Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam
Identifieur interne : 000539 ( Istex/Corpus ); précédent : 000538; suivant : 000540Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam
Auteurs : V. Lescuras ; J. C. André ; F. Lapicque ; I. ZouariSource :
- Journal of Applied Electrochemistry [ 0021-891X ] ; 1995-10-01.
Abstract
Abstract: This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.
Url:
DOI: 10.1007/BF00241587
Links to Exploration step
ISTEX:402488E29A69BB17CE3BE098ABF363B4740C5A96Le document en format XML
<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title><author><name sortKey="Lescuras, V" sort="Lescuras, V" uniqKey="Lescuras V" first="V." last="Lescuras">V. Lescuras</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="André">J. C. André</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Lapicque, F" sort="Lapicque, F" uniqKey="Lapicque F" first="F." last="Lapicque">F. Lapicque</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Zouari, I" sort="Zouari, I" uniqKey="Zouari I" first="I." last="Zouari">I. Zouari</name><affiliation><mods:affiliation>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique, Route de Medenine, 6029, Gabès, Tunisia</mods:affiliation></affiliation></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:402488E29A69BB17CE3BE098ABF363B4740C5A96</idno><date when="1995" year="1995">1995</date><idno type="doi">10.1007/BF00241587</idno><idno type="url">https://api.istex.fr/document/402488E29A69BB17CE3BE098ABF363B4740C5A96/fulltext/pdf</idno><idno type="wicri:Area/Istex/Corpus">000539</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">000539</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title><author><name sortKey="Lescuras, V" sort="Lescuras, V" uniqKey="Lescuras V" first="V." last="Lescuras">V. Lescuras</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Andre, J C" sort="Andre, J C" uniqKey="Andre J" first="J. C." last="André">J. C. André</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Lapicque, F" sort="Lapicque, F" uniqKey="Lapicque F" first="F." last="Lapicque">F. Lapicque</name><affiliation><mods:affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</mods:affiliation></affiliation></author><author><name sortKey="Zouari, I" sort="Zouari, I" uniqKey="Zouari I" first="I." last="Zouari">I. Zouari</name><affiliation><mods:affiliation>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique, Route de Medenine, 6029, Gabès, Tunisia</mods:affiliation></affiliation></author></analytic><monogr></monogr><series><title level="j">Journal of Applied Electrochemistry</title><title level="j" type="abbrev">J Appl Electrochem</title><idno type="ISSN">0021-891X</idno><idno type="eISSN">1572-8838</idno><imprint><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><date type="published" when="1995-10-01">1995-10-01</date><biblScope unit="volume">25</biblScope><biblScope unit="issue">10</biblScope><biblScope unit="page" from="933">933</biblScope><biblScope unit="page" to="939">939</biblScope></imprint><idno type="ISSN">0021-891X</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">0021-891X</idno></seriesStmt></fileDesc><profileDesc><textClass></textClass><langUsage><language ident="en">en</language></langUsage></profileDesc></teiHeader><front><div type="abstract" xml:lang="en">Abstract: This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.</div></front></TEI><istex><corpusName>springer</corpusName><keywords><teeft><json:string>etching</json:string><json:string>laser</json:string><json:string>nozzle diameter</json:string><json:string>laser assistance</json:string><json:string>electrochemical</json:string><json:string>current density</json:string><json:string>machined</json:string><json:string>laser beam</json:string><json:string>machining</json:string><json:string>step length</json:string><json:string>electrochemical etching</json:string><json:string>mechanical precision</json:string><json:string>nozzle</json:string><json:string>nickel plate</json:string><json:string>shape factor</json:string><json:string>etching efficiency</json:string><json:string>metal surface</json:string><json:string>etching rates</json:string><json:string>cell