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<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en">High-resolution <italic>in situ</italic> x-ray study of the hydrophobic gap at the water–octadecyl-trichlorosilane interface</title><author><name sortKey="Mezger, Markus" sort="Mezger, Markus" uniqKey="Mezger M" first="Markus" last="Mezger">Markus Mezger</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Reichert, Harald" sort="Reichert, Harald" uniqKey="Reichert H" first="Harald" last="Reichert">Harald Reichert</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Schoder, Sebastian" sort="Schoder, Sebastian" uniqKey="Schoder S" first="Sebastian" last="Schöder">Sebastian Schöder</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author><author><name sortKey="Okasinski, John" sort="Okasinski, John" uniqKey="Okasinski J" first="John" last="Okasinski">John Okasinski</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author><author><name sortKey="Schroder, Heiko" sort="Schroder, Heiko" uniqKey="Schroder H" first="Heiko" last="Schröder">Heiko Schröder</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Dosch, Helmut" sort="Dosch, Helmut" uniqKey="Dosch H" first="Helmut" last="Dosch">Helmut Dosch</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff id="aff2">Institut für Theoretische und Angewandte Physik, Universität Stuttgart, Pfaffenwaldring 57, D-70550 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Palms, Dennis" sort="Palms, Dennis" uniqKey="Palms D" first="Dennis" last="Palms">Dennis Palms</name><affiliation><nlm:aff id="aff4">Ian Wark Research Institute, University of South Australia, Mawson Lakes SA 5095, Australia</nlm:aff></affiliation></author><author><name sortKey="Ralston, John" sort="Ralston, John" uniqKey="Ralston J" first="John" last="Ralston">John Ralston</name><affiliation><nlm:aff id="aff4">Ian Wark Research Institute, University of South Australia, Mawson Lakes SA 5095, Australia</nlm:aff></affiliation></author><author><name sortKey="Honkim Ki, Veijo" sort="Honkim Ki, Veijo" uniqKey="Honkim Ki V" first="Veijo" last="Honkim Ki">Veijo Honkim Ki</name><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">PMC</idno><idno type="pmid">17116878</idno><idno type="pmc">1654137</idno><idno type="url">http://www.ncbi.nlm.nih.gov/pmc/articles/PMC1654137</idno><idno type="RBID">PMC:1654137</idno><idno type="doi">10.1073/pnas.0608827103</idno><date when="2006">2006</date><idno type="wicri:Area/Pmc/Corpus">001C17</idno><idno type="wicri:explorRef" wicri:stream="Pmc" wicri:step="Corpus" wicri:corpus="PMC">001C17</idno></publicationStmt><sourceDesc><biblStruct><analytic><title xml:lang="en" level="a" type="main">High-resolution <italic>in situ</italic> x-ray study of the hydrophobic gap at the water–octadecyl-trichlorosilane interface</title><author><name sortKey="Mezger, Markus" sort="Mezger, Markus" uniqKey="Mezger M" first="Markus" last="Mezger">Markus Mezger</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Reichert, Harald" sort="Reichert, Harald" uniqKey="Reichert H" first="Harald" last="Reichert">Harald Reichert</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Schoder, Sebastian" sort="Schoder, Sebastian" uniqKey="Schoder S" first="Sebastian" last="Schöder">Sebastian Schöder</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author><author><name sortKey="Okasinski, John" sort="Okasinski, John" uniqKey="Okasinski J" first="John" last="Okasinski">John Okasinski</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author><author><name sortKey="Schroder, Heiko" sort="Schroder, Heiko" uniqKey="Schroder H" first="Heiko" last="Schröder">Heiko Schröder</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Dosch, Helmut" sort="Dosch, Helmut" uniqKey="Dosch H" first="Helmut" last="Dosch">Helmut Dosch</name><affiliation><nlm:aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</nlm:aff></affiliation><affiliation><nlm:aff id="aff2">Institut für Theoretische und Angewandte Physik, Universität Stuttgart, Pfaffenwaldring 57, D-70550 Stuttgart, Germany;</nlm:aff></affiliation></author><author><name