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Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass

Identifieur interne : 002147 ( PascalFrancis/Corpus ); précédent : 002146; suivant : 002148

Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass

Auteurs : M. K. Bhuyan ; F. Courvoisier ; P.-A. Lacourt ; M. Jacquot ; L. Furfaro ; M. J. Withford ; J. M. Dudley

Source :

RBID : Pascal:11-0013881

Descripteurs français

English descriptors

Abstract

Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

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A08 01  1  ENG  @1 Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass
A09 01  1  ENG  @1 Nonlinear optics and applications IV : 12-15 April 2010, Brussels, Belgium
A11 01  1    @1 BHUYAN (M. K.)
A11 02  1    @1 COURVOISIER (F.)
A11 03  1    @1 LACOURT (P.-A.)
A11 04  1    @1 JACQUOT (M.)
A11 05  1    @1 FURFARO (L.)
A11 06  1    @1 WITHFORD (M. J.)
A11 07  1    @1 DUDLEY (J. M.)
A12 01  1    @1 EGGLETON (Benjamin J.) @9 ed.
A12 02  1    @1 GAETA (Alexander Luis) @9 ed.
A12 03  1    @1 BRODERICK (Neil G. R.) @9 ed.
A14 01      @1 FEMTO-ST Institute, Department of Optics P.M. Duffieux, UMR CNRS 6174, Université de Franche-Comté @2 25030 Besançon @3 FRA @Z 1 aut. @Z 2 aut. @Z 3 aut. @Z 4 aut. @Z 5 aut. @Z 7 aut.
A14 02      @1 CUDOS and MQ Photonics, Department of Physics, Macquarie University @2 New South Wales, 2109 @3 AUS @Z 6 aut.
A18 01  1    @1 SPIE Photonics Europe @3 INC @9 org-cong.
A18 02  1    @1 SPIE @3 USA @9 org-cong.
A20       @2 77281V.1-77281V.8
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A23 01      @0 ENG
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A43 01      @1 INIST @2 21760 @5 354000174705440400
A44       @0 0000 @1 © 2011 INIST-CNRS. All rights reserved.
A45       @0 23 ref.
A47 01  1    @0 11-0013881
A60       @1 P @2 C
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A64 01  1    @0 Proceedings of SPIE, the International Society for Optical Engineering
A66 01      @0 USA
C01 01    ENG  @0 Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.
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C03 02  3  FRE  @0 Optique ultrarapide @5 04
C03 02  3  ENG  @0 Ultrafast optics @5 04
C03 03  3  FRE  @0 Traitement par laser @5 05
C03 03  3  ENG  @0 Laser assisted processing @5 05
C03 04  3  FRE  @0 Modulateur optique spatial @5 11
C03 04  3  ENG  @0 Spatial light modulators @5 11
C03 05  3  FRE  @0 Application laser @5 17
C03 05  3  ENG  @0 Laser beam applications @5 17
C03 06  3  FRE  @0 Optique non linéaire @5 19
C03 06  3  ENG  @0 Nonlinear optics @5 19
C03 07  3  FRE  @0 Positionnement @5 30
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C03 08  3  ENG  @0 Bessel beam @5 37
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C03 09  X  ENG  @0 Gaussian beam @5 38
C03 09  X  SPA  @0 Haz gaussiano @5 38
C03 10  3  FRE  @0 Eau @5 57
C03 10  3  ENG  @0 Water @5 57
C03 11  3  FRE  @0 Verre @5 61
C03 11  3  ENG  @0 Glass @5 61
C03 12  3  FRE  @0 Matériau diélectrique @5 62
C03 12  3  ENG  @0 Dielectric materials @5 62
C03 13  3  FRE  @0 Microfluidique @5 63
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Format Inist (serveur)

