AustralieFrV1, PascalFrancis, Curation, bibRecord, 000A17

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Identifieur interne : 000A17 ( PascalFrancis/Curation ); précédent : 000A16; suivant : 000A18

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Auteurs : Richard Payling [Australie] ; Patrick Chapon [France] ; Olivier Bonnot [France] ; Philippe Belenguer [France] ; Philippe Guillot [France] ; Leanne C. Pitchford [France] ; Laurent Therese [France] ; Johann Michler [Suisse] ; Max Aeberhard [Suisse]

Source :

ISIJ international [ 0915-1559 ] ; 2002.

RBID : Pascal:02-0343469

Descripteurs français

Pascal (Inist)
- Spectrométrie optique, Emission optique, Décharge luminescente, Radiofréquence, Chimie analytique, Source ion plasma, Revêtement, Dépôt métal, Traitement surface, Etude expérimentale.
Wicri :
- topic : Chimie analytique.

English descriptors

KwdEn :
- Analytical chemistry, Coatings, Experimental study, Glow discharge, Light emission, Metal deposition, Optical spectrometry, Plasma ion source, Radiofrequency, Surface treatment.

Abstract

The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.

A01	`01`	`1`		`@0 0915-1559`
A03		`1`		`@0 ISIJ int.`
A05				`@2 42`
A06				`@3 SUP`
A08	`01`	`1`	`ENG`	`@1 Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy`
A11	`01`	`1`		`@1 PAYLING (Richard)`
A11	`02`	`1`		`@1 CHAPON (Patrick)`
A11	`03`	`1`		`@1 BONNOT (Olivier)`
A11	`04`	`1`		`@1 BELENGUER (Philippe)`
A11	`05`	`1`		`@1 GUILLOT (Philippe)`
A11	`06`	`1`		`@1 PITCHFORD (Leanne C.)`
A11	`07`	`1`		`@1 THERESE (Laurent)`
A11	`08`	`1`		`@1 MICHLER (Johann)`
A11	`09`	`1`		`@1 AEBERHARD (Max)`
A14	`01`			`@1 Department of Physics, University of Newcastle @2 NSW 2308 @3 AUS @Z 1 aut.`
A14	`02`			`@1 Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal @2 91165 Longjumeau @3 FRA @Z 2 aut. @Z 3 aut.`
A14	`03`			`@1 CPAT, UMR 5002, 118 route de Narbonne @2 31062 Toulouse @3 FRA @Z 4 aut. @Z 5 aut. @Z 6 aut. @Z 7 aut.`
A14	`04`			`@1 Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39 @2 3602 Thun @3 CHE @Z 8 aut. @Z 9 aut.`
A20				`@2 S101-S105`
A21				`@1 2002`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 9881 @5 354000100705560200`
A44				`@0 0000 @1 © 2002 INIST-CNRS. All rights reserved.`
A45				`@0 11 ref.`
A47	`01`	`1`		`@0 02-0343469`
A60				`@1 P`
A61				`@0 A`
A64	`01`	`1`		`@0 ISIJ international`
A66	`01`			`@0 JPN`
C01	`01`		`ENG`	@0 The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.
C02	`01`	`X`		`@0 001D11B01`
C02	`02`	`X`		`@0 240`
C03	`01`	`X`	`FRE`	`@0 Spectrométrie optique @5 01`
C03	`01`	`X`	`ENG`	`@0 Optical spectrometry @5 01`
C03	`01`	`X`	`SPA`	`@0 Espectrometría óptica @5 01`
C03	`02`	`X`	`FRE`	`@0 Emission optique @5 02`
C03	`02`	`X`	`ENG`	`@0 Light emission @5 02`
C03	`02`	`X`	`SPA`	`@0 Emisión óptica @5 02`
C03	`03`	`X`	`FRE`	`@0 Décharge luminescente @5 03`
C03	`03`	`X`	`ENG`	`@0 Glow discharge @5 03`
C03	`03`	`X`	`GER`	`@0 Glimmentladung @5 03`
C03	`03`	`X`	`SPA`	`@0 Descarga luminiscente @5 03`
C03	`04`	`X`	`FRE`	`@0 Radiofréquence @5 04`
C03	`04`	`X`	`ENG`	`@0 Radiofrequency @5 04`
C03	`04`	`X`	`SPA`	`@0 Radiofrecuencia @5 04`
C03	`05`	`X`	`FRE`	`@0 Chimie analytique @5 05`
C03	`05`	`X`	`ENG`	`@0 Analytical chemistry @5 05`
C03	`05`	`X`	`SPA`	`@0 Química analítica @5 05`
C03	`06`	`X`	`FRE`	`@0 Source ion plasma @5 06`
C03	`06`	`X`	`ENG`	`@0 Plasma ion source @5 06`
C03	`06`	`X`	`SPA`	`@0 Fuente ión plasma @5 06`
C03	`07`	`X`	`FRE`	`@0 Revêtement @5 07`
C03	`07`	`X`	`ENG`	`@0 Coatings @5 07`
C03	`07`	`X`	`GER`	`@0 Ueberzug @5 07`
C03	`07`	`X`	`SPA`	`@0 Revestimiento @5 07`
C03	`08`	`X`	`FRE`	`@0 Dépôt métal @5 08`
C03	`08`	`X`	`ENG`	`@0 Metal deposition @5 08`
C03	`08`	`X`	`GER`	`@0 Metallbeschichten @5 08`
C03	`08`	`X`	`SPA`	`@0 Deposición metal @5 08`
C03	`09`	`X`	`FRE`	`@0 Traitement surface @5 09`
C03	`09`	`X`	`ENG`	`@0 Surface treatment @5 09`
C03	`09`	`X`	`GER`	`@0 Oberflaechenbehandlung @5 09`
C03	`09`	`X`	`SPA`	`@0 Tratamiento superficie @5 09`
C03	`10`	`X`	`FRE`	`@0 Etude expérimentale @5 10`
C03	`10`	`X`	`ENG`	`@0 Experimental study @5 10`
C03	`10`	`X`	`GER`	`@0 Experimentelle Untersuchung @5 10`
C03	`10`	`X`	`SPA`	`@0 Estudio experimental @5 10`
N21				`@1 189`
N82				`@1 PSI`