sortKey="Palms, Dennis" sort="Palms, Dennis" uniqKey="Palms D" first="Dennis" last="Palms">Dennis Palms</name><affiliation><nlm:aff id="aff4">Ian Wark Research Institute, University of South Australia, Mawson Lakes SA 5095, Australia</nlm:aff></affiliation></author><author><name sortKey="Ralston, John" sort="Ralston, John" uniqKey="Ralston J" first="John" last="Ralston">John Ralston</name><affiliation><nlm:aff id="aff4">Ian Wark Research Institute, University of South Australia, Mawson Lakes SA 5095, Australia</nlm:aff></affiliation></author><author><name sortKey="Honkim Ki, Veijo" sort="Honkim Ki, Veijo" uniqKey="Honkim Ki V" first="Veijo" last="Honkim Ki">Veijo Honkim Ki</name><affiliation><nlm:aff wicri:cut="; and" id="aff3">European Synchrotron Radiation Facility, F-38043 Grenoble, France</nlm:aff></affiliation></author></analytic><series><title level="j">Proceedings of the National Academy of Sciences of the United States of America</title><idno type="ISSN">0027-8424</idno><idno type="eISSN">1091-6490</idno><imprint><date when="2006">2006</date></imprint></series></biblStruct></sourceDesc></fileDesc><profileDesc><textClass></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en"><p>The knowledge of the microscopic structure of water at interfaces is essential for the understanding of interfacial phenomena in numerous natural and technological environments. To study deeply buried liquid water–solid interfaces, high-energy x-ray reflectivity measurements have been performed. Silicon wafers, functionalized by a self-assembled monolayer of octadecyl-trichlorosilane, provide strongly hydrophobic substrates. We show interfacial density profiles with angstrom resolution near the solid–liquid interface of water in contact with an octadecyl-trichlorosilane layer. The experimental data provide clear evidence for the existence of a hydrophobic gap on the molecular scale with an integrated density deficit ρ<italic>d</italic> = 1.1 Å g cm<sup>−3</sup> at the solid–water interface. In addition, measurements on the influence of gases (Ar, Xe, Kr, N<sub>2</sub>, O<sub>2</sub>, CO, and CO<sub>2</sub>) and HCl, dissolved in the water, have been performed. No effect on the hydrophobic water gap was found.</p></div></front></TEI><pmc article-type="research-article"><pmc-comment>The publisher of this article does not allow downloading of the full text in XML form.</pmc-comment>
<front><journal-meta><journal-id journal-id-type="nlm-ta">Proc Natl Acad Sci U S A</journal-id><journal-id journal-id-type="publisher-id">PNAS</journal-id><journal-title>Proceedings of the National Academy of Sciences of the United States of America</journal-title><issn pub-type="ppub">0027-8424</issn><issn pub-type="epub">1091-6490</issn><publisher><publisher-name>National Academy of Sciences</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="pmid">17116878</article-id><article-id pub-id-type="pmc">1654137</article-id><article-id pub-id-type="publisher-id">4273</article-id><article-id pub-id-type="doi">10.1073/pnas.0608827103</article-id><article-categories><subj-group subj-group-type="heading"><subject>Physical Sciences</subject><subj-group><subject>Applied Physical Sciences</subject></subj-group></subj-group></article-categories><title-group><article-title>High-resolution <italic>in situ</italic> x-ray study of the hydrophobic gap at the water–octadecyl-trichlorosilane interface</article-title></title-group><contrib-group><contrib contrib-type="author"><name><surname>Mezger</surname><given-names>Markus</given-names></name><xref rid="aff1" ref-type="aff">*</xref></contrib><contrib contrib-type="author"><name><surname>Reichert</surname><given-names>Harald</given-names></name><xref rid="aff1" ref-type="aff">*</xref><xref ref-type="corresp" rid="cor1"><sup>†</sup></xref></contrib><contrib contrib-type="author"><name><surname>Schöder</surname><given-names>Sebastian</given-names></name><xref rid="aff1" ref-type="aff">*</xref><xref rid="aff3" ref-type="aff"><sup>‡</sup></xref></contrib><contrib contrib-type="author"><name><surname>Okasinski</surname><given-names>John</given-names></name><xref