voltage</json:string><json:string>etching rate</json:string><json:string>incident beam</json:string><json:string>peripheral zone</json:string><json:string>zinc deposition</json:string><json:string>drilling operation</json:string><json:string>nickel sheet</json:string><json:string>ring zone</json:string><json:string>cylindrical holes</json:string><json:string>nozzle outlet</json:string><json:string>metal dissolution</json:string><json:string>etching operation</json:string><json:string>inlet chamber</json:string><json:string>nonpassivating medium</json:string><json:string>electrochemical processes</json:string><json:string>electrochemical drilling</json:string><json:string>impact zone</json:string><json:string>nickel drilling</json:string><json:string>hole drilling</json:string><json:string>altuglas nozzle</json:string><json:string>cylindrical geometry</json:string><json:string>plate thickness</json:string><json:string>electrical circuit</json:string><json:string>ohmic drop</json:string><json:string>theoretical etching rate</json:string><json:string>metal morphology</json:string><json:string>current densities</json:string><json:string>external zones</json:string><json:string>electrochemical machining</json:string><json:string>conical holes</json:string><json:string>sodium chloride medium</json:string><json:string>small nozzles</json:string><json:string>binocular viewer</json:string><json:string>dissolution</json:string></teeft></keywords><author><json:item><name>V. Lescuras</name><affiliations><json:string>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</json:string></affiliations></json:item><json:item><name>J. C. André</name><affiliations><json:string>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</json:string></affiliations></json:item><json:item><name>F. Lapicque</name><affiliations><json:string>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</json:string></affiliations></json:item><json:item><name>I. Zouari</name><affiliations><json:string>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique, Route de Medenine, 6029, Gabès, Tunisia</json:string></affiliations></json:item></author><articleId><json:string>BF00241587</json:string><json:string>Art4</json:string></articleId><language><json:string>eng</json:string></language><originalGenre><json:string>OriginalPaper</json:string></originalGenre><abstract>Abstract: This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.</abstract><qualityIndicators><score>4.285</score><pdfVersion>1.3</pdfVersion><pdfPageSize>598 x 843 pts</pdfPageSize><refBibsNative>false</refBibsNative><keywordCount>0</keywordCount><abstractCharCount>540</abstractCharCount><pdfWordCount>3265</pdfWordCount><pdfCharCount>18769</pdfCharCount><pdfPageCount>7</pdfPageCount><abstractWordCount>85</abstractWordCount></qualityIndicators><title>Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title><genre><json:string>research-article</json:string></genre><host><volume>25</volume><pages><last>939</last><first>933</first></pages><issn><json:string>0021-891X</json:string></issn><issue>10</issue><subject><json:item><value>Physical Chemistry</value></json:item><json:item><value>Industrial Chemistry/Chemical Engineering</value></json:item></subject><journalId><json:string>10800</json:string></journalId><genre><json:string>journal</json:string></genre><language><json:string>unknown</json:string></language><eissn><json:string>1572-8838</json:string></eissn><title>Journal of Applied Electrochemistry</title><publicationDate>1995</publicationDate><copyrightDate>1995</copyrightDate></host><categories><wos><json:string>science</json:string><json:string>electrochemistry</json:string></wos><scienceMetrix><json:string>applied sciences</json:string><json:string>enabling & strategic technologies</json:string><json:string>energy</json:string></scienceMetrix><inist><json:string>sciences appliquees, technologies et medecines</json:string><json:string>sciences exactes et technologie</json:string><json:string>terre, ocean, espace</json:string><json:string>geophysique