6855J And NotJ. R. Davis

List of bibliographic references

Number of relevant bibliographic references: 11.

Ident.	Authors (with country if any)	Title
000806	P. J. Martin [Australie] ; A. Bendavid [Australie] ; K.-H. Müller [Australie] ; L. K. Randeniya [Australie]	Mesoporous surfaces by phase separation of Al-Si thin films
000B44	Renee V. Goreham [Australie] ; Agnieszka Mierczynska [Australie] ; Madelene Pierce [Australie] ; Robert D. Short [Australie] ; Shima Taheri [Australie] ; Akash Bachhuka [Australie] ; Alex Cavallaro [Australie] ; Louise E. Smith [Australie] ; Krasimir Vasilev [Australie]	A substrate independent approach for generation of surface gradients
002374	Z. Messaï [France, Algérie] ; Z. Ouennoughi [Algérie] ; T. Devers [France] ; T. Mouet [France, Algérie] ; V. Harel [France] ; K. Konstantinov [Australie] ; N. Bouguechal [Algérie]	Growth and characteristics of ZnO nano-aggregates electrodeposited onto p-Si(111)
002882	Q. Simon [France] ; V. Bouquet [France] ; W. Peng [France] ; J.-M. Le Floch [France, Australie] ; F. Houdonougbo [France] ; S. Deputier [France] ; S. Weber [France] ; A. Dauscher [France] ; V. Madrangeas [France] ; D. Cros [France] ; M. Guilloux-Viry [France]	Reduction of microwave dielectric losses in KTa1-xNbxO3 thin films by MgO-doping
003226	G. Scardera [Australie] ; E. Bellet-Amalric [Australie, France] ; D. Bellet [Australie, France] ; T. Puzzer [Australie] ; E. Pink [Australie] ; G. Conibeer [Australie]	Formation of a Si-Si3N4 nanocomposite from plasma enhanced chemical vapour deposition multilayer structures
003738	Joy Tan [Australie] ; Wojtek Wlodarski [Australie] ; Kourosh Kalantar-Zadeh [Australie]	Nitrogen dioxide gas sensors based on titanium dioxide thin films deposited on langasite
004675	V. Fruth [Roumanie] ; M. Popa [Japon] ; D. Berger [Roumanie] ; R. Ramer [Australie] ; M. Gartner [Roumanie] ; A. Ciulei [Roumanie] ; M. Zaharescu [Roumanie]	Deposition and characterisation of bismuth oxide thin films
004E20	Lars Oberbeck [Australie] ; Toby Hallam [Australie] ; Neil J. Curson [Australie] ; Michelle Y. Simmons [Australie] ; Robert G. Clark [Australie]	STM investigation of epitaxial Si growth for the fabrication of a Si-based quantum computer
005A21	R. W. Cheary [Australie] ; E. Dooryhee [France] ; P. Lynch [Australie] ; N. Armstrong [États-Unis] ; S. Dligatch [Australie]	X-ray diffraction line broadening from thermally deposited gold films
005A94	E. M. Goldys [Australie] ; M. Godlewski [Pologne] ; R. Langer [France] ; A. Barski [France]	Surface morphology of cubic and wurtzite GaN films
006692	E. Finkman [Israël] ; H. Rucker [Allemagne] ; F. Meyer [France] ; S. D. Prawer [Australie] ; D. Bouchier [France] ; J. Boulmer [France] ; S. Bodnar [France] ; J. L. Regolini [France]	Local strains in Si1-x-yGexCy alloys as deduced from vibrational frequencies

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