High power shortwave infrared fibre lasers that use silica host material
Identifieur interne : 008C95 ( Main/Curation ); précédent : 008C94; suivant : 008C96High power shortwave infrared fibre lasers that use silica host material
Auteurs : Stuart D. Jackson [Australie]Source :
- Proceedings of SPIE - The International Society for Optical Engineering [ 0277-786X ] ; 2008.
Descripteurs français
- Pascal (Inist)
English descriptors
- KwdEn :
Abstract
I review our recent work in the area of high power 2 μm silica fibre laser development particularly in the area of highly efficient Tm3+-doped silica and Ho3+-doped silica fibre lasers that are excited with diode lasers operating at 1150 nm.
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Pascal:08-0528104Le document en format XML
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<author><name sortKey="Jackson, Stuart D" sort="Jackson, Stuart D" uniqKey="Jackson S" first="Stuart D." last="Jackson">Stuart D. Jackson</name>
<affiliation wicri:level="4"><inist:fA14 i1="01"><s1>Optical Fibre Technology Centre, University of Sydney, 206 National Innovation Centre, Australian Technology Park</s1>
<s2>1430 Eveleigh, Sydney</s2>
<s3>AUS</s3>
<sZ>1 aut.</sZ>
</inist:fA14>
<country>Australie</country>
<placeName><settlement type="city">Sydney</settlement>
<region type="état">Nouvelle-Galles du Sud</region>
<settlement type="city">Sydney</settlement>
</placeName>
<orgName type="university">Université de Sydney</orgName>
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<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">High power shortwave infrared fibre lasers that use silica host material</title>
<author><name sortKey="Jackson, Stuart D" sort="Jackson, Stuart D" uniqKey="Jackson S" first="Stuart D." last="Jackson">Stuart D. Jackson</name>
<affiliation wicri:level="4"><inist:fA14 i1="01"><s1>Optical Fibre Technology Centre, University of Sydney, 206 National Innovation Centre, Australian Technology Park</s1>
<s2>1430 Eveleigh, Sydney</s2>
<s3>AUS</s3>
<sZ>1 aut.</sZ>
</inist:fA14>
<country>Australie</country>
<placeName><settlement type="city">Sydney</settlement>
<region type="état">Nouvelle-Galles du Sud</region>
<settlement type="city">Sydney</settlement>
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<orgName type="university">Université de Sydney</orgName>
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<series><title level="j" type="main">Proceedings of SPIE - The International Society for Optical Engineering</title>
<idno type="ISSN">0277-786X</idno>
<imprint><date when="2008">2008</date>
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<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Doped materials</term>
<term>Fiber lasers</term>
<term>Holmium additions</term>
<term>Infrared laser</term>
<term>Laser diodes</term>
<term>Optical fibers</term>
<term>Semiconductor lasers</term>
<term>Silica</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Laser semiconducteur</term>
<term>Laser IR</term>
<term>Laser fibre</term>
<term>Diode laser</term>
<term>Fibre optique</term>
<term>Matériau dopé</term>
<term>Silice</term>
<term>Addition holmium</term>
<term>4255W</term>
<term>4255P</term>
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<front><div type="abstract" xml:lang="en">I review our recent work in the area of high power 2 μm silica fibre laser development particularly in the area of highly efficient Tm<sup>3+</sup>
-doped silica and Ho<sup>3+</sup>
-doped silica fibre lasers that are excited with diode lasers operating at 1150 nm.</div>
</front>
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