NickelMaghrebV1, PascalFrancis, Corpus, bibRecord, 000033

Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method

Identifieur interne : 000033 ( PascalFrancis/Corpus ); précédent : 000032; suivant : 000034

Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method

Auteurs : I. Sta ; M. Jlassi ; M. Hajji ; H. Ezzaouia

Source :

Thin solid films [ 0040-6090 ] ; 2014.

RBID : Pascal:14-0090015

Descripteurs français

Pascal (Inist)
- Propriété optique, Propriété électrique, Dopage, Couche mince, Procédé sol gel, Dépôt centrifugation, Oxyde de lithium, Nickel, Acétate, Chlorure, Morphologie surface, Structure cristalline, Microscopie force atomique, Diffraction RX, Addition nickel, Matériau transparent, Polycristal, Orientation préférentielle, Facteur transmission, Mesure électrique, NiO, Substrat verre, 7866, 7350, 8115L, 6855J.

English descriptors

KwdEn :
- Acetates, Atomic force microscopy, Chlorides, Crystal structure, Doping, Electrical measurement, Electrical properties, Lithium oxide, Nickel, Nickel additions, Optical properties, Polycrystals, Preferred orientation, Sol-gel process, Spin-on coating, Surface morphology, Thin films, Transmittance, Transparent material, XRD.

Abstract

Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.

Notice en format standard (ISO 2709)

Pour connaître la documentation sur le format Inist Standard.