externe</json:string></inist></categories><publicationDate>1995</publicationDate><copyrightDate>1995</copyrightDate><doi><json:string>10.1007/BF00241587</json:string></doi><id>402488E29A69BB17CE3BE098ABF363B4740C5A96</id><score>1</score><fulltext><json:item><extension>pdf</extension><original>true</original><mimetype>application/pdf</mimetype><uri>https://api.istex.fr/document/402488E29A69BB17CE3BE098ABF363B4740C5A96/fulltext/pdf</uri></json:item><json:item><extension>zip</extension><original>false</original><mimetype>application/zip</mimetype><uri>https://api.istex.fr/document/402488E29A69BB17CE3BE098ABF363B4740C5A96/fulltext/zip</uri></json:item><istex:fulltextTEI uri="https://api.istex.fr/document/402488E29A69BB17CE3BE098ABF363B4740C5A96/fulltext/tei"><teiHeader><fileDesc><titleStmt><title level="a" type="main" xml:lang="en">Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title></titleStmt><publicationStmt><authority>ISTEX</authority><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><availability><p>Chapman & Hall, 1995</p></availability><date>1995-01-11</date></publicationStmt><notesStmt><note>Papers</note></notesStmt><sourceDesc><biblStruct type="inbook"><analytic><title level="a" type="main" xml:lang="en">Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title><author xml:id="author-0000"><persName><forename type="first">V.</forename><surname>Lescuras</surname></persName><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation></author><author xml:id="author-0001"><persName><forename type="first">J.</forename><surname>André</surname></persName><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation></author><author xml:id="author-0002"><persName><forename type="first">F.</forename><surname>Lapicque</surname></persName><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation></author><author xml:id="author-0003"><persName><forename type="first">I.</forename><surname>Zouari</surname></persName><affiliation>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique, Route de Medenine, 6029, Gabès, Tunisia</affiliation></author><idno type="istex">402488E29A69BB17CE3BE098ABF363B4740C5A96</idno><idno type="DOI">10.1007/BF00241587</idno><idno type="ArticleID">BF00241587</idno><idno type="ArticleID">Art4</idno></analytic><monogr><title level="j">Journal of Applied Electrochemistry</title><title level="j" type="abbrev">J Appl Electrochem</title><idno type="pISSN">0021-891X</idno><idno type="eISSN">1572-8838</idno><idno type="journal-ID">true</idno><idno type="issue-article-count">14</idno><idno type="volume-issue-count">12</idno><imprint><publisher>Kluwer Academic Publishers</publisher><pubPlace>Dordrecht</pubPlace><date type="published" when="1995-10-01"></date><biblScope unit="volume">25</biblScope><biblScope unit="issue">10</biblScope><biblScope unit="page" from="933">933</biblScope><biblScope unit="page" to="939">939</biblScope></imprint></monogr></biblStruct></sourceDesc></fileDesc><profileDesc><creation><date>1995-01-11</date></creation><langUsage><language ident="en">en</language></langUsage><abstract xml:lang="en"><p>Abstract: This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.</p></abstract><textClass><keywords scheme="Journal Subject"><list><head>Chemistry</head><item><term>Physical Chemistry</term></item><item><term>Industrial Chemistry/Chemical Engineering</term></item></list></keywords></textClass></profileDesc><revisionDesc><change when="1995-01-11">Created</change><change when="1995-10-01">Published</change></revisionDesc></teiHeader></istex:fulltextTEI><json:item><extension>txt</extension><original>false</original><mimetype>text/plain</mimetype><uri>https://api.istex.fr/document/402488E29A69BB17CE3BE098ABF363B4740C5A96/fulltext/txt</uri></json:item></fulltext><metadata><istex:metadataXml wicri:clean="Springer, Publisher found" wicri:toSee="no header"><istex:xmlDeclaration>version="1.0" encoding="UTF-8"</istex:xmlDeclaration><istex:docType PUBLIC="-//Springer-Verlag//DTD A++ V2.4//EN" URI="http://devel.springer.de/A++/V2.4/DTD/A++V2.4.dtd" name="istex:docType"></istex:docType><istex:document><Publisher><PublisherInfo><PublisherName>Kluwer Academic Publishers</PublisherName><PublisherLocation>Dordrecht</PublisherLocation></PublisherInfo><Journal><JournalInfo