Serveur d'exploration sur les relations entre la France et l'Australie

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Couche mince And NotTurumella V. Chandrasekhar Rao

List of bibliographic references

Number of relevant bibliographic references: 91.
Ident.Authors (with country if any)Title
000025 H. D. Andrade [Royaume-Uni] ; M. Z. Othman [Royaume-Uni] ; K. M. O'Donnell [Australie] ; J. H. Lay [Royaume-Uni] ; P. W. May [Royaume-Uni] ; N. A. Fox [Royaume-Uni] ; J. Morin [France] ; O. Renault [France]Use of energy-filtered photoelectron emission microscopy and Kelvin probe force microscopy to visualise work function changes on diamond thin films terminated with oxygen and lithium mono-layers for thermionic energy conversion
000035 Gagan Kaur [Australie] ; Arthur Bertrand [France] ; Julien Bernard [France] ; Toby D. M. Bell [Australie] ; Kei Saito [Australie]UV-Reversible Chain Extendable Polymers from Thymine Functionalized Telechelic Polymer Chains
000135 XIAO LI ZHANG [Australie] ; FUZHI HUANG [Australie] ; YANG CHEN [Australie] ; Yi-Bing Cheng [Australie] ; Rose Amal [Australie]Prompting electron transport in mesoporous semiconductor electrode by simple film compression
000600 Michael E. A. Warwick [Royaume-Uni] ; Geoffrey Hyett [Royaume-Uni] ; Ian Ridley [Australie] ; Fathima R. Laffir [Irlande (pays)] ; Celia Olivero [France] ; Patrick Chapon [France] ; Russell Binions [Royaume-Uni]Synthesis and energy modelling studies of titanium oxy-nitride films as energy efficient glazing
000806 P. J. Martin [Australie] ; A. Bendavid [Australie] ; K.-H. Müller [Australie] ; L. K. Randeniya [Australie]Mesoporous surfaces by phase separation of Al-Si thin films
000816 B. N. Sahu [Inde] ; S. C. Sahoo [Inde] ; N. Venkataramani [Inde] ; Shiva Prasad [Inde] ; R. Krishnan [France] ; Mikhail Kostylev [Australie] ; R. L. Stamps [Australie, Royaume-Uni]Magnetic and FMR Study on CoFe2O4/ZnFe2O4 Bilayers
000819 Murtaza Bohra [Inde, Japon] ; Shiva Prasad [Inde] ; N. Venkataramani [Inde] ; S. C. Sahoo [Inde] ; Naresh Kumar [Inde] ; R. Krishnan [France]Low Temperature Magnetization Studies of Nanocrystalline Zn-Ferrite Thin Films
000862 Taryn Guinan [Australie] ; Cédric Godefroy [France] ; Nicole Lautredou [France] ; Stephanie Pace [Australie] ; Pierre-Emmanuel Milhiet [France] ; Nicolas Voelcker [Australie] ; Frédérique Cunin [France]Interaction of Antibiotics with Lipid Vesicles on Thin Film Porous Silicon Using Reflectance Interferometric Fourier Transform Spectroscopy
000987 Cuong Ton-That [Australie] ; Thien-Phap Nguyen [France] ; YI DAN [République populaire de Chine]Enhanced photoluminescence of polyfluorene by incorporation of Al-doped ZnO nanoparticles
000B36 A. D. Cross [Australie] ; A. Morel [France] ; M. Drozd [France] ; I. Olcomendy [France] ; A. F. Hollenkamp [Australie] ; S. W. Donne [Australie]Active mass analysis on thin films of electrodeposited manganese dioxide for electrochemical capacitors
000E49 M. N. Popescu [Australie, Allemagne] ; G. Oshanin [France] ; S. Dietrich [Allemagne] ; A.-M. Cazabat [France]Precursor films in wetting phenomena
001197 Anais Pages [Australie, France] ; David T. Welsh [Australie] ; David Robertson [Australie] ; Jared G. Panther [Australie] ; Jorg Sch Fer [France] ; Rodger B. Tomlinson [Australie] ; Peter R. Teasdale [Australie]Diurnal shifts in co-distributions of sulfide and iron(II) and profiles of phosphate and ammonium in the rhizosphere of Zostera capricorni