NO : PASCAL 11-0013881 INIST
ET : Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass
AU : BHUYAN (M. K.); COURVOISIER (F.); LACOURT (P.-A.); JACQUOT (M.); FURFARO (L.); WITHFORD (M. J.); DUDLEY (J. M.); EGGLETON (Benjamin J.); GAETA (Alexander Luis); BRODERICK (Neil G. R.)
AF : FEMTO-ST Institute, Department of Optics P.M. Duffieux, UMR CNRS 6174, Université de Franche-Comté/25030 Besançon/France (1 aut., 2 aut., 3 aut., 4 aut., 5 aut., 7 aut.); CUDOS and MQ Photonics, Department of Physics, Macquarie University/New South Wales, 2109/Australie (6 aut.)
DT : Publication en série; Congrès; Niveau analytique
SO : Proceedings of SPIE, the International Society for Optical Engineering; ISSN 0277-786X; Coden PSISDG; Etats-Unis; Da. 2010; Vol. 7728; 77281V.1-77281V.8; Bibl. 23 ref.
LA : Anglais
EA : Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.
CC : 001B00A30C; 001B40B65R; 001B40G85D; 002A31C09C; 215
FD : Microusinage; Optique ultrarapide; Traitement par laser; Modulateur optique spatial; Application laser; Optique non linéaire; Positionnement; Faisceau Bessel; Faisceau gaussien; Eau; Verre; Matériau diélectrique; Microfluidique; DNA; 0130C; 4265; 4279H; 4265R; 4785N; 8783; 4262C; Laboratoire sur puce
ED : Micromachining; Ultrafast optics; Laser assisted processing; Spatial light modulators; Laser beam applications; Nonlinear optics; Positioning; Bessel beam; Gaussian beam; Water; Glass; Dielectric materials; Microfluidics; DNA; Lab-on-a-chip
SD : Haz gaussiano
LO : INIST-21760.354000174705440400
ID : 11-0013881