A01	`01`	`1`		`@0 0040-6090`
A02	`01`			`@0 THSFAP`
A03		`1`		`@0 Thin solid films`
A05				`@2 555`
A08	`01`	`1`	`ENG`	`@1 Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method`
A09	`01`	`1`	`ENG`	`@1 International Symposia on Transparent Conductive Materials, October 2012`
A11	`01`	`1`		`@1 STA (I.)`
A11	`02`	`1`		`@1 JLASSI (M.)`
A11	`03`	`1`		`@1 HAJJI (M.)`
A11	`04`	`1`		`@1 EZZAOUIA (H.)`
A12	`01`	`1`		`@1 KIRIAKIDIS (George) @9 ed.`
A14	`01`			`@1 Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95 @2 2050 Hammam-Lif @3 TUN @Z 1 aut. @Z 2 aut. @Z 3 aut. @Z 4 aut.`
A14	`02`			`@1 Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163 @2 3021 Sfax @3 TUN @Z 3 aut.`
A15	`01`			`@1 Physics Dpt. Univ. of Crete, Voutes @2 Heraklion, Crete 70013 @3 GRC @Z 1 aut.`
A20				`@1 131-137`
A21				`@1 2014`
A23	`01`			`@0 ENG`
A43	`01`			`@1 INIST @2 13597 @5 354000505786660250`
A44				`@0 0000 @1 © 2014 INIST-CNRS. All rights reserved.`
A45				`@0 24 ref.`
A47	`01`	`1`		`@0 14-0090015`
A60				`@1 P @2 C`
A61				`@0 A`
A64	`01`	`1`		`@0 Thin solid films`
A66	`01`			`@0 NLD`
C01	`01`		`ENG`	@0 Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.
C02	`01`	`3`		`@0 001B70H66`
C02	`02`	`3`		`@0 001B70C50`
C02	`03`	`3`		`@0 001B80A15L`
C02	`04`	`3`		`@0 001B60H55J`
C03	`01`	`3`	`FRE`	`@0 Propriété optique @5 01`
C03	`01`	`3`	`ENG`	`@0 Optical properties @5 01`
C03	`02`	`3`	`FRE`	`@0 Propriété électrique @5 02`
C03	`02`	`3`	`ENG`	`@0 Electrical properties @5 02`
C03	`03`	`X`	`FRE`	`@0 Dopage @5 03`
C03	`03`	`X`	`ENG`	`@0 Doping @5 03`
C03	`03`	`X`	`SPA`	`@0 Doping @5 03`
C03	`04`	`3`	`FRE`	`@0 Couche mince @5 04`
C03	`04`	`3`	`ENG`	`@0 Thin films @5 04`
C03	`05`	`3`	`FRE`	`@0 Procédé sol gel @5 05`
C03	`05`	`3`	`ENG`	`@0 Sol-gel process @5 05`
C03	`06`	`3`	`FRE`	`@0 Dépôt centrifugation @5 06`
C03	`06`	`3`	`ENG`	`@0 Spin-on coating @5 06`
C03	`07`	`X`	`FRE`	`@0 Oxyde de lithium @5 07`
C03	`07`	`X`	`ENG`	`@0 Lithium oxide @5 07`
C03	`07`	`X`	`SPA`	`@0 Litio óxido @5 07`
C03	`08`	`3`	`FRE`	`@0 Nickel @2 NC @5 08`
C03	`08`	`3`	`ENG`	`@0 Nickel @2 NC @5 08`
C03	`09`	`3`	`FRE`	`@0 Acétate @2 NK @5 09`
C03	`09`	`3`	`ENG`	`@0 Acetates @2 NK @5 09`
C03	`10`	`3`	`FRE`	`@0 Chlorure @2 NA @5 10`
C03	`10`	`3`	`ENG`	`@0 Chlorides @2 NA @5 10`
C03	`11`	`3`	`FRE`	`@0 Morphologie surface @5 11`
C03	`11`	`3`	`ENG`	`@0 Surface morphology @5 11`
C03	`12`	`3`	`FRE`	`@0 Structure cristalline @5 12`
C03	`12`	`3`	`ENG`	`@0 Crystal structure @5 12`
C03	`13`	`3`	`FRE`	`@0 Microscopie force atomique @5 13`
C03	`13`	`3`	`ENG`	`@0 Atomic force microscopy @5 13`
C03	`14`	`3`	`FRE`	`@0 Diffraction RX @5 14`
C03	`14`	`3`	`ENG`	`@0 XRD @5 14`
C03	`15`	`3`	`FRE`	`@0 Addition nickel @5 15`
C03	`15`	`3`	`ENG`	`@0 Nickel additions @5 15`
C03	`16`	`X`	`FRE`	`@0 Matériau transparent @5 16`
C03	`16`	`X`	`ENG`	`@0 Transparent material @5 16`
C03	`16`	`X`	`SPA`	`@0 Material transparente @5 16`
C03	`17`	`3`	`FRE`	`@0 Polycristal @5 17`
C03	`17`	`3`	`ENG`	`@0 Polycrystals @5 17`
C03	`18`	`X`	`FRE`	`@0 Orientation préférentielle @5 29`
C03	`18`	`X`	`ENG`	`@0 Preferred orientation @5 29`
C03	`18`	`X`	`SPA`	`@0 Orientación preferencial @5 29`
C03	`19`	`X`	`FRE`	`@0 Facteur transmission @5 30`
C03	`19`	`X`	`ENG`	`@0 Transmittance @5 30`
C03	`19`	`X`	`SPA`	`@0 Factor transmisión @5 30`
C03	`20`	`X`	`FRE`	`@0 Mesure électrique @5 31`
C03	`20`	`X`	`ENG`	`@0 Electrical measurement @5 31`
C03	`20`	`X`	`SPA`	`@0 Medida eléctrica @5 31`
C03	`21`	`3`	`FRE`	`@0 NiO @4 INC @5 46`
C03	`22`	`3`	`FRE`	`@0 Substrat verre @4 INC @5 47`
C03	`23`	`3`	`FRE`	`@0 7866 @4 INC @5 71`
C03	`24`	`3`	`FRE`	`@0 7350 @4 INC @5 72`
C03	`25`	`3`	`FRE`	`@0 8115L @4 INC @5 73`
C03	`26`	`3`	`FRE`	`@0 6855J @4 INC @5 74`
N21				`@1 118`
N44	`01`			`@1 OTO`
N82				`@1 OTO`

A30	`01`	`1`	`ENG`	`@1 TCM2012 International Symposia on Transparent Conductive Materials @3 Hersonissos, Crete GRC @4 2012-10-25`

Format Inist (serveur)