001516 Svetlana Dligatch [Australie] ; Mark Gross [Australie] ; Anatoli Chtanov [Australie]Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using an ion-beam sputtering system with a customized planetary rotation stage
001958 J. P. Zou [France, République populaire de Chine] ; P. Le Rendu [France] ; I. Musa [France] ; S. H. Yang [Taïwan] ; Y. Dan [République populaire de Chine] ; C. Ton That [Australie] ; T. P. Nguyen [France]Investigation of the optical properties of polyfluorene/ZnO nanocomposites
002114 Ö. Tüzün [France] ; Y. Qiu [Belgique] ; A. Slaoui [France] ; I. Gordon [Belgique] ; C. Maurice [France] ; S. Venkatachalam [Belgique] ; S. Chatterjee [France] ; G. Beaucarne [Belgique] ; J. Poortmans [Belgique]Properties of n-type polycrystalline silicon solar cells formed by aluminium induced crystallization and CVD thickening
002179 D. Fuertes Marron [Espagne] ; E. Canovas [Espagne] ; M. Y. Levy [Espagne] ; A. Marti [Espagne] ; A. Luque [Espagne] ; M. Afshar [Allemagne] ; J. Albert [Allemagne] ; S. Lehmann [Allemagne] ; D. Abou-Ras [Allemagne] ; S. Sadewasser [Allemagne] ; N. Barreau [France]Optoelectronic evaluation of the nanostructuring approach to chalcopyrite-based intermediate band materials
002373 T. Mouet [France, Algérie] ; T. Devers [France] ; A. Telia [Algérie] ; Z. Messai [France] ; V. Harel [France] ; K. Konstantinov [Australie] ; I. Kante [France] ; M. T. Ta [France]Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique
002374 Z. Messaï [France, Algérie] ; Z. Ouennoughi [Algérie] ; T. Devers [France] ; T. Mouet [France, Algérie] ; V. Harel [France] ; K. Konstantinov [Australie] ; N. Bouguechal [Algérie]Growth and characteristics of ZnO nano-aggregates electrodeposited onto p-Si(111)
002832 M. Aguilar-Frutis [Mexique] ; S. Kumar [Australie] ; C. Falcony [Mexique]Spray-pyrolyzed hydroxyapatite thin-film coatings
002877 B. Abendroth [Australie] ; S. H. N. Lim [Australie] ; A. Poppleton [Australie] ; S. Remadi [France] ; M. M. M. Bilek [Australie] ; D. R. Mckenzie [Australie]Relation of optical and electrical properties to the microstructure of intrinsic transparent conducting ZnO thin films
002882 Q. Simon [France] ; V. Bouquet [France] ; W. Peng [France] ; J.-M. Le Floch [France, Australie] ; F. Houdonougbo [France] ; S. Deputier [France] ; S. Weber [France] ; A. Dauscher [France] ; V. Madrangeas [France] ; D. Cros [France] ; M. Guilloux-Viry [France]Reduction of microwave dielectric losses in KTa1-xNbxO3 thin films by MgO-doping
002A14 A. A. Stashkevich [France] ; Y. Roussigne [France] ; A. I. Stognij [Biélorussie] ; N. I. Novitskii [Biélorussie] ; G. Wurtz [Royaume-Uni] ; A. V. Zayats [Royaume-Uni] ; G. Viau [France] ; G. Chaboussant [France] ; F. Ott [France] ; L. V. Lutsev [Russie] ; P. Djemia [France] ; M. P. Kostylev [Australie] ; V. Belotelov [Russie]Magnetic excitations in (SiO2)Co nano-composite films : Brillouin light scattering study
002A15 D. Soundararajan [Inde] ; D. Mangalaraj [Inde] ; D. Nataraj [Inde] ; L. Dorosinskii [Turquie] ; J. Santoyo-Salazar [Mexique, France] ; M. J. Riley [Australie]Magnetic and magneto-optical studies on Zn1-xCrxTe (x = 0.05) films grown on glass substrate
