Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using an ion-beam sputtering system with a customized planetary rotation stage
Identifieur interne : 006584 ( Main/Exploration ); précédent : 006583; suivant : 006585Ultra-low-reflectance, high-uniformity, multilayer-antireflection coatings on large substrates deposited using an ion-beam sputtering system with a customized planetary rotation stage
Auteurs : Svetlana Dligatch [Australie] ; Mark Gross [Australie] ; Anatoli Chtanov [Australie]Source :
- Proceedings of SPIE, the International Society for Optical Engineering [ 0277-786X ] ; 2011.
Descripteurs français
- Pascal (Inist)
English descriptors
- KwdEn :
Abstract
A customized planetary rotation stage has been fitted to a commercial ion beam sputter coater to enable the deposition of high uniformity, multilayer optical coatings on large substrates without the use of masks. Uniformity in this system achieved by sequentially depositing each layer in two fixed locations in the sputtered particle plume where the geometry of the natural thickness distributions on a rotating substrate in these locations are of complementary shape and add to produce an overall uniform layer. The modified planetary stage allows substrate rotation about its own axis at any fixed position of the substrate centre about the axis of the planetary system. The suitable locations in the plume of each material that allow maximum uniformity are found by trial and error refinement of locations obtained by modelling of the plume distribution and expected thickness distributions. Ellipsometric monitoring of the thickness of the layer in each fixed position is used to determine the precise ratio of thicknesses in each location needed to obtain the correct total layer thickness simultaneously with high uniformity. The system has thus far enabled single wavelength antireflection coatings of less than 0.001% reflectance to be fabricated over 270 mm diameter substrates. This requires the film thickness uniformity on all layers to be less than ± 0.2%. In addition, 4-layer, dual wavelength antireflection coatings have been fabricated with less than 0.01% reflectance on both wavelengths over similar substrate dimensions.
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SPIE Int. Soc. Opt. Eng.</title><idno type="ISSN">0277-786X</idno><imprint><date when="2011">2011</date></imprint></series></biblStruct></sourceDesc><seriesStmt><title level="j" type="main">Proceedings of SPIE, the International Society for Optical Engineering</title><title level="j" type="abbreviated">Proc. SPIE Int. Soc. Opt. Eng.</title><idno type="ISSN">0277-786X</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Antireflection coatings</term><term>Ion beam sputtering</term><term>Layer thickness</term><term>Multilayers</term><term>Optical coatings</term><term>Reflectivity</term><term>Thin films</term></keywords><keywords scheme="Pascal" xml:lang="fr"><term>Pulvérisation faisceau ionique</term><term>Revêtement antiréfléchissant</term><term>Facteur réflexion</term><term>Epaisseur couche</term><term>Multicouche</term><term>Revêtement optique</term><term>Couche mince</term><term>0130C</term><term>4279W</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">A customized planetary rotation stage has been fitted to a commercial ion beam sputter coater to enable the deposition of high uniformity, multilayer optical coatings on large substrates without the use of masks. Uniformity in this system achieved by sequentially depositing each layer in two fixed locations in the sputtered particle plume where the geometry of the natural thickness distributions on a rotating substrate in these locations are of complementary shape and add to produce an overall uniform layer. The modified planetary stage allows substrate rotation about its own axis at any fixed position of the substrate centre about the axis of the planetary system. The suitable locations in the plume of each material that allow maximum uniformity are found by trial and error refinement of locations obtained by modelling of the plume distribution and expected thickness distributions. Ellipsometric monitoring of the thickness of the layer in each fixed position is used to determine the precise ratio of thicknesses in each location needed to obtain the correct total layer thickness simultaneously with high uniformity. The system has thus far enabled single wavelength antireflection coatings of less than 0.001% reflectance to be fabricated over 270 mm diameter substrates. This requires the film thickness uniformity on all layers to be less than ± 0.2%. In addition, 4-layer, dual wavelength antireflection coatings have been fabricated with less than 0.01% reflectance on both wavelengths over similar substrate dimensions.</div></front></TEI><affiliations><list><country><li>Australie</li></country></list><tree><country name="Australie"><noRegion><name sortKey="Dligatch, Svetlana" sort="Dligatch, Svetlana" uniqKey="Dligatch S" first="Svetlana" last="Dligatch">Svetlana Dligatch</name></noRegion><name sortKey="Chtanov, Anatoli" sort="Chtanov, Anatoli" uniqKey="Chtanov A" first="Anatoli" last="Chtanov">Anatoli Chtanov</name><name sortKey="Gross, Mark" sort="Gross, Mark" uniqKey="Gross M" first="Mark" last="Gross">Mark Gross</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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