NO :	PASCAL 14-0090015 INIST
ET :	Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method
AU :	STA (I.); JLASSI (M.); HAJJI (M.); EZZAOUIA (H.); KIRIAKIDIS (George)
AF :	Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95/2050 Hammam-Lif/Tunisie (1 aut., 2 aut., 3 aut., 4 aut.); Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163/3021 Sfax/Tunisie (3 aut.); Physics Dpt. Univ. of Crete, Voutes/Heraklion, Crete 70013/Grèce (1 aut.)
DT :	Publication en série; Congrès; Niveau analytique
SO :	Thin solid films; ISSN 0040-6090; Coden THSFAP; Pays-Bas; Da. 2014; Vol. 555; Pp. 131-137; Bibl. 24 ref.
LA :	Anglais
EA :	Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.
CC :	001B70H66; 001B70C50; 001B80A15L; 001B60H55J
FD :	Propriété optique; Propriété électrique; Dopage; Couche mince; Procédé sol gel; Dépôt centrifugation; Oxyde de lithium; Nickel; Acétate; Chlorure; Morphologie surface; Structure cristalline; Microscopie force atomique; Diffraction RX; Addition nickel; Matériau transparent; Polycristal; Orientation préférentielle; Facteur transmission; Mesure électrique; NiO; Substrat verre; 7866; 7350; 8115L; 6855J
ED :	Optical properties; Electrical properties; Doping; Thin films; Sol-gel process; Spin-on coating; Lithium oxide; Nickel; Acetates; Chlorides; Surface morphology; Crystal structure; Atomic force microscopy; XRD; Nickel additions; Transparent material; Polycrystals; Preferred orientation; Transmittance; Electrical measurement
SD :	Doping; Litio óxido; Material transparente; Orientación preferencial; Factor transmisión; Medida eléctrica
LO :	INIST-13597.354000505786660250
ID :	14-0090015