002B23 R. Ruggerone [Suisse] ; C. J. G. Plummer [Suisse] ; N. Negrete Herrera [France] ; E. Bourgeat-Lami [France] ; J-A. E. Manson [Suisse]Fracture mechanisms in polystyrene/laponite nanocomposites prepared by emulsion polymerization
002E68 Guilhem Arrachart [Australie] ; Inna Karatchevtseva [Australie] ; David J. Cassidy [Australie] ; Gerry Triani [Australie] ; John R. Bartlett [Australie] ; Michel Wong Chi Man [France]Synthesis and characterisation of carboxylate-terminated silica nanohybrid powders and thin films
002F13 Gavin Conibeer [Australie] ; Martin Green [Australie] ; Eun-Chel Cho [Australie] ; Dirk König [Australie] ; Young-Hyun Cho [Australie] ; Thipwan Fangsuwannarak [Australie] ; Giuseppe Scardera [Australie] ; Edwin Pink [Australie] ; YIDAN HUANG [Australie] ; Tom Puzzer [Australie] ; SHUJUAN HUANG [Australie] ; DENGYUAN SONG [Australie] ; Chris Flynn [Australie] ; Sangwook Park [Australie] ; XIAOJING HAO [Australie] ; Daniel Mansfield [Australie]Silicon quantum dot nanostructures for tandem photovoltaic cells
002F29 G. J. Conibeer [Australie] ; C.-W. Jiang [Australie] ; D. König [Australie] ; S. Shrestha [Australie] ; T. Walsh [Australie] ; M. A. Green [Australie]Selective energy contacts for hot carrier solar cells
003738 Joy Tan [Australie] ; Wojtek Wlodarski [Australie] ; Kourosh Kalantar-Zadeh [Australie]Nitrogen dioxide gas sensors based on titanium dioxide thin films deposited on langasite
003770 G. Konstantinidis [Roumanie] ; D. Neculoiu [Grèce] ; A. Stayinidris [Roumanie] ; Z. Chatzopoulos [Roumanie] ; A. Muller [Grèce] ; K. Tsagaraki [Roumanie] ; D. Vasilache [Grèce] ; I. Petrini [Grèce] ; C. Buiculescu [Grèce] ; L. Bary [France] ; R. Plana [France]Millimeter wave monolithic integrated receivers based on GaAs micromachining
003833 P. Müller-Buschbaum [Allemagne] ; E. Bauer [Allemagne] ; E. Maurer [Allemagne] ; A. Nelson [Australie] ; R. Cubitt [France]In-situ neutron reflectometry probing competitive swelling and de-swelling of thin polystyrene films
003834 S. H. Oh [Australie] ; M. Legros [France] ; D. Kiener [Australie] ; P. Gruber [Allemagne] ; G. Dehm [Australie]In situ TEM straining of single crystal Au films on polyimide : Change of deformation mechanisms at the nanoscale
003926 B. A. Latella [Australie] ; G. Triani [Australie] ; Z. Zhang [Australie] ; K. T. Short [Australie] ; J. R. Bartlett [Australie] ; M. Ignat [France]Enhanced adhesion of atomic layer deposited titania on polycarbonate substrates
003B86 Judy N. Hart [Australie] ; David Menzies [Australie] ; Yi-Bing Cheng [Australie] ; George P. Simon [Australie] ; Leone Spiccia [Australie]TiO2 sol-gel blocking layers for dye-sensitized solar cells
003C10 M. Miritello [Italie] ; R. Lo Savio [Italie] ; F. Iacona [Italie] ; G. Franzo [Italie] ; C. Bongiorno [Italie] ; A. Irrera [Italie] ; F. Priolo [Italie]The influence of substrate on the properties of Er2O3 films grown by magnetron sputtering
003C35 K. H. Andersen [France] ; R. Cubitt [France] ; H. Humblot [France] ; D. Jullien [France] ; A. Petoukhov [France] ; F. Tasset [France] ; C. Schanzer [Allemagne] ; V. R. Shah [Allemagne] ; A. R. Wildes [France]The 3He polarizing filter on the neutron reflectometer D17
