Serveur d'exploration sur les relations entre la France et l'Australie - Checkpoint (Istex)

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List of bibliographic references

Number of relevant bibliographic references: 12.
Ident.Authors (with country if any)Title
000F40 (2009) L. Couëdel [Allemagne, France] ; A. Mezeghrane [France] ; A. A. Samarian [Australie] ; M. Mikikian [France] ; Y. Tessier [France] ; M. Cavarroc [France] ; L. Boufendi [France]Complex Plasma Afterglow
001219 (2008) A. Caillard [Australie, France] ; C. Charles [Australie] ; R. Boswell [Australie] ; A. Meige [Australie] ; P. Brault [France]Deposition of platinum catalyst by plasma sputtering for fuel cells: 3D simulation and experiments
001374 (2007) Petr Janda ; Jan Valenta [République tchèque] ; Jean-Luc Rehspringer [France] ; Rodrigue R. Mafouana [France] ; Jan Linnros [Suède] ; Robert G. Elliman [Australie]Modified spontaneous emission of silicon nanocrystals embedded in artificial opals
001F23 (2000) J. Lépinoux [France] ; Y. Estrin [Australie]Mechanical behaviour of alloys containing heterogeneously distributed particles: modelling with Delaunay triangulation
002012 (2000) Kinetic model for a low-pressure discharge with negativeions
002036 (2000) J. F. Brilhac [France] ; F. Bensouda [France] ; P. Gilot [France] ; A. Brillard [France] ; B. Stanmore [Australie]Experimental and theoretical study of oxygen diffusion within packed beds of carbon black
002043 (2000) Electrical characterization of a dc secondary discharge created during plasma sputtering deposition of palladium thin films
002114 (1999) Y. Estrin [Australie] ; S. Arndt [Australie] ; M. Heilmaier [Australie] ; Y. Bréchet [France]Deformation behaviour of particle-strengthened alloys: a Voronoi mesh approach
002188 (1999) Electrostatic probe measurement of the negative ion fraction in an SF helicon discharge
002358 (1998) Enhanced deposition rates in plasma sputter deposition
002604 (1996) H. Braasch [Australie] ; Y. Estrin [Australie] ; Y. Bréchet [France]A stochastic model for dislocation density evolution
002613 (1996) L. Ter Minassian-Sarag [France] ; B. Vincent [Royaume-Uni] ; M. Adler [France] ; A. Barraud [France] ; N. V. Churaev [Russie] ; D. F. Eaton [États-Unis] ; H. Kuhn [Suisse] ; M. Misono [Japon] ; D. Platikanov [Bulgarie] ; J. Ralston [Australie] ; A. Silberberg [Israël] ; J. N. Zemel [États-Unis]Thin films including layers: Terminology in relation to their preparation and characterization IUPAC Recommendations 1994

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