LrgpV1, PascalFrancis, Curation, bibRecord, 000723

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

Identifieur interne : 000723 ( PascalFrancis/Curation ); précédent : 000722; suivant : 000724

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

Auteurs : Antoine Mougin [France, Canada] ; Valéry G. Babak [Russie] ; Frank Palmino [France] ; Eric Beche [France] ; Francis Baros [France] ; Darel J. Hunting [Canada] ; Léon Sanche [Canada] ; Michel Fromm [France]

Source :

Surface science [ 0039-6028 ] ; 2008.

RBID : Pascal:08-0128450

Descripteurs français

Pascal (Inist)
- Condensation, Bore, Matériau dopé, Silicium, Microscopie force atomique, Couche Langmuir Blodgett, Agent surface, B, Si.
Wicri :
- topic : Condensation.

English descriptors

KwdEn :
- Atomic force microscopy, Boron, Doped materials, Langmuir-Blodgett films, Silicon, Surfactants, Vapor condensation.

Abstract

Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.

A01	`01`	`1`		`@0 0039-6028`
A02	`01`			`@0 SUSCAS`
A03		`1`		`@0 Surf. sci.`
A05				`@2 602`
A06				`@2 1`
A08	`01`	`1`	`ENG`	`@1 TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate`
A11	`01`	`1`		`@1 MOUGIN (Antoine)`
A11	`02`	`1`		`@1 BABAK (Valéry G.)`
A11	`03`	`1`		`@1 PALMINO (Frank)`
A11	`04`	`1`		`@1 BECHE (Eric)`
A11	`05`	`1`		`@1 BAROS (Francis)`
A11	`06`	`1`		`@1 HUNTING (Darel J.)`
A11	`07`	`1`		`@1 SANCHE (Léon)`
A11	`08`	`1`		`@1 FROMM (Michel)`
A14	`01`			`@1 LMN-AC, UMR CEA E4, Université de Franche-Comté, 16 route de Gray @2 25030 Besancon @3 FRA @Z 1 aut. @Z 8 aut.`
A14	`02`			`@1 Centre for Research in Radiooncology, Faculté de Médecine, Université de Sherbrooke @2 Sherbrooke, QC, J1H 5N4 @3 CAN @Z 1 aut. @Z 6 aut. @Z 7 aut.`
A14	`03`			`@1 INEOS RAS, 28 Vavilova @2 Moscow 117813 @3 RUS @Z 2 aut.`
A14	`04`			`@1 FEMTO-ST/Dpt LPMO, UMR CNRS 6174, BP 71427 @2 25211 Montbéliard @3 FRA @Z 3 aut.`
A14	`05`			`@1 PROMES, UMR CNRS 8521, BP 5 Odeillo @2 66125 Font Romeu @3 FRA @Z 4 aut.`
A14	`06`			`@1 UMR CNRS 7630/INPL, ENSIC-DCPR, 1 rue Grandville @2 54001 Nancy @3 FRA @Z 5 aut.`
A20				`@1 142-150`
A21				`@1 2008`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 12426 @5 354000162776350210`
A44				`@0 0000 @1 © 2008 INIST-CNRS. All rights reserved.`
A45				`@0 41 ref.`
A47	`01`	`1`		`@0 08-0128450`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 Surface science`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	@0 Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.
C02	`01`	`3`		`@0 001B60`
C02	`02`	`3`		`@0 001B70`
C02	`03`	`3`		`@0 001B80`
C03	`01`	`3`	`FRE`	`@0 Condensation @5 01`
C03	`01`	`3`	`ENG`	`@0 Vapor condensation @5 01`
C03	`02`	`3`	`FRE`	`@0 Bore @2 NC @5 02`
C03	`02`	`3`	`ENG`	`@0 Boron @2 NC @5 02`
C03	`03`	`3`	`FRE`	`@0 Matériau dopé @5 03`
C03	`03`	`3`	`ENG`	`@0 Doped materials @5 03`
C03	`04`	`3`	`FRE`	`@0 Silicium @2 NC @5 04`
C03	`04`	`3`	`ENG`	`@0 Silicon @2 NC @5 04`
C03	`05`	`3`	`FRE`	`@0 Microscopie force atomique @5 05`
C03	`05`	`3`	`ENG`	`@0 Atomic force microscopy @5 05`
C03	`06`	`3`	`FRE`	`@0 Couche Langmuir Blodgett @5 06`
C03	`06`	`3`	`ENG`	`@0 Langmuir-Blodgett films @5 06`
C03	`07`	`3`	`FRE`	`@0 Agent surface @5 07`
C03	`07`	`3`	`ENG`	`@0 Surfactants @5 07`
C03	`08`	`3`	`FRE`	`@0 B @4 INC @5 32`
C03	`09`	`3`	`FRE`	`@0 Si @4 INC @5 33`
N21				`@1 077`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

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Pascal:08-0128450

Le document en format XML

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<front><div type="abstract" xml:lang="en">Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.</div>
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<fA14 i1="01"><s1>LMN-AC, UMR CEA E4, Université de Franche-Comté, 16 route de Gray</s1>
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<sZ>1 aut.</sZ>
<sZ>8 aut.</sZ>
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<sZ>1 aut.</sZ>
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<fA14 i1="04"><s1>FEMTO-ST/Dpt LPMO, UMR CNRS 6174, BP 71427</s1>
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<sZ>3 aut.</sZ>
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<fA14 i1="05"><s1>PROMES, UMR CNRS 8521, BP 5 Odeillo</s1>
<s2>66125 Font Romeu</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
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<fA14 i1="06"><s1>UMR CNRS 7630/INPL, ENSIC-DCPR, 1 rue Grandville</s1>
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<fA66 i1="01"><s0>NLD</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>Our study aims at a better control and understanding of the transfer of a complex [DNA supercoiled plasmid - dodecyltrimethylammonium surfactant] layer from a liquid-vapour water interface onto a silicon surface without any additional cross-linker. The production of the complexed layer and its transfer from the aqueous subphase to the substrate is achieved with a Langmuir-Blodgett device. The substrate consists of a reconstructed boron doped silicon substrate with a nanometer-scale roughness. Using X-ray photoelectron spectroscopy and atomic force microscopy measurements, it is shown that the DNA complexes are stretched in a disorderly manner throughout a 2-4nm high net-like structure. This architecture is composed of tilted cationic surfactant molecules bound electrostatically to DNA, which exhibits a characteristic network arrangement with a measured average fiber diameter of about 45 ± 15 nm covering the entire surface. The mechanism of transfer of this layer onto the planar surface of the semi-conductor and the parameters of the process are analysed and illustrated by atomic force microscopy snapshots. The molecular layer exhibits the typical characteristics of a spinodal decomposition pattern or dewetting features. Plasmid molecules appear like long flattened fibers covering the surface, forming holes of various shapes and areas. The cluster-cluster aggregation of the complex structure gets very much denser on the substrate edge. The supercoiled DNA plasmids undergo conformational changes and a high degree of condensation and aggregation is observed. Perspectives and potential applications are considered.</s0>
</fC01>
<fC02 i1="01" i2="3"><s0>001B60</s0>
</fC02>
<fC02 i1="02" i2="3"><s0>001B70</s0>
</fC02>
<fC02 i1="03" i2="3"><s0>001B80</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>Condensation</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Vapor condensation</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Bore</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Boron</s0>
<s2>NC</s2>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE"><s0>Matériau dopé</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG"><s0>Doped materials</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Silicium</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Silicon</s0>
<s2>NC</s2>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Microscopie force atomique</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Atomic force microscopy</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Couche Langmuir Blodgett</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Langmuir-Blodgett films</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE"><s0>Agent surface</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG"><s0>Surfactants</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>B</s0>
<s4>INC</s4>
<s5>32</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Si</s0>
<s4>INC</s4>
<s5>33</s5>
</fC03>
<fN21><s1>077</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
</pA>
</standard>
</inist>
</record>

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TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

TDAB-induced DNA plasmid condensation on the surface of a reconstructed boron doped silicon substrate

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