LrgpV1, Main, Merge, bibRecord, 002719

Microstereophotolithography using a liquid crystal display as dynamic mask-generator

Identifieur interne : 002719 ( Main/Merge ); précédent : 002718; suivant : 002720

Microstereophotolithography using a liquid crystal display as dynamic mask-generator

Auteurs : A. Bertsch [France] ; S. Zissi [France] ; J. Y. Jezequel [France] ; S. Corbel [France] ; J. C. Andre [France]

Source :

Microsystem technologies [ 0946-7076 ] ; 1997.

RBID : Pascal:97-0292398

Descripteurs français

Pascal (Inist)
- Mécanique précision, Miniaturisation, Photofabrication, Cristal liquide, Processus fabrication, Lithographie, Photolithographie.

English descriptors

KwdEn :
- Liquid crystals, Lithography, Miniaturization, Photofabrication, Photolithography, Precision engineering, Production process.

Abstract

A new laser microstereophotolithography process has been developed in our laboratory to manufacture three-dimensional parts with a high accuracy. As usual in laser stereophotolithography or laser microstereophotolithography, the part is manufactured layer by layer by a light-induced space-resolved polymerization. Until now, in all the already existing microstereophotolithography devices a layer is manufactured vector by vector, by moving the part beneath the initiating light source which remains motionless. We developed a simpler and easier process, in which we can manufacture an entire layer by irradiating its whole surface only once: we used a liquid crystal display as a dynamic generator of masks. In the device we set up, we need only one mobile element, the z translator, all the others are fixed. We manufactured several different 3D microparts, in particular a piece of bevel microgearing with helicoidal cogs, the volume of which is less than half a cubic millimetre.

Links toward previous steps (curation, corpus...)

to stream PascalFrancis, to step Corpus: 000D95
to stream PascalFrancis, to step Curation: 001154
to stream PascalFrancis, to step Checkpoint: 000D49

Links to Exploration step

Pascal:97-0292398

Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Microstereophotolithography using a liquid crystal display as dynamic mask-generator</title>
<author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Zissi, S" sort="Zissi, S" uniqKey="Zissi S" first="S." last="Zissi">S. Zissi</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Corbel, S" sort="Corbel, S" uniqKey="Corbel S" first="S." last="Corbel">S. Corbel</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">97-0292398</idno>
<date when="1997">1997</date>
<idno type="stanalyst">PASCAL 97-0292398 INIST</idno>
<idno type="RBID">Pascal:97-0292398</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">000D95</idno>
<idno type="wicri:Area/PascalFrancis/Curation">001154</idno>
<idno type="wicri:Area/PascalFrancis/Checkpoint">000D49</idno>
<idno type="wicri:explorRef" wicri:stream="PascalFrancis" wicri:step="Checkpoint">000D49</idno>
<idno type="wicri:doubleKey">0946-7076:1997:Bertsch A:microstereophotolithography:using:a</idno>
<idno type="wicri:Area/Main/Merge">002719</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Microstereophotolithography using a liquid crystal display as dynamic mask-generator</title>
<author><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Zissi, S" sort="Zissi, S" uniqKey="Zissi S" first="S." last="Zissi">S. Zissi</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Corbel, S" sort="Corbel, S" uniqKey="Corbel S" first="S." last="Corbel">S. Corbel</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
<author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name>
<affiliation wicri:level="3"><inist:fA14 i1="01"><s1>GdR 1080 CNRS "Procédés Optiques ; Applications aux Microtechniques" DCPR-ENSIC-INPL, B.P. 451</s1>
<s2>54001 Nancy</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
</inist:fA14>
<country>France</country>
<placeName><region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
<settlement type="city">Nancy</settlement>
</placeName>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">Microsystem technologies</title>
<title level="j" type="abbreviated">Microsyst. technol.</title>
<idno type="ISSN">0946-7076</idno>
<imprint><date when="1997">1997</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">Microsystem technologies</title>
<title level="j" type="abbreviated">Microsyst. technol.</title>
<idno type="ISSN">0946-7076</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Liquid crystals</term>
<term>Lithography</term>
<term>Miniaturization</term>
<term>Photofabrication</term>
<term>Photolithography</term>
<term>Precision engineering</term>
<term>Production process</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Mécanique précision</term>
<term>Miniaturisation</term>
<term>Photofabrication</term>
<term>Cristal liquide</term>
<term>Processus fabrication</term>
<term>Lithographie</term>
<term>Photolithographie</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">A new laser microstereophotolithography process has been developed in our laboratory to manufacture three-dimensional parts with a high accuracy. As usual in laser stereophotolithography or laser microstereophotolithography, the part is manufactured layer by layer by a light-induced space-resolved polymerization. Until now, in all the already existing microstereophotolithography devices a layer is manufactured vector by vector, by moving the part beneath the initiating light source which remains motionless. We developed a simpler and easier process, in which we can manufacture an entire layer by irradiating its whole surface only once: we used a liquid crystal display as a dynamic generator of masks. In the device we set up, we need only one mobile element, the z translator, all the others are fixed. We manufactured several different 3D microparts, in particular a piece of bevel microgearing with helicoidal cogs, the volume of which is less than half a cubic millimetre.</div>
</front>
</TEI>
<affiliations><list><country><li>France</li>
</country>
<region><li>Grand Est</li>
<li>Lorraine (région)</li>
</region>
<settlement><li>Nancy</li>
</settlement>
</list>
<tree><country name="France"><region name="Grand Est"><name sortKey="Bertsch, A" sort="Bertsch, A" uniqKey="Bertsch A" first="A." last="Bertsch">A. Bertsch</name>
</region>
<name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="Andre">J. C. Andre</name>
<name sortKey="Corbel, S" sort="Corbel, S" uniqKey="Corbel S" first="S." last="Corbel">S. Corbel</name>
<name sortKey="Jezequel, J Y" sort="Jezequel, J Y" uniqKey="Jezequel J" first="J. Y." last="Jezequel">J. Y. Jezequel</name>
<name sortKey="Zissi, S" sort="Zissi, S" uniqKey="Zissi S" first="S." last="Zissi">S. Zissi</name>
</country>
</tree>
</affiliations>
</record>

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=$WICRI_ROOT/Wicri/Lorraine/explor/LrgpV1/Data/Main/Merge

HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 002719 | SxmlIndent | more

HfdSelect -h $EXPLOR_AREA/Data/Main/Merge/biblio.hfd -nk 002719 | SxmlIndent | more

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=    Wicri/Lorraine
   |area=    LrgpV1
   |flux=    Main
   |étape=   Merge
   |type=    RBID
   |clé=     Pascal:97-0292398
   |texte=   Microstereophotolithography using a liquid crystal display as dynamic mask-generator
}}

This area was generated with Dilib version V0.6.32.
Data generation: Sat Nov 11 15:47:48 2017. Site generation: Wed Mar 6 23:31:34 2024

	Serveur d'exploration sur le LRGP
	Attention, ce site est en cours de développement ! Attention, site généré par des moyens informatiques à partir de corpus bruts. Les informations ne sont donc pas validées.

Serveur d'exploration sur le LRGP

Microstereophotolithography using a liquid crystal display as dynamic mask-generator

Microstereophotolithography using a liquid crystal display as dynamic mask-generator

Source :

Descripteurs français

English descriptors

Abstract

Links toward previous steps (curation, corpus...)

Links to Exploration step

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri