ECO 4 : excimer lasers and applications III, 13-15 March 1991, The Hague
Identifieur interne :
006F32 ( PascalFrancis/Corpus );
précédent :
006F31;
suivant :
006F33
ECO 4 : excimer lasers and applications III, 13-15 March 1991, The Hague
Auteurs : Source :
-
SPIE proceedings series [ 1017-2653 ] ; 1991.
RBID : Pascal:93-0362773
Descripteurs français
English descriptors
Notice en format standard (ISO 2709)
Pour connaître la documentation sur le format Inist Standard.
pA |
A01 | 01 | 1 | | @0 1017-2653 |
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A05 | | | | @2 1503 |
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A09 | 01 | 1 | ENG | @1 ECO 4 : excimer lasers and applications III, 13-15 March 1991, The Hague |
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A12 | 01 | 1 | | @1 LETARDI (Tommaso) @9 ed. |
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A12 | 02 | 1 | | @1 LAUDE (Lucien D.) @9 ed. |
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A18 | 01 | 1 | | @1 Israel Laser and Electro-Optics Society @3 ISR @9 patr. |
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A18 | 02 | 1 | | @1 International Solar Energy Society @2 Melbourne @3 AUS @9 patr. |
---|
A18 | 03 | 1 | | @1 International Commission on Glass @2 Prague @3 CSK @9 patr. |
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A18 | 04 | 1 | | @1 National Group on Quantum Electronics and Plasma Physics @3 INC @9 patr. |
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A18 | 05 | 1 | | @1 European Association for Signal Processing @2 Lausanne @3 CHE @9 patr. |
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A18 | 06 | 1 | | @1 Ecole polytechnique fédérale de Lausanne @2 Lausanne @3 CHE @9 patr. |
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A18 | 07 | 1 | | @1 European Physical Society @2 Petit-Lancy @3 CHE @9 patr. |
---|
A18 | 08 | 1 | | @1 European Federation for Applied Optics @3 INT @9 patr. |
---|
A18 | 09 | 1 | | @1 International Society for Optical Engineering @2 Bellingham WA @3 USA @9 patr. |
---|
A18 | 10 | 1 | | @1 Association nationale de la recherche technique @2 Paris @3 FRA @9 patr. |
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A18 | 11 | 1 | | @1 Associazione elettrotecnica ed elettronica italiana @2 Milano @3 ITA @9 patr. |
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A18 | 12 | 1 | | @1 Société des électriciens et des électroniciens @2 Paris @3 FRA @9 patr. |
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A21 | | | | @1 1991 |
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A23 | 01 | | | @0 ENG |
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A24 | 01 | | | @0 eng |
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A29 | | | | @1 XI, 511 p. @2 28 cm @3 ill., index |
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A43 | 01 | | | @1 INIST @2 21760 @5 354000011998930000 |
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A44 | | | | @0 0000 |
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A47 | 01 | 1 | | @0 93-0362773 |
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A60 | | | | @1 P @2 C |
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A61 | | | | @0 M |
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A64 | | 1 | | @0 SPIE proceedings series |
---|
A66 | 01 | | | @0 USA |
---|
C02 | 01 | X | | @0 001B04G03 |
---|
C03 | 01 | X | FRE | @0 Laser gaz |
---|
C03 | 01 | X | ENG | @0 Gas laser |
---|
C03 | 01 | X | SPA | @0 Laser gas |
---|
C03 | 02 | X | FRE | @0 Laser puissance |
---|
C03 | 02 | X | ENG | @0 Power laser |
---|
C03 | 02 | X | SPA | @0 Laser potencia |
---|
C03 | 03 | X | FRE | @0 Dépôt chimique phase vapeur |
---|
C03 | 03 | X | ENG | @0 Chemical vapor deposition |
---|
C03 | 03 | X | GER | @0 Chemisches Aufdampfen |
---|
C03 | 03 | X | SPA | @0 Depósito químico fase vapor |
---|
C03 | 04 | X | FRE | @0 Excimère |
---|
C03 | 04 | X | ENG | @0 Excimer |
---|
C03 | 04 | X | SPA | @0 Excímero |
---|
C03 | 05 | X | FRE | @0 Application industrielle |
---|
C03 | 05 | X | ENG | @0 Industrial application |
