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Effect of the Mixing on the Dielectric Constant of Poly(vinylidene fluoride)/Isotactic Polypropylene Blends

Identifieur interne : 000577 ( Main/Exploration ); précédent : 000576; suivant : 000578

Effect of the Mixing on the Dielectric Constant of Poly(vinylidene fluoride)/Isotactic Polypropylene Blends

Auteurs : Jun Zhao [République populaire de Chine] ; Xiaoqing Yin [République populaire de Chine] ; Jingdan Shi [République populaire de Chine] ; Xiaodong Zhao [République populaire de Chine] ; Xiaoyan Wang [République populaire de Chine] ; Min Chen [République populaire de Chine] ; Zhi-Min Dang [République populaire de Chine] ; Guo-Hua Hu [France]

Source :

RBID : Hal:hal-01282210

Abstract

In this work, the effect of a mixing process on the dielectric constant (epsilon) of a typical immiscible blend, poly(vinylidene fluoride) (PVDF)/isotactic polypropylene (iPP), is investigated. An iPP with a relatively low epsilon (ca. 3.4) is added to a PVDF matrix with a relatively high epsilon (ca. 9.5) to reduce the 8 of the system. The blend has a narrow window of cocontinuity (volume fraction of iPP (v(iPP)) of ca. 50-80 vol%). All of the measured epsilon values for the blends lie within the two limits defined by the parallel alignment and series alignment models, which are the upper and lower limits, respectively. It is found that for blends with v(iPP) of ca. 39.7 vol%, for which PVDF is the continuous matrix and iPP is the dispersed phase, prolonging mixing time and adding compatibilizer cause a monotonic decrease of epsilon for the system, which can be attributed to the increasing dispersion of the low-epsilon iPP filler in the high-epsilon PVDF matrix. Based on these results, a strategy to tune the epsilon of polymer blends and composites is discussed. It is suggested that architecture similar to a series alignment will favor the decrease of epsilon, while architecture similar to a parallel alignment will favor the increase of epsilon.

Url:
DOI: 10.1166/sam.2013.1481


Affiliations:


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<orgName type="acronym">USTB</orgName>
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<addrLine>30 Xueyuan Road, Haidian District, Beijing 100083 P. R.China</addrLine>
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<country>République populaire de Chine</country>
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<name sortKey="Hu, Guo Hua" sort="Hu, Guo Hua" uniqKey="Hu G" first="Guo-Hua" last="Hu">Guo-Hua Hu</name>
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<idno type="IdRef">153068876</idno>
<idno type="RNSR">201320573K</idno>
<idno type="IdUnivLorraine">[UL]RQC--</idno>
<orgName>Laboratoire Réactions et Génie des Procédés</orgName>
<orgName type="acronym">LRGP</orgName>
<date type="start">2013-01-01</date>
<desc>
<address>
<addrLine>Université de Lorraine - ENSIC, 1 rue de Grandville BP 20451, 54001 Nancy Cedex</addrLine>
<country key="FR"></country>
</address>
<ref type="url">http://lrgp.univ-lorraine.fr/</ref>
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<orgName>Université de Lorraine</orgName>
<orgName type="acronym">UL</orgName>
<date type="start">2012-01-01</date>
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<addrLine>34 cours Léopold - CS 25233 - 54052 Nancy cedex</addrLine>
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</address>
<ref type="url">http://www.univ-lorraine.fr/</ref>
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<orgName>Centre National de la Recherche Scientifique</orgName>
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<country>France</country>
<placeName>
<settlement type="city">Nancy</settlement>
<settlement type="city">Metz</settlement>
<region type="region" nuts="2">Grand Est</region>
<region type="old region" nuts="2">Lorraine (région)</region>
</placeName>
<orgName type="university">Université de Lorraine</orgName>
<placeName>
<settlement type="city">Nancy</settlement>
<region type="region" nuts="2">Grand Est</region>
<region type="region" nuts="2">Lorraine (région)</region>
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<div type="abstract" xml:lang="en">In this work, the effect of a mixing process on the dielectric constant (epsilon) of a typical immiscible blend, poly(vinylidene fluoride) (PVDF)/isotactic polypropylene (iPP), is investigated. An iPP with a relatively low epsilon (ca. 3.4) is added to a PVDF matrix with a relatively high epsilon (ca. 9.5) to reduce the 8 of the system. The blend has a narrow window of cocontinuity (volume fraction of iPP (v(iPP)) of ca. 50-80 vol%). All of the measured epsilon values for the blends lie within the two limits defined by the parallel alignment and series alignment models, which are the upper and lower limits, respectively. It is found that for blends with v(iPP) of ca. 39.7 vol%, for which PVDF is the continuous matrix and iPP is the dispersed phase, prolonging mixing time and adding compatibilizer cause a monotonic decrease of epsilon for the system, which can be attributed to the increasing dispersion of the low-epsilon iPP filler in the high-epsilon PVDF matrix. Based on these results, a strategy to tune the epsilon of polymer blends and composites is discussed. It is suggested that architecture similar to a series alignment will favor the decrease of epsilon, while architecture similar to a parallel alignment will favor the increase of epsilon.</div>
</front>
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<affiliations>
<list>
<country>
<li>France</li>
<li>République populaire de Chine</li>
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<li>Grand Est</li>
<li>Lorraine (région)</li>
</region>
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<li>Metz</li>
<li>Nancy</li>
</settlement>
<orgName>
<li>Centre national de la recherche scientifique</li>
<li>Laboratoire réactions et génie des procédés</li>
<li>Université de Lorraine</li>
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<tree>
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<noRegion>
<name sortKey="Zhao, Jun" sort="Zhao, Jun" uniqKey="Zhao J" first="Jun" last="Zhao">Jun Zhao</name>
</noRegion>
<name sortKey="Chen, Min" sort="Chen, Min" uniqKey="Chen M" first="Min" last="Chen">Min Chen</name>
<name sortKey="Dang, Zhi Min" sort="Dang, Zhi Min" uniqKey="Dang Z" first="Zhi-Min" last="Dang">Zhi-Min Dang</name>
<name sortKey="Shi, Jingdan" sort="Shi, Jingdan" uniqKey="Shi J" first="Jingdan" last="Shi">Jingdan Shi</name>
<name sortKey="Wang, Xiaoyan" sort="Wang, Xiaoyan" uniqKey="Wang X" first="Xiaoyan" last="Wang">Xiaoyan Wang</name>
<name sortKey="Yin, Xiaoqing" sort="Yin, Xiaoqing" uniqKey="Yin X" first="Xiaoqing" last="Yin">Xiaoqing Yin</name>
<name sortKey="Zhao, Xiaodong" sort="Zhao, Xiaodong" uniqKey="Zhao X" first="Xiaodong" last="Zhao">Xiaodong Zhao</name>
</country>
<country name="France">
<region name="Grand Est">
<name sortKey="Hu, Guo Hua" sort="Hu, Guo Hua" uniqKey="Hu G" first="Guo-Hua" last="Hu">Guo-Hua Hu</name>
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