003C50 T. V. Shubina [Russie] ; D. S. Plotnikov [Russie] ; A. Vasson [France] ; J. Leymarie [France] ; M. Larsson [France] ; P. O. Holtz [Suède] ; B. Monemar [Suède] ; HAI LU [États-Unis] ; W. J. Schaff [États-Unis] ; P. S. Kop'Ev [Russie]Surface-plasmon resonances in indium nitride with metal-enriched nano-particles
003C52 K. R. Catchpole [Australie] ; S. Pillai [Australie]Surface plasmons for enhanced silicon light-emitting diodes and solar cells
003C58 Tadamasa Kimura [Japon] ; Katsuaki Masaki [Japon] ; Hideo Isshiki [Japon]Study on crystalline properties of Er-Si-O compounds in relation to Er-related 1.54 μm photoluminescence and electrical properties
003C66 HAIMING ZHANG [République populaire de Chine] ; YAN CUI [République populaire de Chine] ; YUNGE MEN [République populaire de Chine] ; XUSHENG LIU [République populaire de Chine]Strong ultraviolet emission from zinc oxide thin films prepared by electrophoretic deposition
003C94 Gavin Conibeer [Australie] ; Martin Green [Australie] ; Richard Corkish [Australie] ; Young Cho [Australie] ; Eun-Chel Cho [Corée du Sud] ; Chu-Wei Jiang [Australie] ; Thipwan Fangsuwannarak [Australie] ; Edwin Pink [Australie] ; YIDAN HUANG [Australie] ; Tom Puzzer [Australie] ; Thorsten Trupke [Australie] ; Bryce Richards [Australie] ; Avi Shalav [Australie] ; Kuo-Lung Lin [Australie]Silicon nanostmctures for third generation photovoltaic solar cells
003D68 Maria M. Giangregorio [Italie] ; Maria Losurdo [Italie] ; Alberto Sacchetti [Italie] ; Pio Capezzuto [Italie] ; Giovanni Bruno [Italie]Plasma processing of the Si(00 1) surface for tuning SPR of Au/Si-based plasmonic nanostructures
003D74 B. M. Monroy [Mexique] ; G. Santana [Mexique] ; J. Aguilar-Hernandez [Mexique] ; A. Benami [Mexique] ; J. Fandino [Mexique] ; A. Ponce [Mexique] ; G. Contreras-Puente [Mexique] ; A. Ortiz [Mexique] ; J. C. Alonso [Mexique]Photoluminescence properties of SiNx/Si amorphous multilayer structures grown by plasma-enhanced chemical vapor deposition
003D75 B. Salem [France] ; P. Noe [France] ; F. Mazen [France] ; V. Calvo [France] ; E. Hadji [France]Photoluminescence from Er-doped silicon rich oxide thin films
003E06 F. Gesuele [Italie] ; S. Lettieri [Italie] ; P. Maddalena [Italie] ; C. Ricciardi [Italie] ; V. Ballarini [Italie] ; F. Giorgis [Italie]Optical harmonic generation in amorphous silicon nitride microcavities
003E37 D. Breard [France] ; F. Gourbilleau [France] ; A. Belarouci [France] ; C. Dufour [France] ; R. Rizk [France]Nd3+ photoluminescence study of Nd-doped Si-rich silica films obtained by reactive magnetron sputtering
003E89 M. Jernenkov [France, Russie] ; S. Klimko [Russie, France] ; V. Lauter-Pasyuk [France, Russie, Allemagne] ; H. Lauter [France] ; V. Aksenov [Russie] ; B. Toperverg [Russie]Magnetization of magnetic films determined with Larmor pseudo-precession and spin echo
003F64 Elodie Fortin [France] ; Pascale Mailley [France] ; Loic Lacroix [France] ; Sabine Szunerits [France]Imaging of DNA hybridization on microscopic polypyrrole patterns using scanning electrochemical microscopy (SECM) : the HRP bio-catalyzed oxidation of 4-chloro-1-naphthol
004037 P. Müller-Buschbauma [Allemagne] ; E. Bauer [Allemagne] ; E. Maurer [Allemagne] ; R. Cubitt [France]Fast swelling kinetics of thin polystyrene films