Links to Exploration step

Pascal:11-0013881

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<s1>LACOURT (P.-A.)</s1>
</fA11>
<fA11 i1="04" i2="1">
<s1>JACQUOT (M.)</s1>
</fA11>
<fA11 i1="05" i2="1">
<s1>FURFARO (L.)</s1>
</fA11>
<fA11 i1="06" i2="1">
<s1>WITHFORD (M. J.)</s1>
</fA11>
<fA11 i1="07" i2="1">
<s1>DUDLEY (J. M.)</s1>
</fA11>
<fA12 i1="01" i2="1">
<s1>EGGLETON (Benjamin J.)</s1>
<s9>ed.</s9>
</fA12>
<fA12 i1="02" i2="1">
<s1>GAETA (Alexander Luis)</s1>
<s9>ed.</s9>
</fA12>
<fA12 i1="03" i2="1">
<s1>BRODERICK (Neil G. R.)</s1>
<s9>ed.</s9>
</fA12>
<fA14 i1="01">
<s1>FEMTO-ST Institute, Department of Optics P.M. Duffieux, UMR CNRS 6174, Université de Franche-Comté</s1>
<s2>25030 Besançon</s2>
<s3>FRA</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
<sZ>5 aut.</sZ>
<sZ>7 aut.</sZ>
</fA14>
<fA14 i1="02">
<s1>CUDOS and MQ Photonics, Department of Physics, Macquarie University</s1>
<s2>New South Wales, 2109</s2>
<s3>AUS</s3>
<sZ>6 aut.</sZ>
</fA14>
<fA18 i1="01" i2="1">
<s1>SPIE Photonics Europe</s1>
<s3>INC</s3>
<s9>org-cong.</s9>
</fA18>
<fA18 i1="02" i2="1">
<s1>SPIE</s1>
<s3>USA</s3>
<s9>org-cong.</s9>
</fA18>
<fA20>
<s2>77281V.1-77281V.8</s2>
</fA20>
<fA21>
<s1>2010</s1>
</fA21>
<fA23 i1="01">
<s0>ENG</s0>
</fA23>
<fA25 i1="01">
<s1>SPIE</s1>
<s2>Bellingham, Wash.</s2>
</fA25>
<fA26 i1="01">
<s0>0-8194-8201-3</s0>
</fA26>
<fA26 i1="02">
<s0>978-0-8194-8201-3</s0>
</fA26>
<fA43 i1="01">
<s1>INIST</s1>
<s2>21760</s2>
<s5>354000174705440400</s5>
</fA43>
<fA44>
<s0>0000</s0>
<s1>© 2011 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45>
<s0>23 ref.</s0>
</fA45>
<fA47 i1="01" i2="1">
<s0>11-0013881</s0>
</fA47>
<fA60>
<s1>P</s1>
<s2>C</s2>
</fA60>
<fA61>
<s0>A</s0>
</fA61>
<fA64 i1="01" i2="1">
<s0>Proceedings of SPIE, the International Society for Optical Engineering</s0>
</fA64>
<fA66 i1="01">
<s0>USA</s0>
</fA66>
<fC01 i1="01" l="ENG">
<s0>Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.</s0>
</fC01>
<fC02 i1="01" i2="3">
<s0>001B00A30C</s0>
</fC02>
<fC02 i1="02" i2="3">
<s0>001B40B65R</s0>
</fC02>
<fC02 i1="03" i2="3">
<s0>001B40G85D</s0>
</fC02>
<fC02 i1="04" i2="X">
<s0>002A31C09C</s0>
</fC02>
<fC02 i1="05" i2="X">
<s0>215</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE">
<s0>Microusinage</s0>
<s5>03</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG">
<s0>Micromachining</s0>
<s5>03</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE">
<s0>Optique ultrarapide</s0>
<s5>04</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG">
<s0>Ultrafast optics</s0>
<s5>04</s5>
</fC03>
<fC03 i1="03" i2="3" l="FRE">
<s0>Traitement par laser</s0>
<s5>05</s5>
</fC03>
<fC03 i1="03" i2="3" l="ENG">
<s0>Laser assisted processing</s0>
<s5>05</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE">
<s0>Modulateur optique spatial</s0>
<s5>11</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG">
<s0>Spatial light modulators</s0>
<s5>11</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE">
<s0>Application laser</s0>
<s5>17</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG">
<s0>Laser beam applications</s0>
<s5>17</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE">
<s0>Optique non linéaire</s0>
<s5>19</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG">
<s0>Nonlinear optics</s0>
<s5>19</s5>
</fC03>
<fC03 i1="07" i2="3" l="FRE">
<s0>Positionnement</s0>
<s5>30</s5>
</fC03>
<fC03 i1="07" i2="3" l="ENG">
<s0>Positioning</s0>
<s5>30</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE">
<s0>Faisceau Bessel</s0>
<s5>37</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG">
<s0>Bessel beam</s0>
<s5>37</s5>
</fC03>
<fC03 i1="09" i2="X" l="FRE">
<s0>Faisceau gaussien</s0>
<s5>38</s5>
</fC03>
<fC03 i1="09" i2="X" l="ENG">
<s0>Gaussian beam</s0>
<s5>38</s5>
</fC03>
<fC03 i1="09" i2="X" l="SPA">
<s0>Haz gaussiano</s0>
<s5>38</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE">
<s0>Eau</s0>
<s5>57</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG">
<s0>Water</s0>
<s5>57</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE">
<s0>Verre</s0>
<s5>61</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG">
<s0>Glass</s0>
<s5>61</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE">
<s0>Matériau diélectrique</s0>