Links to Exploration step

Pascal:14-0090015

Le document en format XML

<record><TEI><teiHeader><fileDesc><titleStmt><title xml:lang="en" level="a">Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method</title>
<author><name sortKey="Sta, I" sort="Sta, I" uniqKey="Sta I" first="I." last="Sta">I. Sta</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Jlassi, M" sort="Jlassi, M" uniqKey="Jlassi M" first="M." last="Jlassi">M. Jlassi</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Hajji, M" sort="Hajji, M" uniqKey="Hajji M" first="M." last="Hajji">M. Hajji</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
<affiliation><inist:fA14 i1="02"><s1>Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163</s1>
<s2>3021 Sfax</s2>
<s3>TUN</s3>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Ezzaouia, H" sort="Ezzaouia, H" uniqKey="Ezzaouia H" first="H." last="Ezzaouia">H. Ezzaouia</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</titleStmt>
<publicationStmt><idno type="wicri:source">INIST</idno>
<idno type="inist">14-0090015</idno>
<date when="2014">2014</date>
<idno type="stanalyst">PASCAL 14-0090015 INIST</idno>
<idno type="RBID">Pascal:14-0090015</idno>
<idno type="wicri:Area/PascalFrancis/Corpus">000033</idno>
</publicationStmt>
<sourceDesc><biblStruct><analytic><title xml:lang="en" level="a">Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method</title>
<author><name sortKey="Sta, I" sort="Sta, I" uniqKey="Sta I" first="I." last="Sta">I. Sta</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Jlassi, M" sort="Jlassi, M" uniqKey="Jlassi M" first="M." last="Jlassi">M. Jlassi</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Hajji, M" sort="Hajji, M" uniqKey="Hajji M" first="M." last="Hajji">M. Hajji</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
<affiliation><inist:fA14 i1="02"><s1>Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163</s1>
<s2>3021 Sfax</s2>
<s3>TUN</s3>
<sZ>3 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
<author><name sortKey="Ezzaouia, H" sort="Ezzaouia, H" uniqKey="Ezzaouia H" first="H." last="Ezzaouia">H. Ezzaouia</name>
<affiliation><inist:fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</inist:fA14>
</affiliation>
</author>
</analytic>
<series><title level="j" type="main">Thin solid films</title>
<title level="j" type="abbreviated">Thin solid films</title>
<idno type="ISSN">0040-6090</idno>
<imprint><date when="2014">2014</date>
</imprint>
</series>
</biblStruct>
</sourceDesc>
<seriesStmt><title level="j" type="main">Thin solid films</title>
<title level="j" type="abbreviated">Thin solid films</title>
<idno type="ISSN">0040-6090</idno>
</seriesStmt>
</fileDesc>
<profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acetates</term>
<term>Atomic force microscopy</term>
<term>Chlorides</term>
<term>Crystal structure</term>
<term>Doping</term>
<term>Electrical measurement</term>
<term>Electrical properties</term>
<term>Lithium oxide</term>
<term>Nickel</term>
<term>Nickel additions</term>
<term>Optical properties</term>
<term>Polycrystals</term>
<term>Preferred orientation</term>
<term>Sol-gel process</term>
<term>Spin-on coating</term>
<term>Surface morphology</term>
<term>Thin films</term>
<term>Transmittance</term>
<term>Transparent material</term>
<term>XRD</term>
</keywords>
<keywords scheme="Pascal" xml:lang="fr"><term>Propriété optique</term>
<term>Propriété électrique</term>
<term>Dopage</term>
<term>Couche mince</term>
<term>Procédé sol gel</term>
<term>Dépôt centrifugation</term>
<term>Oxyde de lithium</term>
<term>Nickel</term>
<term>Acétate</term>
<term>Chlorure</term>
<term>Morphologie surface</term>
<term>Structure cristalline</term>
<term>Microscopie force atomique</term>
<term>Diffraction RX</term>
<term>Addition nickel</term>
<term>Matériau transparent</term>
<term>Polycristal</term>
<term>Orientation préférentielle</term>
<term>Facteur transmission</term>
<term>Mesure électrique</term>
<term>NiO</term>
<term>Substrat verre</term>
<term>7866</term>
<term>7350</term>
<term>8115L</term>
<term>6855J</term>
</keywords>
</textClass>
</profileDesc>
</teiHeader>
<front><div type="abstract" xml:lang="en">Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.</div>
</front>
</TEI>
<inist><standard h6="B"><pA><fA01 i1="01" i2="1"><s0>0040-6090</s0>
</fA01>
<fA02 i1="01"><s0>THSFAP</s0>
</fA02>
<fA03 i2="1"><s0>Thin solid films</s0>
</fA03>
<fA05><s2>555</s2>
</fA05>
<fA08 i1="01" i2="1" l="ENG"><s1>Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method</s1>