004041 J. W. Arkwright [Australie]Fabrication of optical elements with better than λ/1000 thickness uniformity by thin-film deposition through a multi-aperture mask
004042 Armin G. Aberle [Australie]Fabrication and characterisation of crystalline silicon thin-film materials for solar cells
004069 J. Stradal [Pays-Bas, Australie] ; G. Scholma [Pays-Bas] ; H. Li [Pays-Bas] ; C. H. M. Van Der Werf [Pays-Bas] ; J. K. Rath [Pays-Bas] ; P. I. Widenborg [Australie] ; P. Campbell [Australie] ; A. G. Aberle [Australie] ; R. E. I. Schropp [Pays-Bas]Epitaxial thickening by hot wire chemical vapor deposition of polycrystalline silicon seed layers on glass
004079 SILU TAO [République populaire de Chine] ; ZHAOKUAI PENG [République populaire de Chine] ; XIAOHONG ZHANG [République populaire de Chine] ; SHIKANG WU [République populaire de Chine]Efficient and stable single-dopant white OLEDs based on 9,10-bis (2-naphthyl) anthracene
004100 N. N. Math [Inde] ; L. R. Naik [Inde] ; H. M. Suresh [Inde] ; S. R. Inamdar [Inde]Dual fluorescence and laser emissions from fluorescein-Na and eosin-B
004122 M. Casalino [Italie] ; L. Sirleto [Italie] ; L. Moretti [Italie] ; F. Della Corte [Italie] ; I. Rendina [Italie]Design of a silicon RCE schottky photodetector working at 1.55 μm
004124 A. Bendavid [Australie] ; P. J. Martin [Australie] ; E. W. Preston ; J. Cairney [Australie] ; Z. H. Xie [Australie] ; M. Hoffman [Australie]Deposition of nanocomposite thin films by a hybrid cathodic arc and chemical vapour technique
004140 Peter C. T. Ha [Australie, Hong Kong] ; D. R. Mckenzie [Australie] ; M. M. M. Bilek [Australie] ; E. D. Doyle [Australie] ; D. G. Mcculloch [Australie] ; P. K. Chu [Hong Kong]Control of stress and delamination in single and multi-layer carbon thin films prepared by cathodic arc and RF plasma deposition and implantation
004214 M. J. Henderson [Australie] ; A. Gibaud [France] ; J.-F. Bardeau [France] ; J. W. White [Australie]An X-ray reflectivity study of evaporation-induced self-assembled titania-based films
004351 Laurent A. Francis [Belgique] ; Jean-Michel Friedt [France] ; Randy De Palma [Belgique] ; CHENG ZHOU [Belgique] ; Carmen Bartic [Belgique] ; Andrew Campitelli [Australie] ; Patrick Bertrand [Belgique]Techniques to evaluate the mass sensitivity of Love mode surface acoustic wave biosensors
004355 L. Ryves [Australie] ; M. M. M. Bilek [Australie] ; T. W. H. Oates [Allemagne] ; R. N. Tarrant [Australie] ; D. R. Mckenzie [Australie] ; F. A. Burgmann [Australie] ; D. G. Mcculloch [Australie]Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual source pulsed cathodic arc
004616 Senthil N. Sambandam [États-Unis] ; Bharath Bethala [États-Unis] ; Dinesh K. Sood [Australie] ; Shekhar Bhansali [États-Unis]Evaluation of silicon nitride as a diffusion barrier for Gd-Si-Ge films on silicon
004673 M. Bauer [France] ; A. Mougin [France] ; J. P. Jamet [France] ; V. Repain [France] ; J. Ferre [France] ; R. L. Stamps [France, Australie] ; H. Bernas [France] ; C. Chappert [France]Deroughening of domain wall pairs by dipolar repulsion
004675 V. Fruth [Roumanie] ; M. Popa [Japon] ; D. Berger [Roumanie] ; R. Ramer [Australie] ; M. Gartner [Roumanie] ; A. Ciulei [Roumanie] ; M. Zaharescu [Roumanie]Deposition and characterisation of bismuth oxide thin films