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Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy</title>
<author><name sortKey="Payling, Richard" sort="Payling, Richard" uniqKey="Payling R" first="Richard" last="Payling">Richard Payling</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Physics, University of Newcastle</s1>
<s2>NSW 2308</s2>
<s3>AUS</s3>
<sZ>1 aut.</sZ>
</inist:fA14>
<country>Australie</country>
</affiliation>
</author>
<author><name sortKey="Chapon, Patrick" sort="Chapon, Patrick" uniqKey="Chapon P" first="Patrick" last="Chapon">Patrick Chapon</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal</s1>
<s2>91165 Longjumeau</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Bonnot, Olivier" sort="Bonnot, Olivier" uniqKey="Bonnot O" first="Olivier" last="Bonnot">Olivier Bonnot</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal</s1>
<s2>91165 Longjumeau</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Belenguer, Philippe" sort="Belenguer, Philippe" uniqKey="Belenguer P" first="Philippe" last="Belenguer">Philippe Belenguer</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Guillot, Philippe" sort="Guillot, Philippe" uniqKey="Guillot P" first="Philippe" last="Guillot">Philippe Guillot</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Pitchford, Leanne C" sort="Pitchford, Leanne C" uniqKey="Pitchford L" first="Leanne C." last="Pitchford">Leanne C. Pitchford</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Therese, Laurent" sort="Therese, Laurent" uniqKey="Therese L" first="Laurent" last="Therese">Laurent Therese</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Michler, Johann" sort="Michler, Johann" uniqKey="Michler J" first="Johann" last="Michler">Johann Michler</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39</s1>
<s2>3602 Thun</s2>
<s3>CHE</s3>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
<country>Suisse</country>
</affiliation>
</author>
<author><name sortKey="Aeberhard, Max" sort="Aeberhard, Max" uniqKey="Aeberhard M" first="Max" last="Aeberhard">Max Aeberhard</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39</s1>
<s2>3602 Thun</s2>
<s3>CHE</s3>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
<country>Suisse</country>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">02-0343469</idno>
<date when="2002">2002</date>
<idno type="stanalyst">PASCAL 02-0343469 INIST</idno>
<idno type="RBID">Pascal:02-0343469</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">005722</idno>
<idno type="wicri:Area/PascalFrancis/Curation">000A17</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy</title>
<author><name sortKey="Payling, Richard" sort="Payling, Richard" uniqKey="Payling R" first="Richard" last="Payling">Richard Payling</name>
<affiliation wicri:level="1"><inist:fA14 i1="01"><s1>Department of Physics, University of Newcastle</s1>
<s2>NSW 2308</s2>
<s3>AUS</s3>
<sZ>1 aut.</sZ>
</inist:fA14>
<country>Australie</country>
</affiliation>
</author>
<author><name sortKey="Chapon, Patrick" sort="Chapon, Patrick" uniqKey="Chapon P" first="Patrick" last="Chapon">Patrick Chapon</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal</s1>
<s2>91165 Longjumeau</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Bonnot, Olivier" sort="Bonnot, Olivier" uniqKey="Bonnot O" first="Olivier" last="Bonnot">Olivier Bonnot</name>
<affiliation wicri:level="1"><inist:fA14 i1="02"><s1>Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal</s1>
<s2>91165 Longjumeau</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Belenguer, Philippe" sort="Belenguer, Philippe" uniqKey="Belenguer P" first="Philippe" last="Belenguer">Philippe Belenguer</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Guillot, Philippe" sort="Guillot, Philippe" uniqKey="Guillot P" first="Philippe" last="Guillot">Philippe Guillot</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Pitchford, Leanne C" sort="Pitchford, Leanne C" uniqKey="Pitchford L" first="Leanne C." last="Pitchford">Leanne C. Pitchford</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Therese, Laurent" sort="Therese, Laurent" uniqKey="Therese L" first="Laurent" last="Therese">Laurent Therese</name>