</fA08>
<fA09 i1="01" i2="1" l="ENG"><s1>International Symposia on Transparent Conductive Materials, October 2012</s1>
</fA09>
<fA11 i1="01" i2="1"><s1>STA (I.)</s1>
</fA11>
<fA11 i1="02" i2="1"><s1>JLASSI (M.)</s1>
</fA11>
<fA11 i1="03" i2="1"><s1>HAJJI (M.)</s1>
</fA11>
<fA11 i1="04" i2="1"><s1>EZZAOUIA (H.)</s1>
</fA11>
<fA12 i1="01" i2="1"><s1>KIRIAKIDIS (George)</s1>
<s9>ed.</s9>
</fA12>
<fA14 i1="01"><s1>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95</s1>
<s2>2050 Hammam-Lif</s2>
<s3>TUN</s3>
<sZ>1 aut.</sZ>
<sZ>2 aut.</sZ>
<sZ>3 aut.</sZ>
<sZ>4 aut.</sZ>
</fA14>
<fA14 i1="02"><s1>Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163</s1>
<s2>3021 Sfax</s2>
<s3>TUN</s3>
<sZ>3 aut.</sZ>
</fA14>
<fA15 i1="01"><s1>Physics Dpt. Univ. of Crete, Voutes</s1>
<s2>Heraklion, Crete 70013</s2>
<s3>GRC</s3>
<sZ>1 aut.</sZ>
</fA15>
<fA20><s1>131-137</s1>
</fA20>
<fA21><s1>2014</s1>
</fA21>
<fA23 i1="01"><s0>ENG</s0>
</fA23>
<fA43 i1="01"><s1>INIST</s1>
<s2>13597</s2>
<s5>354000505786660250</s5>
</fA43>
<fA44><s0>0000</s0>
<s1>© 2014 INIST-CNRS. All rights reserved.</s1>
</fA44>
<fA45><s0>24 ref.</s0>
</fA45>
<fA47 i1="01" i2="1"><s0>14-0090015</s0>
</fA47>
<fA60><s1>P</s1>
<s2>C</s2>
</fA60>
<fA61><s0>A</s0>
</fA61>
<fA64 i1="01" i2="1"><s0>Thin solid films</s0>
</fA64>
<fA66 i1="01"><s0>NLD</s0>
</fA66>
<fC01 i1="01" l="ENG"><s0>Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.</s0>
</fC01>
<fC02 i1="01" i2="3"><s0>001B70H66</s0>
</fC02>
<fC02 i1="02" i2="3"><s0>001B70C50</s0>
</fC02>
<fC02 i1="03" i2="3"><s0>001B80A15L</s0>
</fC02>
<fC02 i1="04" i2="3"><s0>001B60H55J</s0>
</fC02>
<fC03 i1="01" i2="3" l="FRE"><s0>Propriété optique</s0>
<s5>01</s5>
</fC03>
<fC03 i1="01" i2="3" l="ENG"><s0>Optical properties</s0>
<s5>01</s5>
</fC03>
<fC03 i1="02" i2="3" l="FRE"><s0>Propriété électrique</s0>
<s5>02</s5>
</fC03>
<fC03 i1="02" i2="3" l="ENG"><s0>Electrical properties</s0>
<s5>02</s5>
</fC03>
<fC03 i1="03" i2="X" l="FRE"><s0>Dopage</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="ENG"><s0>Doping</s0>
<s5>03</s5>
</fC03>
<fC03 i1="03" i2="X" l="SPA"><s0>Doping</s0>
<s5>03</s5>
</fC03>
<fC03 i1="04" i2="3" l="FRE"><s0>Couche mince</s0>
<s5>04</s5>
</fC03>
<fC03 i1="04" i2="3" l="ENG"><s0>Thin films</s0>
<s5>04</s5>
</fC03>
<fC03 i1="05" i2="3" l="FRE"><s0>Procédé sol gel</s0>
<s5>05</s5>
</fC03>
<fC03 i1="05" i2="3" l="ENG"><s0>Sol-gel process</s0>
<s5>05</s5>
</fC03>
<fC03 i1="06" i2="3" l="FRE"><s0>Dépôt centrifugation</s0>
<s5>06</s5>
</fC03>
<fC03 i1="06" i2="3" l="ENG"><s0>Spin-on coating</s0>
<s5>06</s5>
</fC03>
<fC03 i1="07" i2="X" l="FRE"><s0>Oxyde de lithium</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="ENG"><s0>Lithium oxide</s0>
<s5>07</s5>
</fC03>
<fC03 i1="07" i2="X" l="SPA"><s0>Litio óxido</s0>
<s5>07</s5>
</fC03>
<fC03 i1="08" i2="3" l="FRE"><s0>Nickel</s0>
<s2>NC</s2>
<s5>08</s5>
</fC03>
<fC03 i1="08" i2="3" l="ENG"><s0>Nickel</s0>
<s2>NC</s2>
<s5>08</s5>
</fC03>
<fC03 i1="09" i2="3" l="FRE"><s0>Acétate</s0>
<s2>NK</s2>
<s5>09</s5>
</fC03>
<fC03 i1="09" i2="3" l="ENG"><s0>Acetates</s0>
<s2>NK</s2>
<s5>09</s5>
</fC03>
<fC03 i1="10" i2="3" l="FRE"><s0>Chlorure</s0>
<s2>NA</s2>
<s5>10</s5>
</fC03>
<fC03 i1="10" i2="3" l="ENG"><s0>Chlorides</s0>
<s2>NA</s2>
<s5>10</s5>
</fC03>
<fC03 i1="11" i2="3" l="FRE"><s0>Morphologie surface</s0>
<s5>11</s5>
</fC03>
<fC03 i1="11" i2="3" l="ENG"><s0>Surface morphology</s0>
<s5>11</s5>
</fC03>
<fC03 i1="12" i2="3" l="FRE"><s0>Structure cristalline</s0>
<s5>12</s5>
</fC03>
<fC03 i1="12" i2="3" l="ENG"><s0>Crystal structure</s0>
<s5>12</s5>
</fC03>
<fC03 i1="13" i2="3" l="FRE"><s0>Microscopie force atomique</s0>
<s5>13</s5>
</fC03>
<fC03 i1="13" i2="3" l="ENG"><s0>Atomic force microscopy</s0>
<s5>13</s5>
</fC03>
<fC03 i1="14" i2="3" l="FRE"><s0>Diffraction RX</s0>
<s5>14</s5>
</fC03>
<fC03 i1="14" i2="3" l="ENG"><s0>XRD</s0>
<s5>14</s5>
</fC03>
<fC03 i1="15" i2="3" l="FRE"><s0>Addition nickel</s0>
<s5>15</s5>
</fC03>
<fC03 i1="15" i2="3" l="ENG"><s0>Nickel additions</s0>
<s5>15</s5>
</fC03>
<fC03 i1="16" i2="X" l="FRE"><s0>Matériau transparent</s0>
<s5>16</s5>
</fC03>
<fC03 i1="16" i2="X" l="ENG"><s0>Transparent material</s0>
<s5>16</s5>
</fC03>
<fC03 i1="16" i2="X" l="SPA"><s0>Material transparente</s0>
<s5>16</s5>
</fC03>
<fC03 i1="17" i2="3" l="FRE"><s0>Polycristal</s0>
<s5>17</s5>
</fC03>
<fC03 i1="17" i2="3" l="ENG"><s0>Polycrystals</s0>
<s5>17</s5>
</fC03>
<fC03 i1="18" i2="X" l="FRE"><s0>Orientation préférentielle</s0>