rid="aff1" ref-type="aff">*</xref><xref rid="aff3" ref-type="aff"><sup>‡</sup></xref></contrib><contrib contrib-type="author"><name><surname>Schröder</surname><given-names>Heiko</given-names></name><xref rid="aff1" ref-type="aff">*</xref></contrib><contrib contrib-type="author"><name><surname>Dosch</surname><given-names>Helmut</given-names></name><xref rid="aff1" ref-type="aff">*</xref><xref rid="aff2" ref-type="aff"><sup>§</sup></xref></contrib><contrib contrib-type="author"><name><surname>Palms</surname><given-names>Dennis</given-names></name><xref rid="aff4" ref-type="aff"><sup>¶</sup></xref></contrib><contrib contrib-type="author"><name><surname>Ralston</surname><given-names>John</given-names></name><xref rid="aff4" ref-type="aff"><sup>¶</sup></xref></contrib><contrib contrib-type="author"><name><surname>Honkimäki</surname><given-names>Veijo</given-names></name><xref rid="aff3" ref-type="aff"><sup>‡</sup></xref></contrib><aff id="aff1">*Max-Planck-Institut für Metallforschung, Heisenbergstrasse 3, D-70569 Stuttgart, Germany;</aff><aff id="aff2"><sup>§</sup>Institut für Theoretische und Angewandte Physik, Universität Stuttgart, Pfaffenwaldring 57, D-70550 Stuttgart, Germany;</aff><aff id="aff3"><sup>‡</sup>European Synchrotron Radiation Facility, F-38043 Grenoble, France; and</aff><aff id="aff4"><sup>¶</sup>Ian Wark Research Institute, University of South Australia, Mawson Lakes SA 5095, Australia</aff></contrib-group><author-notes><corresp id="cor1"><sup>†</sup>To whom correspondence should be addressed. E-mail:
<email>reichert@mf.mpg.de</email></corresp><fn fn-type="com"><p>Communicated by Philip H. Bucksbaum, Stanford University, Menlo Park, CA, October 6, 2006</p></fn><fn fn-type="con"><p>Author contributions: H.R., H.D., and J.R. designed research; M.M., H.R., S.S., J.O., H.S., D.P., and V.H. performed research; M.M. and S.S. analyzed data; and M.M., H.R., and H.D. wrote the paper.</p></fn></author-notes><pub-date pub-type="ppub"><day>5</day><month>12</month><year>2006</year></pub-date><pub-date pub-type="epub"><day>20</day><month>11</month><year>2006</year></pub-date><volume>103</volume><issue>49</issue><fpage>18401</fpage><lpage>18404</lpage><history><date date-type="received"><day>31</day><month>7</month><year>2006</year></date></history><copyright-statement>© 2006 by The National Academy of Sciences of the USA</copyright-statement><copyright-year>2006</copyright-year><license license-type="open-access"><p>Freely available online through the PNAS open access option.</p></license><self-uri xlink:title="pdf" xlink:href="zpq04906018401.pdf"></self-uri><abstract><p>The knowledge of the microscopic structure of water at interfaces is essential for the understanding of interfacial phenomena in numerous natural and technological environments. To study deeply buried liquid water–solid interfaces, high-energy x-ray reflectivity measurements have been performed. Silicon wafers, functionalized by a self-assembled monolayer of octadecyl-trichlorosilane, provide strongly hydrophobic substrates. We show interfacial density profiles with angstrom resolution near the solid–liquid interface of water in contact with an octadecyl-trichlorosilane layer. The experimental data provide clear evidence for the existence of a hydrophobic gap on the molecular scale with an integrated density deficit ρ<italic>d</italic> = 1.1 Å g cm<sup>−3</sup> at the solid–water interface. In addition, measurements on the influence of gases (Ar, Xe, Kr, N<sub>2</sub>, O<sub>2</sub>, CO, and CO<sub>2</sub>) and HCl, dissolved in the water, have been performed. No effect on the hydrophobic water gap was found.</p></abstract><kwd-group><kwd>hydrophobicity</kwd><kwd>interfacial water</kwd><kwd>x-ray reflectivity</kwd></kwd-group><custom-meta-wrap><custom-meta><meta-name>PDF</meta-name><meta-value><uri xlink:type="simple" xlink:href="zpq04906018401.pdf"></uri></meta-value></custom-meta></custom-meta-wrap></article-meta></front></pmc></record>Pour manipuler ce document sous Unix (Dilib)
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