<s5>62</s5>
</fC03>
<fC03 i1="12" i2="3" l="ENG">
<s0>Dielectric materials</s0>
<s5>62</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE">
<s0>Microfluidique</s0>
<s5>63</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG">
<s0>Microfluidics</s0>
<s5>63</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE">
<s0>DNA</s0>
<s5>64</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG">
<s0>DNA</s0>
<s5>64</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE">
<s0>0130C</s0>
<s4>INC</s4>
<s5>83</s5>
</fC03>
<fC03 i1="16" i2="3" l="FRE">
<s0>4265</s0>
<s4>INC</s4>
<s5>84</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE">
<s0>4279H</s0>
<s4>INC</s4>
<s5>85</s5>
</fC03>
<fC03 i1="18" i2="3" l="FRE">
<s0>4265R</s0>
<s4>INC</s4>
<s5>91</s5>
</fC03>
<fC03 i1="19" i2="3" l="FRE">
<s0>4785N</s0>
<s4>INC</s4>
<s5>92</s5>
</fC03>
<fC03 i1="20" i2="3" l="FRE">
<s0>8783</s0>
<s4>INC</s4>
<s5>93</s5>
</fC03>
<fC03 i1="21" i2="3" l="FRE">
<s0>4262C</s0>
<s4>INC</s4>
<s5>94</s5>
</fC03>
<fC03 i1="22" i2="3" l="FRE">
<s0>Laboratoire sur puce</s0>
<s4>CD</s4>
<s5>96</s5>
</fC03>
<fC03 i1="22" i2="3" l="ENG">
<s0>Lab-on-a-chip</s0>
<s4>CD</s4>
<s5>96</s5>
</fC03>
<fN21>
<s1>003</s1>
</fN21>
<fN44 i1="01">
<s1>OTO</s1>
</fN44>
<fN82>
<s1>OTO</s1>
</fN82>
</pA>
<pR>
<fA30 i1="01" i2="1" l="ENG">
<s1>Nonlinear optics and applications</s1>
<s2>04</s2>
<s3>Brussels BEL</s3>
<s4>2010</s4>
</fA30>
</pR>
</standard>
<server>
<NO>PASCAL 11-0013881 INIST</NO>
<ET>Ultrafast Bessel beams for high aspect ratio taper free micromachining of glass</ET>
<AU>BHUYAN (M. K.); COURVOISIER (F.); LACOURT (P.-A.); JACQUOT (M.); FURFARO (L.); WITHFORD (M. J.); DUDLEY (J. M.); EGGLETON (Benjamin J.); GAETA (Alexander Luis); BRODERICK (Neil G. R.)</AU>
<AF>FEMTO-ST Institute, Department of Optics P.M. Duffieux, UMR CNRS 6174, Université de Franche-Comté/25030 Besançon/France (1 aut., 2 aut., 3 aut., 4 aut., 5 aut., 7 aut.); CUDOS and MQ Photonics, Department of Physics, Macquarie University/New South Wales, 2109/Australie (6 aut.)</AF>
<DT>Publication en série; Congrès; Niveau analytique</DT>
<SO>Proceedings of SPIE, the International Society for Optical Engineering; ISSN 0277-786X; Coden PSISDG; Etats-Unis; Da. 2010; Vol. 7728; 77281V.1-77281V.8; Bibl. 23 ref.</SO>
<LA>Anglais</LA>
<EA>Although ultrafast lasers have demonstrated much success in structuring and ablating dielectrics on the micrometer scale and below, high aspect ratio structuring remains a challenge. Specifically, microfluidics or lab-on-chip DNA sequencing systems require high aspect ratio sub-10 μm wide channels with no taper. Micro-dicing also requires machining with vertical walls. Backside water assisted ultrafast laser processing with Gaussian beams allows the production of high aspect ratio microchannels but requires sub-micron sample positioning and precise control of translation velocity. In this context, we propose a new approach based on Bessel beams that exhibit a focal range exceeding the Rayleigh range by over one order of magnitude. An SLM-based setup allows us to produce a Bessel beam with central core diameter of 1.5 μm FWHM extending over a longitudinal range of 150 μm. A working window in the parameter space has been identified that allows the reliable production of high aspect ratio taper-free microchannels without sample translation. We report a systematic investigation of the damage morphology dependence on focusing geometry and energy per pulse.</EA>
<CC>001B00A30C; 001B40B65R; 001B40G85D; 002A31C09C; 215</CC>
<FD>Microusinage; Optique ultrarapide; Traitement par laser; Modulateur optique spatial; Application laser; Optique non linéaire; Positionnement; Faisceau Bessel; Faisceau gaussien; Eau; Verre; Matériau diélectrique; Microfluidique; DNA; 0130C; 4265; 4279H; 4265R; 4785N; 8783; 4262C; Laboratoire sur puce</FD>
<ED>Micromachining; Ultrafast optics; Laser assisted processing; Spatial light modulators; Laser beam applications; Nonlinear optics; Positioning; Bessel beam; Gaussian beam; Water; Glass; Dielectric materials; Microfluidics; DNA; Lab-on-a-chip</ED>
<SD>Haz gaussiano</SD>
<LO>INIST-21760.354000174705440400</LO>
<ID>11-0013881</ID>
</server>
</inist>
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