<s5>29</s5>
</fC03>
<fC03 i1="18" i2="X" l="ENG"><s0>Preferred orientation</s0>
<s5>29</s5>
</fC03>
<fC03 i1="18" i2="X" l="SPA"><s0>Orientación preferencial</s0>
<s5>29</s5>
</fC03>
<fC03 i1="19" i2="X" l="FRE"><s0>Facteur transmission</s0>
<s5>30</s5>
</fC03>
<fC03 i1="19" i2="X" l="ENG"><s0>Transmittance</s0>
<s5>30</s5>
</fC03>
<fC03 i1="19" i2="X" l="SPA"><s0>Factor transmisión</s0>
<s5>30</s5>
</fC03>
<fC03 i1="20" i2="X" l="FRE"><s0>Mesure électrique</s0>
<s5>31</s5>
</fC03>
<fC03 i1="20" i2="X" l="ENG"><s0>Electrical measurement</s0>
<s5>31</s5>
</fC03>
<fC03 i1="20" i2="X" l="SPA"><s0>Medida eléctrica</s0>
<s5>31</s5>
</fC03>
<fC03 i1="21" i2="3" l="FRE"><s0>NiO</s0>
<s4>INC</s4>
<s5>46</s5>
</fC03>
<fC03 i1="22" i2="3" l="FRE"><s0>Substrat verre</s0>
<s4>INC</s4>
<s5>47</s5>
</fC03>
<fC03 i1="23" i2="3" l="FRE"><s0>7866</s0>
<s4>INC</s4>
<s5>71</s5>
</fC03>
<fC03 i1="24" i2="3" l="FRE"><s0>7350</s0>
<s4>INC</s4>
<s5>72</s5>
</fC03>
<fC03 i1="25" i2="3" l="FRE"><s0>8115L</s0>
<s4>INC</s4>
<s5>73</s5>
</fC03>
<fC03 i1="26" i2="3" l="FRE"><s0>6855J</s0>
<s4>INC</s4>
<s5>74</s5>
</fC03>
<fN21><s1>118</s1>
</fN21>
<fN44 i1="01"><s1>OTO</s1>
</fN44>
<fN82><s1>OTO</s1>
</fN82>
</pA>
<pR><fA30 i1="01" i2="1" l="ENG"><s1>TCM2012 International Symposia on Transparent Conductive Materials</s1>
<s3>Hersonissos, Crete GRC</s3>
<s4>2012-10-25</s4>
</fA30>
</pR>
</standard>
<server><NO>PASCAL 14-0090015 INIST</NO>
<ET>Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method</ET>
<AU>STA (I.); JLASSI (M.); HAJJI (M.); EZZAOUIA (H.); KIRIAKIDIS (George)</AU>
<AF>Laboratoire de Photovoitaïque, Centre de Recherche et des Technologies de l'Energie, Technopole de Borj-Cédria, BP 95/2050 Hammam-Lif/Tunisie (1 aut., 2 aut., 3 aut., 4 aut.); Institut Supérieur d'Electronique et de Communication de Sfax, Université de Sfax, Route de Tunis Km 10, Cité El Ons, B.P. 1163/3021 Sfax/Tunisie (3 aut.); Physics Dpt. Univ. of Crete, Voutes/Heraklion, Crete 70013/Grèce (1 aut.)</AF>
<DT>Publication en série; Congrès; Niveau analytique</DT>
<SO>Thin solid films; ISSN 0040-6090; Coden THSFAP; Pays-Bas; Da. 2014; Vol. 555; Pp. 131-137; Bibl. 24 ref.</SO>
<LA>Anglais</LA>
<EA>Un-doped and lithium doped nickel oxide thin films have been prepared on glass substrates by the sol-gel spin coating technique using nickel acetate and lithium chloride as source materials. The thickness of the films was increased by increasing the number of layers successively deposited on the same substrate. The effect of the number of layers on the structural, optical and electrical properties of NiO thin films was studied. The results of investigations of the samples show that four is the most suitable number of layers of undoped NiO films with high optical transparency. Then, by using these optimized deposition parameters, lithium doped nickel oxide films are prepared. The surface morphology and crystalline structure of the thin films were investigated by atomic force microscopy and X-ray diffraction (XRD), respectively. A modification in the morphology of the films was observed while increasing the Li amount in the solution. XRD patterns show that the films are polycrystalline. The preferred orientations were evaluated from XRD data. The average transmittance of the NiO films in the visible region increases with the increase of Li concentration. The electrical measurements show that the resistance of the films decreases as the lithium content increases.</EA>
<CC>001B70H66; 001B70C50; 001B80A15L; 001B60H55J</CC>
<FD>Propriété optique; Propriété électrique; Dopage; Couche mince; Procédé sol gel; Dépôt centrifugation; Oxyde de lithium; Nickel; Acétate; Chlorure; Morphologie surface; Structure cristalline; Microscopie force atomique; Diffraction RX; Addition nickel; Matériau transparent; Polycristal; Orientation préférentielle; Facteur transmission; Mesure électrique; NiO; Substrat verre; 7866; 7350; 8115L; 6855J</FD>
<ED>Optical properties; Electrical properties; Doping; Thin films; Sol-gel process; Spin-on coating; Lithium oxide; Nickel; Acetates; Chlorides; Surface morphology; Crystal structure; Atomic force microscopy; XRD; Nickel additions; Transparent material; Polycrystals; Preferred orientation; Transmittance; Electrical measurement</ED>
<SD>Doping; Litio óxido; Material transparente; Orientación preferencial; Factor transmisión; Medida eléctrica</SD>
<LO>INIST-13597.354000505786660250</LO>
<ID>14-0090015</ID>
</server>
</inist>
</record>