004729 J. Coons [États-Unis] ; P. Halley [Australie] ; S. Mcglashan [Australie] ; T. Tran-Cong [Australie]Bounding the stability and rupture condition of emulsion and foam films
004782 M. M. M. Bilek [Australie] ; M. Verdon [Australie] ; L. Ryves [Australie] ; T. W. H. Oates [Australie] ; C. T. Ha [Australie] ; D. R. Mckenzie [Australie]A model for stress generation and stress relief mechanisms applied to as-deposited filtered cathodic vacuum arc amorphous carbon films
004911 G. Terwagne [Belgique] ; J. Colaux [Belgique] ; D. R. Mitchell [Australie] ; K. T. Short [Australie]Temperature effect of nitrided stainless steel coatings deposited by reactive DC-magnetron sputtering
004A02 T. L. Schiller [Australie] ; D. Sheeja [Singapour] ; D. R. Mckenzie [Australie] ; D. G. Mcculloch [Australie] ; D. S. P. Lau [Singapour] ; S. Burn [Australie] ; B. K. Tay [Singapour]Plasma immersion ion implantation of poly(tetrafluoroethylene)
004B80 S. Mollica [Australie] ; D. K. Sood [Australie] ; P. J. Evans [Australie] ; J. T. Noorman [Australie] ; N. Dytlewski [Australie] ; N. Brack [Australie] ; P. Pigram [Australie] ; K. Latham [Australie]Effect of aluminium ion implantation on the oxidation resistance of DC magnetron sputter-deposited TiB2 thin films
004C06 J. Michler [Suisse] ; M. Aeberhard [Suisse] ; D. Velten [Allemagne] ; S. Winter [Allemagne] ; R. Payling [Suisse, Australie] ; J. Breme [Allemagne]Depth profiling by GDOES: application of hydrogen and d.c. bias voltage corrections to the analysis of thin oxide films
004C89 O. Briot [France] ; B. Maleyre [France] ; S. Ruffenach [France] ; B. Gil [France] ; C. Pinquier [France] ; F. Demangeot [France] ; J. Frandon [France]Absorption and Raman scattering processes in InN films and dots
005220 N. S. Riste [Australie] ; R. L. Stamps [Australie]Spin waves in monolayer Fe films on stepped W surfaces
005339 G. Taillades [France] ; N. Benjelloun [France] ; J. Sarradin [France] ; M. Ribes [France]Metal-based very thin film anodes for lithium ion microbatteries
005369 S. Kaciulis [Italie] ; L. Pandolfi [Italie] ; S. Viticoli [Italie] ; G. Sberveglieri [Italie] ; E. Zampiceni [Italie] ; W. Wlodarski [Australie] ; K. Galatsis [Australie] ; Y. X. Li [Australie]Investigation of thin films of mixed oxides for gas-sensing applications
005406 M. Ionescu [Australie] ; J. Mckinnon [Australie] ; C. Cai [Australie] ; A. Li [Australie] ; K. Konstantinov [Australie] ; A. V. Pan [Australie] ; S. X. Dou [Australie]Growths of MgB2 thin films by pulsed laser deposition
005511 S. T. Davies [Royaume-Uni] ; E. C. Harvey [Australie] ; H. Jin [Australie] ; J. P. Hayes [Australie] ; M. K. Ghantasala [Australie] ; I. Roch [France] ; L. Buchaillot [France]Characterization of micromachining processes during KrF excimer laser ablation of TiNi shape memory alloy thin sheets and films
005A21 R. W. Cheary [Australie] ; E. Dooryhee [France] ; P. Lynch [Australie] ; N. Armstrong [États-Unis] ; S. Dligatch [Australie]X-ray diffraction line broadening from thermally deposited gold films
005A94 E. M. Goldys [Australie] ; M. Godlewski [Pologne] ; R. Langer [France] ; A. Barski [France]Surface morphology of cubic and wurtzite GaN films
005C86 A. Yu. Nikulin [Australie] ; J. R. Davis [Australie] ; N. T. Jones [Australie] ; B. F. Usher [Australie] ; A. Yu. Souvorov [France] ; A. Freund [France]Experimental observation of X-ray diffraction from a thin crystalline film at a 90° Bragg reflection