JournalProductType="ArchiveJournal" NumberingStyle="Unnumbered"><JournalID>10800</JournalID><JournalPrintISSN>0021-891X</JournalPrintISSN><JournalElectronicISSN>1572-8838</JournalElectronicISSN><JournalTitle>Journal of Applied Electrochemistry</JournalTitle><JournalAbbreviatedTitle>J Appl Electrochem</JournalAbbreviatedTitle><JournalSubjectGroup><JournalSubject Type="Primary">Chemistry</JournalSubject><JournalSubject Type="Secondary">Physical Chemistry</JournalSubject><JournalSubject Type="Secondary">Industrial Chemistry/Chemical Engineering</JournalSubject></JournalSubjectGroup></JournalInfo><Volume><VolumeInfo VolumeType="Regular" TocLevels="0"><VolumeIDStart>25</VolumeIDStart><VolumeIDEnd>25</VolumeIDEnd><VolumeIssueCount>12</VolumeIssueCount></VolumeInfo><Issue IssueType="Regular"><IssueInfo TocLevels="0"><IssueIDStart>10</IssueIDStart><IssueIDEnd>10</IssueIDEnd><IssueArticleCount>14</IssueArticleCount><IssueHistory><CoverDate><Year>1995</Year><Month>10</Month></CoverDate></IssueHistory><IssueCopyright><CopyrightHolderName>Chapman & Hall</CopyrightHolderName><CopyrightYear>1995</CopyrightYear></IssueCopyright></IssueInfo><Article ID="Art4"><ArticleInfo Language="En" ArticleType="OriginalPaper" NumberingStyle="Unnumbered" TocLevels="0" ContainsESM="No"><ArticleID>BF00241587</ArticleID><ArticleDOI>10.1007/BF00241587</ArticleDOI><ArticleSequenceNumber>4</ArticleSequenceNumber><ArticleTitle Language="En">Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</ArticleTitle><ArticleCategory>Papers</ArticleCategory><ArticleFirstPage>933</ArticleFirstPage><ArticleLastPage>939</ArticleLastPage><ArticleHistory><RegistrationDate><Year>2004</Year><Month>7</Month><Day>30</Day></RegistrationDate><Received><Year>1995</Year><Month>1</Month><Day>11</Day></Received><Revised><Year>1995</Year><Month>4</Month><Day>6</Day></Revised></ArticleHistory><ArticleCopyright><CopyrightHolderName>Chapman & Hall</CopyrightHolderName><CopyrightYear>1995</CopyrightYear></ArticleCopyright><ArticleGrants Type="Regular"><MetadataGrant Grant="OpenAccess"></MetadataGrant><AbstractGrant Grant="OpenAccess"></AbstractGrant><BodyPDFGrant Grant="Restricted"></BodyPDFGrant><BodyHTMLGrant Grant="Restricted"></BodyHTMLGrant><BibliographyGrant Grant="Restricted"></BibliographyGrant><ESMGrant Grant="Restricted"></ESMGrant></ArticleGrants><ArticleContext><JournalID>10800</JournalID><VolumeIDStart>25</VolumeIDStart><VolumeIDEnd>25</VolumeIDEnd><IssueIDStart>10</IssueIDStart><IssueIDEnd>10</IssueIDEnd></ArticleContext></ArticleInfo><ArticleHeader><AuthorGroup><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>V.</GivenName><FamilyName>Lescuras</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>J.</GivenName><GivenName>C.</GivenName><FamilyName>André</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff1"><AuthorName DisplayOrder="Western"><GivenName>F.</GivenName><FamilyName>Lapicque</FamilyName></AuthorName></Author><Author AffiliationIDS="Aff2"><AuthorName DisplayOrder="Western"><GivenName>I.</GivenName><FamilyName>Zouari</FamilyName></AuthorName></Author><Affiliation ID="Aff1"><OrgName>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC</OrgName><OrgAddress><Street>I rue Grandville, BP 451</Street><Postcode>F-54001</Postcode><City>Nancy</City><Country>France</Country></OrgAddress></Affiliation><Affiliation ID="Aff2"><OrgDivision>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique</OrgDivision><OrgName>Route de Medenine</OrgName><OrgAddress><Postcode>6029</Postcode><City>Gabès</City><Country>Tunisia</Country></OrgAddress></Affiliation></AuthorGroup><Abstract ID="Abs1" Language="En"><Heading>Abstract</Heading><Para>This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.</Para></Abstract></ArticleHeader><NoBody></NoBody></Article></Issue></Volume></Journal></Publisher></istex:document></istex:metadataXml><mods version="3.6"><titleInfo lang="en"><title>Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title></titleInfo><titleInfo type="alternative" contentType="CDATA" lang="en"><title>Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam</title></titleInfo><name type="personal"><namePart type="given">V.</namePart><namePart type="family">Lescuras</namePart><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">J.