---|
C03 | 05 | X | SPA | @0 Aplicación industrial |
---|
C03 | 06 | X | FRE | @0 Application médicale |
---|
C03 | 06 | X | ENG | @0 Medical application |
---|
C03 | 06 | X | GER | @0 Medizinische Technik |
---|
C03 | 06 | X | SPA | @0 Aplicación medical |
---|
C03 | 07 | X | FRE | @0 Xénon Chlorure @2 NC @2 FR @2 NA |
---|
C03 | 07 | X | ENG | @0 Xenon Chlorides @2 NC @2 FR @2 NA |
---|
C03 | 07 | X | SPA | @0 Xenón Cloruro @2 NC @2 FR @2 NA |
---|
C03 | 08 | X | FRE | @0 Source RX |
---|
C03 | 08 | X | ENG | @0 X ray source |
---|
C03 | 08 | X | SPA | @0 Fuente RX |
---|
C03 | 09 | X | FRE | @0 Application |
---|
C03 | 09 | X | ENG | @0 Application |
---|
C03 | 09 | X | GER | @0 Anwendung |
---|
C03 | 09 | X | SPA | @0 Aplicación |
---|
C03 | 10 | X | FRE | @0 Congrès |
---|
C03 | 10 | X | ENG | @0 Congress |
---|
C03 | 10 | X | GER | @0 Kongress |
---|
C03 | 10 | X | SPA | @0 Congreso |
---|
N21 | | | | @1 143 |
---|
N82 | | | | @0 NBS |
---|
|
pR |
A30 | 01 | 1 | ENG | @1 Excimer lasers and applications III. Conference @3 The Hague @4 1991-03-13 |
---|
|
Format Inist (serveur)
NO : | PASCAL 93-0362773 INIST |
ET : | ECO 4 : excimer lasers and applications III, 13-15 March 1991, The Hague |
AU : | LETARDI (Tommaso); LAUDE (Lucien D.) |
AF : | Israel Laser and Electro-Optics Society/Israël (patr.); International Solar Energy Society/Melbourne/Australie (patr.); International Commission on Glass/Prague/Tchécoslovaquie (patr.); National Group on Quantum Electronics and Plasma Physics/Inconnu (patr.); European Association for Signal Processing/Lausanne/Suisse (patr.); Ecole polytechnique fédérale de Lausanne/Lausanne/Suisse (patr.); European Physical Society/Petit-Lancy/Suisse (patr.); European Federation for Applied Optics/International (patr.); International Society for Optical Engineering/Bellingham WA/Etats-Unis (patr.); Association nationale de la recherche technique/Paris/France (patr.); Associazione elettrotecnica ed elettronica italiana/Milano/Italie (patr.); Société des électriciens et des électroniciens/Paris/France (patr.) |
DT : | Publication en série; Congrès; Niveau monographique |
SO : | SPIE proceedings series; ISSN 1017-2653; Etats-Unis; Da. 1991; Vol. 1503; ; Pp. XI, 511 p.; Abs. anglais; ill., index |
LA : | Anglais |
CC : | 001B04G03 |
FD : | Laser gaz; Laser puissance; Dépôt chimique phase vapeur; Excimère; Application industrielle; Application médicale; Xénon Chlorure; Source RX; Application; Congrès |
ED : | Gas laser; Power laser; Chemical vapor deposition; Excimer; Industrial application; Medical application; Xenon Chlorides; X ray source; Application; Congress |
GD : | Chemisches Aufdampfen; Medizinische Technik; Anwendung; Kongress |
SD : | Laser gas; Laser potencia; Depósito químico fase vapor; Excímero; Aplicación industrial; Aplicación medical; Xenón Cloruro; Fuente RX; Aplicación; Congreso |
LO : | INIST-21760.354000011998930000 |
ID : | 93-0362773 |
Links to Exploration step
Pascal:93-0362773
Le document en format XML
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<s9>patr.</s9>
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<affiliation><inist:fA14 i1="02" i2="1"><s1>International Solar Energy Society</s1>
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<s3>AUS</s3>
<s9>patr.</s9>
</inist:fA14>
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<affiliation><inist:fA14 i1="03" i2="1"><s1>International Commission on Glass</s1>
<s2>Prague</s2>
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<s9>patr.</s9>
</inist:fA14>
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<s3>INC</s3>
<s9>patr.</s9>
</inist:fA14>
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<s9>patr.</s9>
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<affiliation><inist:fA14 i1="08" i2="1"><s1>European Federation for Applied Optics</s1>
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<author><name sortKey="Laude, Lucien D" sort="Laude, Lucien D" uniqKey="Laude L" first="Lucien D." last="Laude">Lucien D. Laude</name>
