint><idno type="ISSN">1600-5775</idno></series><idno type="istex">51E006EF276B57FE61173CDFF0EE04D1D4CFCED1</idno><idno type="DOI">10.1107/S0909049510029948</idno><idno type="ArticleID">JSYYS5048</idno></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">1600-5775</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>DC electron gun</term><term>X‐ray generator</term><term>combined‐function bending magnet</term><term>high‐flux electron beam</term></keywords></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">A new type of rotating anticathode X‐ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U‐shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm−2 (at 2.3 kW). A higher‐flux electron beam is expected from simulation by optimizing the geometry of a combined‐function‐type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X‐ray source the electron beam has been focused over a short distance by a new combined‐function bending magnet, whose geometrical shape was determined by simulation using the Opera‐3D, General Particle Tracer and CST‐STUDIO codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm−2 on the supposition of a two‐dimensional Gaussian distribution. High‐power tests have begun using a high‐voltage 120 kV/75 mA power supply for the X‐ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.</div></front></TEI><istex><corpusName>wiley</corpusName><author><json:item><name>Takeshi Sakai</name></json:item><json:item><name>Satoshi Ohsawa</name></json:item><json:item><name>Noriyoshi Sakabe</name></json:item><json:item><name>Takashi Sugimura</name></json:item><json:item><name>Mitsuo Ikeda</name></json:item></author><subject><json:item><lang><json:string>eng</json:string></lang><value>X‐ray generator</value></json:item><json:item><lang><json:string>eng</json:string></lang><value>high‐flux electron beam</value></json:item><json:item><lang><json:string>eng</json:string></lang><value>DC electron gun</value></json:item><json:item><lang><json:string>eng</json:string></lang><value>combined‐function bending magnet</value></json:item></subject><articleId><json:string>JSYYS5048</json:string></articleId><language><json:string>eng</json:string></language><abstract>A new type of rotating anticathode X‐ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U‐shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm−2 (at 2.3 kW). 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A higher‐flux electron beam is expected from simulation by optimizing the geometry of a combined‐function‐type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X‐ray source the electron beam has been focused over a short distance by a new combined‐function bending magnet, whose geometrical shape was determined by simulation using the <i>Opera‐3D</i>, <i>General Particle Tracer</i> and <i>CST‐STUDIO</i> codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm<sup>−2</sup> on the supposition of a two‐dimensional Gaussian distribution. High‐power tests have begun using a high‐voltage 120 kV/75 mA power supply for the X‐ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.</p></abstract></abstractGroup></contentMeta></header></component></istex:document></istex:metadataXml><mods version="3.6"><titleInfo lang="en"><title>Research and development of an electron beam focusing system for a high‐brightness X‐ray generator</title></titleInfo><titleInfo type="abbreviated"><title>Electron beam focusing system</title></titleInfo><titleInfo type="alternative" contentType="CDATA" lang="en"><title>Research and development of an electron beam focusing system for a high‐brightness X‐ray generator</title></titleInfo><name type="personal"><namePart type="given">Takeshi</namePart><namePart type="family">Sakai</namePart><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Satoshi</namePart><namePart type="family">Ohsawa</namePart><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Noriyoshi</namePart><namePart type="family">Sakabe</namePart><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Takashi</namePart><namePart type="family">Sugimura</namePart><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">Mitsuo</namePart><namePart type="family">Ikeda</namePart><role><roleTerm type="text">author</roleTerm></role></name><typeOfResource>text</typeOfResource><genre type="article" displayLabel="article"></genre><originInfo><publisher>International Union of Crystallography</publisher><place><placeTerm type="text">5 Abbey Square, Chester, Cheshire CH1 2HU, England</placeTerm></place><dateIssued encoding="w3cdtf">2011-01-01</dateIssued><edition>Received 1 May 2010, accepted 27 July 2010</edition><copyrightDate encoding="w3cdtf">2011</copyrightDate></originInfo><language><languageTerm type="code" authority="rfc3066">en</languageTerm><languageTerm type="code" authority="iso639-2b">eng</languageTerm></language><physicalDescription><internetMediaType>text/html</internetMediaType></physicalDescription><abstract lang="en">A new type of rotating anticathode X‐ray generator, where an electron beam of up to 60 keV irradiates the inner surface of a U‐shaped Cu anticathode, has achieved a beam brilliance of 130 kW mm−2 (at 2.3 kW). A higher‐flux electron beam is expected from simulation by optimizing the geometry of a combined‐function‐type magnet instead of the fringing field of the bending magnet. In order to minimize the size of the X‐ray source the electron beam has been focused over a short distance by a new combined‐function bending magnet, whose geometrical shape was determined by simulation using the Opera‐3D, General Particle Tracer and CST‐STUDIO codes. The result of the simulation clearly shows that the role of combined functions in both the bending and the steering magnets is important for focusing the beam to a small size. FWHM sizes of the beam are predicted by simulation to be 0.45 mm (horizontal) and 0.05 mm (vertical) for a 120 keV/75 mA beam, of which the effective brilliance is about 500 kW mm−2 on the supposition of a two‐dimensional Gaussian distribution. High‐power tests have begun using a high‐voltage 120 kV/75 mA power supply for the X‐ray generator instead of 60 kV/100 mA. The beam focus size on the target will be verified in the experiments.</abstract><subject lang="en"><genre>Keywords</genre><topic>X‐ray generator</topic><topic>high‐flux electron beam</topic><topic>DC electron gun</topic><topic>combined‐function bending magnet</topic></subject><relatedItem type="host"><titleInfo><title>Journal of Synchrotron Radiation</title></titleInfo><titleInfo type="abbreviated"><title>J. Synchrotron Rad.</title></titleInfo><genre type="Journal">journal</genre><identifier type="ISSN">1600-5775</identifier><identifier type="eISSN">1600-5775</identifier><identifier type="DOI">10.1111/(ISSN)1600-5775</identifier><identifier type="PublisherID">JSY2</identifier><part><date>2011</date><detail type="volume"><caption>vol.</caption><number>18</number></detail><detail type="issue"><caption>no.</caption><number>1</number></detail><extent unit="pages"><start>53</start><end>57</end></extent></part></relatedItem><identifier type="istex">51E006EF276B57FE61173CDFF0EE04D1D4CFCED1</identifier><identifier type="DOI">10.1107/S0909049510029948</identifier><identifier type="ArticleID">JSYYS5048</identifier><accessCondition type="use and reproduction" contentType="copyright">© Takeshi Sakai et al. 2011</accessCondition><recordInfo><recordContentSource>WILEY</recordContentSource><recordOrigin>International Union of Crystallography</recordOrigin></recordInfo></mods></metadata><serie></serie></istex></record>Pour manipuler ce document sous Unix (Dilib)
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