List of bibliographic references
Number of relevant bibliographic references: 18.
| Ident. | Authors (with country if any) | Title |
|---|
| 000013 (2014) |
M. Hemmous [Algérie] ; A. Layadi [Algérie] ; A. Guittoum [Algérie] ; N. Souami [Algérie] ; M. Mebarki [Algérie] ; N. Menni [Algérie] | Structure, surface morphology and electrical properties of evaporated Ni thin films: Effect of substrates, thickness and Cu underlayer |
| 000040 (2013) |
M. Arab Pour Yazdi [France] ; N. Fenineche [France] ; E. Aubry [France] ; A. Kaibi [Algérie] ; A. Billard [France] | Microstructure and magnetic properties of Ni3Fe solid solution thin films deposited by DC-magnetron sputtering |
| 000046 (2013) |
Khalid Hoummada [France] ; Gamra Tellouche [Algérie] ; Ivan Blum [France] ; Alain Portavoce [France] ; Marion Descoins [France] ; Dominique Mangelinck [France] | Direct observation of Ni decorated dislocation loops within As+-implanted silicon and arsenic clustering in Ni silicide contact |
| 000073 (2011) |
M. Boukelkoul [Algérie] ; A. Haroun [Algérie] | Structural, magnetic and magneto-optical properties of ultrathin films of nickel on iridium (001) |
| 000139 (2008) |
L. Cattin [France] ; B. A. Reguig [Algérie] ; A. Khelil [Algérie] ; M. Morsli [France] ; K. Benchouk [Algérie] ; J. C. Bernede [France] | Properties of NiO thin films deposited by chemical spray pyrolysis using different precursor solutions |
| 000145 (2008) |
M. Hemmous [Algérie] ; A. Layadi [Algérie] ; A. Guittoum [Algérie] ; A. Bourzami [Algérie] ; A. Benabbas [Algérie] | Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and Ni/Si(100) thin films |
| 000158 (2007) |
S.-M. Cherif [France] ; A. Layadi [Algérie] ; J. Ben Youssef [France] ; C. Nacereddine [Algérie] ; Y. Roussigne [France] | Study of the magnetic anisotropy in Ni/Cu and Ni/glass thin films |
| 000159 (2007) |
B. A. Reguig [Algérie] ; A. Khelil [Algérie] ; L. Cattin [France] ; M. Morsli [France] ; J. C. Bernede [France] | Properties of NiO thin films deposited by intermittent spray pyrolysis process |
| 000224 (2003) |
A. Kellou [Algérie] ; N. E. Fenineche [France] ; A. Tadjer [Algérie] ; H. Aourag [Algérie, France] | Ferromagnetic and antiferromagnetic couplings in Cr(0 0 1) thin films and TM monolayer/Cr(0 0 1) (TM = Ti, V, Cr, Mn, Fe, Co, Ni) |
| 000240 (2001) |
K. Lahem [Algérie] ; R. Cherfi [Algérie] ; M. Aoucher [Algérie] | Hydrogen interaction on metal/hydrogenated amorphous silicon Schottky structures: adsorption/desorption effects |
| 000254 (1999) |
M. Da Cunha Belo [Portugal] ; N. E Hakiki [Algérie] ; M. G. S Ferreira [Portugal] | Semiconducting properties of passive films formed on nickel–base alloys type Alloy 600: influence of the alloying elements |
| 000255 (1999) |
J. C. Bernède [France] ; J. Pouzet [France] ; E. Gourmelon [France] ; H. Hadouda [Algérie] | Recent studies on photoconductive thin films of binary compounds |
| 000264 (1998) |
N. Guettari [Algérie] ; J. Ouerfelli [France] ; J. C. Bernède [France] ; A. Khelil [Algérie] ; J. Pouzet [France] ; A. Conan [France] | Photoconductive WSe2 thin films obtained by solid state reaction in the presence of a thin nickel layer |
| 000265 (1998) |
J. Ouerfelli [France] ; Z. Jlaïel [France] ; N. Guettari [Algérie] ; E. Gourmelon [France] ; J. Pouzet [France] ; J. C. Bernede [France] ; A. Khelil [Algérie] ; M. Zoater [Liban] ; A. Conan [France] | De la nécessité d'une fine couche de nickel pour obtenir des couches minces de MoSe2 photoconductrices |
| 000268 (1998) |
N. Guettari [Algérie] ; J. Ouerfelli [France] ; J. C. Bernede [France] ; A. Khelil [Algérie] ; J. Pouzet [France] ; A. Conan [France] | Photoconductive WSe2 thin films obtained by solid state reaction in the presence of a thin nickel layer |
| 000269 (1998) |
B. Ghebouli [Algérie] ; A. Layadi [Algérie] ; L. Kerkache [Algérie] | Effect of the substrate on the structural and electrical properties of dc sputtered Ni thin films |
| 000275 (1997) |
E. Gourmelon [France] ; H. Hadouda [Algérie] ; Jc Bernede [France] ; J. Pouzet [France] | High quality crystalline MoS2 thin films obtained on Ni coated substrates: optimization of the post-annealing treatment |
| 000285 (1997) |
H. Hadouda [Algérie] ; J. C. Bernede [France] ; E. Gourmelon [France] ; J. Pouzet [France] | Experimental obviousness of the necessity for a thin Ni interfacial layer to obtain highly ordered photoconductive MoS2 films |
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