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<term>Industrial application</term>
<term>Medical application</term>
<term>Power laser</term>
<term>X ray source</term>
<term>Xenon Chlorides</term>
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<term>Laser puissance</term>
<term>Dépôt chimique phase vapeur</term>
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<term>Application industrielle</term>
<term>Application médicale</term>
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<s9>ed.</s9>
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<s9>ed.</s9>
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<s9>patr.</s9>
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<fA18 i1="02" i2="1"><s1>International Solar Energy Society</s1>
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<s9>patr.</s9>
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<fA18 i1="03" i2="1"><s1>International Commission on Glass</s1>
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<s3>CSK</s3>
<s9>patr.</s9>
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<fA18 i1="04" i2="1"><s1>National Group on Quantum Electronics and Plasma Physics</s1>
<s3>INC</s3>
<s9>patr.</s9>
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<fA18 i1="05" i2="1"><s1>European Association for Signal Processing</s1>
<s2>Lausanne</s2>
<s3>CHE</s3>
<s9>patr.</s9>
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<fA18 i1="06" i2="1"><s1>Ecole polytechnique fédérale de Lausanne</s1>
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<s3>CHE</s3>
<s9>patr.</s9>
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<fA18 i1="07" i2="1"><s1>European Physical Society</s1>
<s2>Petit-Lancy</s2>
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<s9>patr.</s9>
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<fA18 i1="08" i2="1"><s1>European Federation for Applied Optics</s1>
<s3>INT</s3>
<s9>patr.</s9>
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<fA18 i1="09" i2="1"><s1>International Society for Optical Engineering</s1>
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<s3>USA</s3>
<s9>patr.</s9>
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<fA18 i1="10" i2="1"><s1>Association nationale de la recherche technique</s1>
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<s3>FRA</s3>
<s9>patr.</s9>
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<fA18 i1="11" i2="1"><s1>Associazione elettrotecnica ed elettronica italiana</s1>
<s2>Milano</s2>
<s3>ITA</s3>
<s9>patr.</s9>
</fA18>
<fA18 i1="12" i2="1"><s1>Société des électriciens et des électroniciens</s1>
<s2>Paris</s2>
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<s9>patr.</s9>
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<fA21><s1>1991</s1>
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<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA24 i1="01"><s0>eng</s0>
</fA24>
<fA29><s1>XI, 511 p.</s1>
<s2>28 cm</s2>
<s3>ill., index</s3>
</fA29>
<fA43 i1="01"><s1>INIST</s1>
<s2>21760</s2>
<s5>354000011998930000</s5>
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<fA44><s0>0000</s0>
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<fA47 i1="01" i2="1"><s0>93-0362773</s0>
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<fA60><s1>P</s1>
<s2>C</s2>
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<fA64 i2="1"><s0>SPIE proceedings series</s0>
</fA64>
<fA66 i1="01"><s0>USA</s0>
</fA66>
<fC02 i1="01" i2="X"><s0>001B04G03</s0>
</fC02>
<fC03 i1="01" i2="X" l="FRE"><s0>Laser gaz</s0>
</fC03>
<fC03 i1="01" i2="X" l="ENG"><s0>Gas laser</s0>
</fC03>
<fC03 i1="01" i2="X" l="SPA"><s0>Laser gas</s0>
</fC03>
<fC03 i1="02" i2="X" l="FRE"><s0>Laser puissance</s0>
</fC03>
<fC03 i1="02" i2="X" l="ENG"><s0>Power laser</s0>
</fC03>
<fC03 i1="02" i2="X" l="SPA"><s0>Laser potencia</s0>
</fC03>
<fC03 i1="03" i2="X" l="FRE"><s0>Dépôt chimique phase vapeur</s0>
</fC03>
<fC03 i1="03" i2="X" l="ENG"><s0>Chemical vapor deposition</s0>
</fC03>
<fC03 i1="03" i2="X" l="GER"><s0>Chemisches Aufdampfen</s0>
</fC03>