<affiliation wicri:level="1"><inist:fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</inist:fA14>
<country>France</country>
</affiliation>
</author>
<author><name sortKey="Michler, Johann" sort="Michler, Johann" uniqKey="Michler J" first="Johann" last="Michler">Johann Michler</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39</s1>
<s2>3602 Thun</s2>
<s3>CHE</s3>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
<country>Suisse</country>
</affiliation>
</author>
<author><name sortKey="Aeberhard, Max" sort="Aeberhard, Max" uniqKey="Aeberhard M" first="Max" last="Aeberhard">Max Aeberhard</name>
<affiliation wicri:level="1"><inist:fA14 i1="04"><s1>Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39</s1>
<s2>3602 Thun</s2>
<s3>CHE</s3>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
</inist:fA14>
<country>Suisse</country>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">ISIJ international</title>
<title level="j" type="abbreviated">ISIJ int.</title>
<idno type="ISSN">0915-1559</idno>
<imprint><date when="2002">2002</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">ISIJ international</title>
<title level="j" type="abbreviated">ISIJ int.</title>
<idno type="ISSN">0915-1559</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Analytical chemistry</term>
<term>Coatings</term>
<term>Experimental study</term>
<term>Glow discharge</term>
<term>Light emission</term>
<term>Metal deposition</term>
<term>Optical spectrometry</term>
<term>Plasma ion source</term>
<term>Radiofrequency</term>
<term>Surface treatment</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Spectrométrie optique</term>
<term>Emission optique</term>
<term>Décharge luminescente</term>
<term>Radiofréquence</term>
<term>Chimie analytique</term>
<term>Source ion plasma</term>
<term>Revêtement</term>
<term>Dépôt métal</term>
<term>Traitement surface</term>
<term>Etude expérimentale</term>
</keywords>
<keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Chimie analytique</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.</div>
</front>
</TEI>
<inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0915-1559</s0>
</fA01>
<fA03 i2="1"><s0>ISIJ int.</s0>
</fA03>
<fA05><s2>42</s2>
</fA05>
<fA06><s3>SUP</s3>
</fA06>
<fA08 i1="01" i2="1" l="ENG"><s1>Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy</s1>
</fA08>
<fA11 i1="01" i2="1"><s1>PAYLING (Richard)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>CHAPON (Patrick)</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>BONNOT (Olivier)</s1>
</fA11>
<fA11 i1="04" i2="1"><s1>BELENGUER (Philippe)</s1>
</fA11>
<fA11 i1="05" i2="1"><s1>GUILLOT (Philippe)</s1>
</fA11>
<fA11 i1="06" i2="1"><s1>PITCHFORD (Leanne C.)</s1>
</fA11>
<fA11 i1="07" i2="1"><s1>THERESE (Laurent)</s1>
</fA11>
<fA11 i1="08" i2="1"><s1>MICHLER (Johann)</s1>
</fA11>
<fA11 i1="09" i2="1"><s1>AEBERHARD (Max)</s1>
</fA11>
<fA14 i1="01"><s1>Department of Physics, University of Newcastle</s1>
<s2>NSW 2308</s2>
<s3>AUS</s3>
<sZ>1 aut.</sZ>
</fA14>
<fA14 i1="02"><s1>Jobin-Yvon Emission Horiba Group, 16-18 rue du Canal</s1>
<s2>91165 Longjumeau</s2>
<s3>FRA</s3>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
</fA14>
<fA14 i1="03"><s1>CPAT, UMR 5002, 118 route de Narbonne</s1>
<s2>31062 Toulouse</s2>
<s3>FRA</s3>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>6 aut.</sZ>
<sZ>7 aut.</sZ>
</fA14>
<fA14 i1="04"><s1>Swiss Federal Laboratories for Materials Testing and Research (EMPA), Feuerwerkerstrasse 39</s1>
<s2>3602 Thun</s2>
<s3>CHE</s3>
<sZ>8 aut.</sZ>
<sZ>9 aut.</sZ>
</fA14>
<fA20><s2>S101-S105</s2>
</fA20>
<fA21><s1>2002</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>9881</s2>
<s5>354000100705560200</s5>
</fA43>
<fA44><s0>0000</s0>
<s1>© 2002 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45><s0>11 ref.</s0>
</fA45>
<fA47 i1="01" i2="1"><s0>02-0343469</s0>
</fA47>
<fA60><s1>P</s1>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>ISIJ international</s0>
</fA64>