Pour manipuler ce document sous Unix (Dilib)

EXPLOR_STEP=$WICRI_ROOT/Wicri/Terre/explor/NickelMaghrebV1/Data/PascalFrancis/Corpus

HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000033 | SxmlIndent | more

HfdSelect -h $EXPLOR_AREA/Data/PascalFrancis/Corpus/biblio.hfd -nk 000033 | SxmlIndent | more

Pour mettre un lien sur cette page dans le réseau Wicri

{{Explor lien
   |wiki=    Wicri/Terre
   |area=    NickelMaghrebV1
   |flux=    PascalFrancis
   |étape=   Corpus
   |type=    RBID
   |clé=     Pascal:14-0090015
   |texte=   Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method
}}

This area was generated with Dilib version V0.6.27.
Data generation: Fri Mar 24 23:14:20 2017. Site generation: Tue Mar 5 17:03:47 2024

	Serveur d'exploration sur le nickel au Maghreb
	Attention, ce site est en cours de développement ! Attention, site généré par des moyens informatiques à partir de corpus bruts. Les informations ne sont donc pas validées.

Serveur d'exploration sur le nickel au Maghreb

Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method

Structural, optical and electrical properties of undoped and Li-doped NiO thin films prepared by sol-gel spin coating method

Source :

Descripteurs français

English descriptors

Abstract

Notice en format standard (ISO 2709)

Format Inist (serveur)

Links to Exploration step

Le document en format XML

Pour manipuler ce document sous Unix (Dilib)

Pour mettre un lien sur cette page dans le réseau Wicri