<fC03 i1="03" i2="X" l="SPA"><s0>Depósito químico fase vapor</s0>
</fC03>
<fC03 i1="04" i2="X" l="FRE"><s0>Excimère</s0>
</fC03>
<fC03 i1="04" i2="X" l="ENG"><s0>Excimer</s0>
</fC03>
<fC03 i1="04" i2="X" l="SPA"><s0>Excímero</s0>
</fC03>
<fC03 i1="05" i2="X" l="FRE"><s0>Application industrielle</s0>
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<fC03 i1="05" i2="X" l="ENG"><s0>Industrial application</s0>
</fC03>
<fC03 i1="05" i2="X" l="SPA"><s0>Aplicación industrial</s0>
</fC03>
<fC03 i1="06" i2="X" l="FRE"><s0>Application médicale</s0>
</fC03>
<fC03 i1="06" i2="X" l="ENG"><s0>Medical application</s0>
</fC03>
<fC03 i1="06" i2="X" l="GER"><s0>Medizinische Technik</s0>
</fC03>
<fC03 i1="06" i2="X" l="SPA"><s0>Aplicación medical</s0>
</fC03>
<fC03 i1="07" i2="X" l="FRE"><s0>Xénon Chlorure</s0>
<s2>NC</s2>
<s2>FR</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="07" i2="X" l="ENG"><s0>Xenon Chlorides</s0>
<s2>NC</s2>
<s2>FR</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="07" i2="X" l="SPA"><s0>Xenón Cloruro</s0>
<s2>NC</s2>
<s2>FR</s2>
<s2>NA</s2>
</fC03>
<fC03 i1="08" i2="X" l="FRE"><s0>Source RX</s0>
</fC03>
<fC03 i1="08" i2="X" l="ENG"><s0>X ray source</s0>
</fC03>
<fC03 i1="08" i2="X" l="SPA"><s0>Fuente RX</s0>
</fC03>
<fC03 i1="09" i2="X" l="FRE"><s0>Application</s0>
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<fC03 i1="09" i2="X" l="ENG"><s0>Application</s0>
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<fC03 i1="09" i2="X" l="GER"><s0>Anwendung</s0>
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<fC03 i1="09" i2="X" l="SPA"><s0>Aplicación</s0>
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<fC03 i1="10" i2="X" l="FRE"><s0>Congrès</s0>
</fC03>
<fC03 i1="10" i2="X" l="ENG"><s0>Congress</s0>
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<fC03 i1="10" i2="X" l="SPA"><s0>Congreso</s0>
</fC03>
<fN21><s1>143</s1>
</fN21>
<fN82><s0>NBS</s0>
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<pR><fA30 i1="01" i2="1" l="ENG"><s1>Excimer lasers and applications III. Conference</s1>
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<s4>1991-03-13</s4>
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<server><NO>PASCAL 93-0362773 INIST</NO>
<ET>ECO 4 : excimer lasers and applications III, 13-15 March 1991, The Hague</ET>
<AU>LETARDI (Tommaso); LAUDE (Lucien D.)</AU>
<AF>Israel Laser and Electro-Optics Society/Israël (patr.); International Solar Energy Society/Melbourne/Australie (patr.); International Commission on Glass/Prague/Tchécoslovaquie (patr.); National Group on Quantum Electronics and Plasma Physics/Inconnu (patr.); European Association for Signal Processing/Lausanne/Suisse (patr.); Ecole polytechnique fédérale de Lausanne/Lausanne/Suisse (patr.); European Physical Society/Petit-Lancy/Suisse (patr.); European Federation for Applied Optics/International (patr.); International Society for Optical Engineering/Bellingham WA/Etats-Unis (patr.); Association nationale de la recherche technique/Paris/France (patr.); Associazione elettrotecnica ed elettronica italiana/Milano/Italie (patr.); Société des électriciens et des électroniciens/Paris/France (patr.)</AF>
<DT>Publication en série; Congrès; Niveau monographique</DT>
<SO>SPIE proceedings series; ISSN 1017-2653; Etats-Unis; Da. 1991; Vol. 1503; ; Pp. XI, 511 p.; Abs. anglais; ill., index</SO>
<LA>Anglais</LA>
<CC>001B04G03</CC>
<FD>Laser gaz; Laser puissance; Dépôt chimique phase vapeur; Excimère; Application industrielle; Application médicale; Xénon Chlorure; Source RX; Application; Congrès</FD>
<ED>Gas laser; Power laser; Chemical vapor deposition; Excimer; Industrial application; Medical application; Xenon Chlorides; X ray source; Application; Congress</ED>
<GD>Chemisches Aufdampfen; Medizinische Technik; Anwendung; Kongress</GD>
<SD>Laser gas; Laser potencia; Depósito químico fase vapor; Excímero; Aplicación industrial; Aplicación medical; Xenón Cloruro; Fuente RX; Aplicación; Congreso</SD>
<LO>INIST-21760.354000011998930000</LO>
<ID>93-0362773</ID>
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