<fA66 i1="01"><s0>JPN</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>The radio frequency (RF) powered source is the most stable and capable analytical source available for glow discharge optical emission spectroscopy (GD-OES). It allows the direct analysis of both conductive and non-conductive samples on the same source, without changing the source. Recent developments in RF generators and components have further improved the performance of these sources, and now allow the routine measurement of additional RF parameters such as applied voltage and DC bias voltage. Theoretical studies of the fundamental characteristics of the RF source are providing deeper understanding of how they work, and combined with the new measurement tools will lead to further improvements in analytical performance. Recent theoretical and experimental work on the RF plasma source will be presented. These studies will be illustrated with some recent applications: in metals analysis, plus a hard coating and a non-conductive coating.</s0>
</fC01>
<fC02 i1="01" i2="X"><s0>001D11B01</s0>
</fC02>
<fC02 i1="02" i2="X"><s0>240</s0>
</fC02>
<fC03 i1="01" i2="X" l="FRE"><s0>Spectrométrie optique</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="ENG"><s0>Optical spectrometry</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="X" l="SPA"><s0>Espectrometría óptica</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="X" l="FRE"><s0>Emission optique</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="ENG"><s0>Light emission</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="X" l="SPA"><s0>Emisión óptica</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="X" l="FRE"><s0>Décharge luminescente</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="ENG"><s0>Glow discharge</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="GER"><s0>Glimmentladung</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="SPA"><s0>Descarga luminiscente</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="X" l="FRE"><s0>Radiofréquence</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="ENG"><s0>Radiofrequency</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="X" l="SPA"><s0>Radiofrecuencia</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="X" l="FRE"><s0>Chimie analytique</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="ENG"><s0>Analytical chemistry</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="X" l="SPA"><s0>Química analítica</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="X" l="FRE"><s0>Source ion plasma</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="X" l="ENG"><s0>Plasma ion source</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="X" l="SPA"><s0>Fuente ión plasma</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE"><s0>Revêtement</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG"><s0>Coatings</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="GER"><s0>Ueberzug</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA"><s0>Revestimiento</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="X" l="FRE"><s0>Dépôt métal</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="ENG"><s0>Metal deposition</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="GER"><s0>Metallbeschichten</s0>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="X" l="SPA"><s0>Deposición metal</s0>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="X" l="FRE"><s0>Traitement surface</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="ENG"><s0>Surface treatment</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="GER"><s0>Oberflaechenbehandlung</s0>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="X" l="SPA"><s0>Tratamiento superficie</s0>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="X" l="FRE"><s0>Etude expérimentale</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="X" l="ENG"><s0>Experimental study</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="X" l="GER"><s0>Experimentelle Untersuchung</s0>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="X" l="SPA"><s0>Estudio experimental</s0>
<s5>10</s5>
</fC03>
<fN21><s1>189</s1>
</fN21>
<fN82><s1>PSI</s1>
</fN82>
</pA>
</standard>
</inist>
</record>

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Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

Characterising the radio frequency plasma source for glow discharge optical emission spectroscopy

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