005D01 A. L. Thomann [France] ; C. Charles [Australie] ; N. Cherradi [France] ; P. Brault [France]Electrical characterization of a dc secondary discharge created during plasma sputtering deposition of palladium thin films
005E65 J. F. Hubbard [Royaume-Uni] ; H. F. Gleeson [Royaume-Uni] ; R. W. Whatmore [Royaume-Uni] ; C. P. Shaw [Royaume-Uni] ; QI ZHANG [Royaume-Uni] ; A. J. Murray [Australie]The interaction of poled thin film ferroelectrics with nematic liquid crystals
006339 M. A. Lieberman [États-Unis] ; R. W. Boswell [Australie]Modeling the transitions from capacitive to inductive to wave-sustained rf discharges
006340 V. S. Amaral [Portugal] ; J. G. Correia [États-Unis, Portugal] ; A. A. C. S. Lourenco [France, Portugal] ; J. G. Marques [Portugal] ; J. A. Mendes [Portugal] ; M. A. Baptista [Portugal] ; J. P. Araujo [Portugal] ; J. M. Moreira [Portugal] ; J. B. Sousa [Portugal] ; E. Alves [Portugal] ; M. F. Da Silva [Portugal] ; J. C. Soares [Portugal]Microscopic studies of radioactive Hg implanted in YBa2Cu3O6+x superconducting thin films
006360 W. A. A. Macedo [Brésil] ; F. Sirotti [France] ; A. Schatz [Allemagne] ; D. Guarisco [Suisse] ; G. Panaccione [France] ; G. Rossi [France, Suisse]Magnetic linear dichroism in photoemission from Fe on CU84Al16(l 0 0) and Cu3Au(1 0 0)
006363 J. A. Caballero [États-Unis] ; W. J. Geerts [États-Unis] ; F. Petroff [France] ; J.-U. Thiele [États-Unis] ; D. Weller [États-Unis] ; J. R. Childress [États-Unis]Magnetic and magneto-optical properties of NiMnSb thin films
006406 S. Pignard [France] ; H. Vincent [France] ; J. P. Senateur [France] ; J. Pierre [France]GMR thin films deposited by a new MOCVD-injection method. preparation, transport properties and magnetic behaviour of self-doped lanthanum manganites La1-xMnO3-δ (0 ≤ x ≤ 0.3)
006428 A. L. Thomann [France] ; C. Charles [Australie] ; P. Brault [France] ; C. Laure [France] ; R. Boswell [Australie]Enhanced deposition rates in plasma sputter deposition
006434 J. F. Scott [Australie] ; A. J. Hartmann [Australie]Effects of constrained geometries and fast access times in real ferroelectric memory devices
006441 U. Ebels [États-Unis] ; P. E. Wigen [États-Unis] ; K. Ounadjela [France]Domain FMR in epitaxial Co(0 0 0 1) films with stripe domains
006613 C. Constantin [Roumanie] ; L. Ribco [Roumanie] ; R. Ramer [Australie] ; M. Stegarescu [Roumanie] ; I. Matei [Roumanie] ; L. Trupina [Roumanie]Superconductor BSCCO thin films obtained by RF sputtering
006643 C. Constantin [Roumanie] ; L. Ribco [Roumanie] ; R. Ramer [Australie] ; M. Stegarescu [Roumanie] ; I. Matei [Roumanie] ; L. Trupina [Roumanie]Pyroelectric detectors from RF sputtered PZT type materials
006692 E. Finkman [Israël] ; H. Rucker [Allemagne] ; F. Meyer [France] ; S. D. Prawer [Australie] ; D. Bouchier [France] ; J. Boulmer [France] ; S. Bodnar [France] ; J. L. Regolini [France]Local strains in Si1-x-yGexCy alloys as deduced from vibrational frequencies
006C06 ZHAO RUPENG [Australie] ; C. A. Davis ; M. J. Goringe ; P. C. Healy ; S. Myhra ; P. S. TurnerSurface reactivity and protection of the YBa2Cu3O7-x HTSC compound

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