</namePart><namePart type="given">C.</namePart><namePart type="family">André</namePart><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">F.</namePart><namePart type="family">Lapicque</namePart><affiliation>Laboratoire des Sciences du Génie Chimique and Département de Chimie Physique des Réactions, CNRS-ENSIC, I rue Grandville, BP 451, F-54001, Nancy, France</affiliation><role><roleTerm type="text">author</roleTerm></role></name><name type="personal"><namePart type="given">I.</namePart><namePart type="family">Zouari</namePart><affiliation>Ecole Nationale d'Ingénieurs de Gabès, Département de Génie Chimique, Route de Medenine, 6029, Gabès, Tunisia</affiliation><role><roleTerm type="text">author</roleTerm></role></name><typeOfResource>text</typeOfResource><genre type="research-article" displayLabel="OriginalPaper"></genre><originInfo><publisher>Kluwer Academic Publishers</publisher><place><placeTerm type="text">Dordrecht</placeTerm></place><dateCreated encoding="w3cdtf">1995-01-11</dateCreated><dateIssued encoding="w3cdtf">1995-10-01</dateIssued><copyrightDate encoding="w3cdtf">1995</copyrightDate></originInfo><language><languageTerm type="code" authority="rfc3066">en</languageTerm><languageTerm type="code" authority="iso639-2b">eng</languageTerm></language><physicalDescription><internetMediaType>text/html</internetMediaType></physicalDescription><abstract lang="en">Abstract: This paper deals with the jet electrochemical etching of metal, using nickel drilling as an example; the performance of this technique was investigated as a function of the nozzle diameter and current density. The significance of the outer dissolution of metal, due to liquid spreading on the vertical substrate facing the nozzle, was estimated; the hole size was compared to the nozzle diameter. Moreover, a pulsed beam was shown to improve the precision of the edge. Applications to shape patterning are presented and discussed.</abstract><note>Papers</note><relatedItem type="host"><titleInfo><title>Journal of Applied Electrochemistry</title></titleInfo><titleInfo type="abbreviated"><title>J Appl Electrochem</title></titleInfo><genre type="journal" displayLabel="Archive Journal"></genre><originInfo><dateIssued encoding="w3cdtf">1995-10-01</dateIssued><copyrightDate encoding="w3cdtf">1995</copyrightDate></originInfo><subject><genre>Chemistry</genre><topic>Physical Chemistry</topic><topic>Industrial Chemistry/Chemical Engineering</topic></subject><identifier type="ISSN">0021-891X</identifier><identifier type="eISSN">1572-8838</identifier><identifier type="JournalID">10800</identifier><identifier type="IssueArticleCount">14</identifier><identifier type="VolumeIssueCount">12</identifier><part><date>1995</date><detail type="volume"><number>25</number><caption>vol.</caption></detail><detail type="issue"><number>10</number><caption>no.</caption></detail><extent unit="pages"><start>933</start><end>939</end></extent></part><recordInfo><recordOrigin>Chapman & Hall, 1995</recordOrigin></recordInfo></relatedItem><identifier type="istex">402488E29A69BB17CE3BE098ABF363B4740C5A96</identifier><identifier type="DOI">10.1007/BF00241587</identifier><identifier type="ArticleID">BF00241587</identifier><identifier type="ArticleID">Art4</identifier><accessCondition type="use and reproduction" contentType="copyright">Chapman & Hall, 1995</accessCondition><recordInfo><recordContentSource>SPRINGER</recordContentSource><recordOrigin>Chapman & Hall, 1995</recordOrigin></recordInfo></mods></metadata><serie></serie></istex></record>Pour manipuler ce document sous Unix (Dilib)
EXPLOR_STEP=$WICRI_ROOT/Wicri/Terre/explor/NickelMaghrebV1/Data/Istex/Corpus
HfdSelect -h $EXPLOR_STEP/biblio.hfd -nk 000539 | SxmlIndent | more
Ou
HfdSelect -h $EXPLOR_AREA/Data/Istex/Corpus/biblio.hfd -nk 000539 | SxmlIndent | more
Pour mettre un lien sur cette page dans le réseau Wicri
{{Explor lien
|wiki= Wicri/Terre
|area= NickelMaghrebV1
|flux= Istex
|étape= Corpus
|type= RBID
|clé= ISTEX:402488E29A69BB17CE3BE098ABF363B4740C5A96
|texte= Jet electrochemical etching of nickel in a sodium chloride medium assisted by a pulsed laser beam
}}
| This area was generated with Dilib version V0.6.27. |  |